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公开(公告)号：US07998335B2
公开(公告)日：2011-08-16
申请号：US11150944
申请日：2005-06-13
申请人： Paul M. Feeney , Vlasta Brusic
发明人： Paul M. Feeney , Vlasta Brusic
IPC分类号： C25F3/18
摘要： The invention relates to a method of polishing a substrate comprising at least one metal layer by applying an electrochemical potential between the substrate and at least one electrode in contact with a polishing composition comprising a reducing agent or an oxidizing agent.
摘要翻译： 本发明涉及一种通过在衬底和至少一个与包含还原剂或氧化剂的抛光组合物接触的电极之间施加电化学电势来抛光包含至少一个金属层的衬底的方法。
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公开(公告)号：US20080217186A1
公开(公告)日：2008-09-11
申请号：US12073793
申请日：2008-03-10
IPC分类号： C25F3/18
CPC分类号： C25F3/26
摘要： The present invention relates to a method of electrochemical polishing of surfaces of titanium or titanium-containing alloys, such as Nitinol. An electrolyte is used that comprises methanesulfonic acid and one or more alkanediphosphonic acids. These alkanediphosphonic acids can optionally be substituted with hydroxy and/or amino groups. A further aspect of the present invention relates to the use of said electrolyte for the electropolishing of titanium or titanium-containing alloys.
摘要翻译： 本发明涉及钛或含钛合金如镍钛诺的表面的电化学抛光方法。 使用包含甲磺酸和一种或多种烷二膦酸的电解质。 这些烷二膦酸可任选被羟基和/或氨基取代。 本发明的另一方面涉及所述电解质用于电解抛光钛或含钛合金的用途。
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公开(公告)号：US20240006579A1
公开(公告)日：2024-01-04
申请号：US18247324
申请日：2021-10-01
发明人： Kevin Wood , Aleksandr Aleshin , Kelbi Redquest , Jack Lucas
摘要： In some example embodiments, there is provided example embodiments related to providing a more uniform lithium deposition based on pulsing. In some example embodiments, there is provided a method including: generating a first energy pulse followed by a second energy pulse; and applying the first energy pulse and the second energy pulse to a lithium metal electrode to electrically treat the lithium metal electrode to reduce and/or eliminate growth of dendrites on at least a portion of a surface of the lithium metal. Related systems, methods, and articles of manufacture are also disclosed.
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公开(公告)号：US11136689B2
公开(公告)日：2021-10-05
申请号：US16316884
申请日：2017-07-13
发明人： Sarah Reichelt , Tobias Mertens , Banry Thibaud
摘要： An electrolyte (EL) for the electrolytic polishing of a metallic substrate includes at least one fluoride compound (F) and/or one chloride compound (Cl), and at least one complexing agent (CA), wherein the electrolyte (EL) does not contain an acid compound that is not a complexing agent. Furthermore, a process for the electrolytic polishing of a metallic substrate wherein the electrolyte (EL) is applied is described.
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5.发明授权Electrolyte for electrochemical polishing of articles made of titanium and titanium alloys 失效用于电化学抛光由钛和钛合金制成的制品的电解液
公开(公告)号：US4220509A
公开(公告)日：1980-09-02
申请号：US62130
申请日：1979-07-30
申请人： Vladlen M. Shtanko , Pavel P. Karyazin , Sergei N. Sirotkin , Jury A. Perimov , Vladimir F. Udaltsov , Nina A. Shut , Natalya N. Khukhareva
发明人： Vladlen M. Shtanko , Pavel P. Karyazin , Sergei N. Sirotkin , Jury A. Perimov , Vladimir F. Udaltsov , Nina A. Shut , Natalya N. Khukhareva
CPC分类号： C25F3/26
摘要： Electrolyte for electrochemical polishing of articles made of titanium and titanium alloys contains 45-70 wt.-% sulphuric acid, 4-20 wt.-% nitric acid, 20-35 wt.-% hydrofluoric acid, 0.4-1.9 wt.-% sodium salt of L-sulphocarboxylic acid containing 17 to 20 atoms of carbon in combination with 0.1-1.6 wt.-% sodium salt of carboxylic acid containing 17 to 20 atoms of carbon or 1-2 wt.-% alkyl sulphoureid, 4-20 wt.-% water.The present invention increases by 20% the dispersive capacity of the electrolyte which produces a high surface finish on the article, uniformity of the electric potential and improves corrosion resistance of the treated article.
