公开(公告)号：US20080094599A1

公开(公告)日：2008-04-24

申请号：US11628356

申请日：2005-06-03

申请人： Patrick Scheible ,  Alexandra Pazidis ,  Reiner Garreis ,  Michael Totzeck ,  Heiko Feldmann ,  Paul Graeupner ,  Hans-Juergen Rostalski ,  Wolfgang Singer

发明人： Patrick Scheible ,  Alexandra Pazidis ,  Reiner Garreis ,  Michael Totzeck ,  Heiko Feldmann ,  Paul Graeupner ,  Hans-Juergen Rostalski ,  Wolfgang Singer

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G02B13/02 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70308

摘要： In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.

摘要翻译： 在将投影物镜的物平面中布置的图案成像到投影物镜的像平面中的投影物镜中，提供至少一个光学部件，该光学元件具有基板，其中至少一个基板表面被干涉层覆盖 系统具有在光学部件的可用横截面上的反射率和/或透射率的大的空间调制，该调制适于投射物镜的其余部件的空间传输分布，使得强度分布 与没有干涉层系统的投射物镜相比，在瞳孔表面中测量的辐射具有显着降低的空间调制。

公开(公告)号：US20060152701A1

公开(公告)日：2006-07-13

申请号：US11337491

申请日：2006-01-24

申请人： Michael Totzeck ,  Birgit Enkisch ,  Karl-Heinz Schuster

发明人： Michael Totzeck ,  Birgit Enkisch ,  Karl-Heinz Schuster

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G02B5/1809 ,  G02B5/3083 ,  G02B27/286 ,  G03F7/70308

摘要： A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of polarization states of the input radiation, is designed as a reflective retardation arrangement. A useful cross section of the retardation arrangement has a multiplicity of retardation zones of different retardation effect. Such a mirror arrangement having a retardation effect varying as a function of location can be used to compensate undesired fluctuations in the polarization state over the cross section of an input radiation beam and/or to set specific output polarization states, for example in order to set radial or tangential polarization.

摘要翻译： 用于将从延迟装置的输入侧入射的输入辐射束转换成输出辐射束的延迟装置，该输出辐射束在其横截面上具有可被延迟装置影响的极化状态的空间分布，并且与空间 输入辐射的极化状态的分布被设计为反射延迟布置。 延迟结构的有用的截面具有不同的延迟效果的多个延迟区域。 可以使用具有作为位置的函数而变化的延迟效应的这种反射镜装置来补偿在输入辐射束的横截面上的偏振状态的不期望的波动和/或设置特定的输出偏振状态，例如以设定 径向或切向极化。

公开(公告)号：US20060012873A1

公开(公告)日：2006-01-19

申请号：US10917626

申请日：2004-08-13

申请人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

发明人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

IPC分类号： G02B21/06

CPC分类号： G03F7/70566 ,  G02B5/3025 ,  G02B21/0016 ,  G03F7/70666 ,  Y10S359/90

摘要： The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects by means of inspection microscopes in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems. Realistic images of the scanner systems can be generated by emulating the occurring vector effects.

摘要翻译： 本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。 利用所提出的解决方案，尽管越来越小的结构和成像系统的图像侧数值孔径越来越高，但是可以通过检查显微镜检查用于缺陷的光刻掩模。 可以通过模拟出现的矢量效应来生成扫描仪系统的现实图像。