HUMAN MONOCLONAL ANTIBODIES TO PROTEIN TYROSINE KINASE 7 (PTK7) AND METHODS FOR USING ANTI-PTK7 ANTIBODIES
    91.
    发明申请
    HUMAN MONOCLONAL ANTIBODIES TO PROTEIN TYROSINE KINASE 7 (PTK7) AND METHODS FOR USING ANTI-PTK7 ANTIBODIES 有权
    人类单克隆抗体蛋白酪氨酸激酶7(PTK7)和使用抗PTK7抗体的方法

    公开(公告)号:US20100034826A1

    公开(公告)日:2010-02-11

    申请号:US12095986

    申请日:2006-12-08

    Abstract: The present invention provides isolated monoclonal antibodies, particularly human monoclonal antibodies, that specifically bind to PTK7 with high affinity. Nucleic acid molecules encoding the antibodies of the invention, expression vectors, host cells and methods for expressing the antibodies of the invention are also provided. Immunoconjugates, bispecific molecules and pharmaceutical compositions comprising the antibodies of the invention are also provided. The invention also provides methods for detecting PTK7, as well as methods for treating various diseases, including cancer and infectious diseases, using anti-PTK7 antibodies.

    Abstract translation: 本发明提供了以高亲和力特异性结合PTK7的分离的单克隆抗体,特别是人单克隆抗体。 还提供了编码本发明抗体的核酸分子,表达载体,宿主细胞和用于表达本发明的抗体的方法。 还提供了免疫偶联物,双特异性分子和包含本发明抗体的药物组合物。 本发明还提供用于检测PTK7的方法,以及使用抗PTK7抗体治疗各种疾病(包括癌症和感染性疾病)的方法。

    Method for improved metrology by protecting photoresist profiles
    93.
    发明授权
    Method for improved metrology by protecting photoresist profiles 有权
    通过保护光刻胶轮廓改进计量的方法

    公开(公告)号:US07374956B2

    公开(公告)日:2008-05-20

    申请号:US10202956

    申请日:2002-07-25

    CPC classification number: H01L22/34

    Abstract: A method for preserving semiconductor feature opening profiles for metrology examination including providing semiconductor wafer having a process surface comprising semiconductor feature openings; blanket depositing over the semiconductor feature openings to substantially fill the semiconductor feature openings at least one layer of material comprising silicon oxide; and, preparing a portion of the semiconductor wafer in cross sectional layout for metrology examination.

    Abstract translation: 一种用于保存用于度量检查的半导体特征开口轮廓的方法,包括提供具有包括半导体特征开口的工艺表面的半导体晶片; 在半导体特征开口上的覆盖层沉积,以基本上填充半导体特征开口至少一层包含氧化硅的材料; 并且制备半导体晶片的一部分用于计量检查的横截面布局。

    Method and apparatus for optically measuring absolute displacement
    94.
    发明申请
    Method and apparatus for optically measuring absolute displacement 失效
    用于光学测量绝对位移的方法和装置

    公开(公告)号:US20050018204A1

    公开(公告)日:2005-01-27

    申请号:US10897503

    申请日:2004-07-23

    CPC classification number: G01D5/344

    Abstract: A method and apparatus using two sets of polarized light detection systems are disclosed for optically measuring absolute displacement. In the first detection system a step motor is controlled to drive an analyzer to trace synchronously the displacement being measured by comparison of the magnitude of the intensity of two orthogonal light beams and then the number of control pulses from the step motor becomes a value of the displacement measured; and by comparison with the magnitude the intensity of a plurality of light beams with phase difference from a plurality of light paths in the second polarized light detection system the section of system operation is ascertain and consequently the absolute displacement is detected and measured.

    Abstract translation: 公开了使用两组偏振光检测系统的方法和装置,用于光学测量绝对位移。 在第一检测系统中,通过比较两个正交光束的强度的大小,控制步进电动机驱动分析仪同步跟踪测量的位移,然后来自步进电动机的控制脉冲的数量变为 位移测量; 并且通过与第二偏振光检测系统中的多个光路的相位差的多个光束的强度的大小进行比较,确定系统操作的部分,因此检测和测量绝对位移。

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