摘要翻译： 用于由钛和钛合金制成的制品进行电化学抛光的电解液包含45-70重量％的硫酸，4-20重量％的硝酸，20-35重量％的氢氟酸，0.4-1.9重量％ 含有17至20个碳原子的L-磺基羧酸钠盐与含有17至20个碳原子或1-2重量％烷基磺酸的含量为0.1-1.6重量％的羧酸钠盐组合，4-20 重量％水。 本发明增加了在制品上产生高表面光洁度的电解质的分散能力的20％，电位的均匀性和改进的处理制品的耐腐蚀性。
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公开(公告)号：US11512400B2
公开(公告)日：2022-11-29
申请号：US17118075
申请日：2020-12-10
IPC分类号： C25B3/07 , C25B3/26 , C25B11/052 , C25B11/075 , C25D3/38 , C25F3/18
摘要： A method and an electrocatalytic electrode for electrochemically reducing carbon dioxide to methanol are provided. An exemplary electrocatalytic electrode includes copper (I) oxide crystals electrodeposited over an atomically smooth copper electrode.
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公开(公告)号：US11492723B2
公开(公告)日：2022-11-08
申请号：US16674168
申请日：2019-11-05
申请人： Ethicon LLC
发明人： Duan Li Ou
摘要： A low-hazardous electropolishing process has been developed to remove oxide layer(s) from the surface of nitinol needles. Low concentrations of citric acid and sulfamic acid are mixed with medium concentrations of sulfuric acid to use as an electrolyte solution. The process can be easily fitted into current suture needle manufacturing processes as well as into processes require electropolishing of nitinol-containing medical devices.
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公开(公告)号：US20190177872A1
公开(公告)日：2019-06-13
申请号：US16310885
申请日：2016-06-21
申请人： Extrude Hone GmbH
摘要： In a method and a device for electrolytically polishing inner surfaces of a recess in a workpiece made of metal, in particular a workpiece printed in three dimensions, provision is made that a cathode is introduced into the recess and polishes the inner surface of the recess using an electrolyte having a slow diffusion rate.
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公开(公告)号：US20080121530A1
公开(公告)日：2008-05-29
申请号：US11937639
申请日：2007-11-09
IPC分类号： C25F3/18
摘要： The present invention relates to a method for the electropolishing of surfaces of metals and metal alloys. Said method is characterized in particular in that it can be applied to a wide range of metals. Thus, it is suitable for the electropolishing of metal surfaces comprising iron, tungsten, magnesium, aluminum or an alloy of these metals. The electrolyte used in the method comprises methanesulfonic acid and at least one alcoholic compound selected from aliphatic diols of general formula CnH2n(OH)2 with n=2-6 and alicyclic alcohols of general formula CmH2m-1OH with m=5-8.
摘要翻译： 本发明涉及电抛光金属和金属合金表面的方法。 所述方法的特征在于其可以应用于宽范围的金属。 因此，适用于电解抛光铁，钨，镁，铝或这些金属的合金的金属表面。 在该方法中使用的电解质包括甲磺酸和至少一种醇化合物，其选自通式为C 2 H 2n（OH）2的脂族二醇（OH）2 n = 2-6和通式C m H 2 m-1 OH的脂环族醇，m = 5-8。
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公开(公告)号：US20190292681A1
公开(公告)日：2019-09-26
申请号：US16316884
申请日：2017-07-13
发明人： Sarah Bagehorn , Tobias Mertens , Banry Thibaud
IPC分类号： C25F3/18
摘要： An electrolyte (EL) for the electrolytic polishing of a metallic substrate includes at least one fluoride compound (F) and/or one chloride compound (Cl), and at least one complexing agent (CA), wherein the electrolyte (EL) does not contain an acid compound that is not a complexing agent. Furthermore, a process for the electrolytic polishing of a metallic substrate wherein the electrolyte (EL) is applied is described.
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