公开(公告)号：US10697908B2

公开(公告)日：2020-06-30

申请号：US15574174

申请日：2016-05-29

申请人： XWINSYS LTD.

发明人： Doron Reinis ,  Michael Geffen ,  Roni Peretz ,  Colin Smith

IPC分类号： G01N23/223 ,  G01N23/2206 ,  G01N23/207 ,  G02B21/00

摘要： The present disclosure provides a method and an apparatus for apparatus for inspecting a semiconductor wafer for abnormalities by accurately measuring elemental concentration at a target area. The apparatus includes an x-ray imaging subsystem for measuring an elemental composition at the target area of the semiconductor wafer. The apparatus further includes an edxrf subsystem for measuring an elemental concentration at the target area of the semiconductor wafer. The elemental concentration may be calibrated by first correlating the elemental concentration measurements obtained using x-ray imaging system for the target area with the elemental concentration measurements obtained using the edxrf subsystem for the target area to receive an augmented and accurate elemental concentration measurement for the target area of the semiconductor wafer.

公开(公告)号：US10557808B2

公开(公告)日：2020-02-11

申请号：US15877942

申请日：2018-01-23

申请人： Shimadzu Corporation

发明人： Hiroaki Furukawa

IPC分类号： G01N23/02 ,  G01N23/2206 ,  G01N23/223

摘要： A resin discriminating apparatus includes an X-ray tube which emits X-rays, an X-ray detector which detects X-rays emitted from a sample irradiated with X-rays, a data processing section which creates a spectrum on the basis of a detection signal obtained by the X-ray detector, a peak extraction section which extracts a spectral line due to Compton scattering and a spectral line due to Rayleigh scattering derived from a target element of the X-ray tube on the spectrum, and obtains a peak intensity, and a discrimination section which calculates a scattering intensity ratio which is a ratio of the Rayleigh scattering intensity to the Compton scattering intensity and discriminates the type of resin contained in the sample from the scattering intensity ratio.

公开(公告)号：US20190317033A1

公开(公告)日：2019-10-17

申请号：US16347618

申请日：2017-11-07

申请人： Oxford University Innovation Limited

发明人： Lars HANSEN

IPC分类号： G01N23/2251 ,  G01N3/16 ,  G01N3/22 ,  G01N23/2206

摘要： A method of observing a solid sample (100) with a microscope (300), comprising engaging a rotating portion (110) with a first part (104) of the sample (100), holding a second part (106) of the sample (100), and rotating the rotating portion (110) so as to rotate the first part (104) of the sample (100) relative to the second part (106) of the sample (100).

公开(公告)号：US20180128757A1

公开(公告)日：2018-05-10

申请号：US15574174

申请日：2016-05-29

申请人： XWINSYS LTD.

发明人： DORON REINIS ,  Michael GEFFEN ,  Roni PERETZ ,  Colin SMITH

IPC分类号： G01N23/223 ,  G02B21/00 ,  G01N23/2206

摘要： The present disclosure provides a method and an apparatus for apparatus for inspecting a semiconductor wafer for abnormalities by accurately measuring elemental concentration at a target area. The apparatus includes an x-ray imaging subsystem for measuring an elemental composition at the target area of the semiconductor wafer. The apparatus further includes an edxrf subsystem for measuring an elemental concentration at the target area of the semiconductor wafer. The elemental concentration may be calibrated by first correlating the elemental concentration measurements obtained using x-ray imaging system for the target area with the elemental concentration measurements obtained using the edxrf subsystem for the target area to receive an augmented and accurate elemental concentration measurement for the target area of the semiconductor wafer.