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163 条记录 (耗时 0.021 秒)

    EXPOSURE UNIT, IMAGE FORMING APPARATUS AND IMAGE FORMING METHOD
    122.
    发明申请
    EXPOSURE UNIT, IMAGE FORMING APPARATUS AND IMAGE FORMING METHOD 失效
    曝光单元，图像形成装置和图像形成方法

    公开(公告)号：US20090220878A1

    公开(公告)日：2009-09-03

    申请号：US12392201

    申请日：2009-02-25

    申请人： TATSUYA MIYADERA ,  YOSHIYUKI SHIMIZU ,  HIDEYUKI MASUMOTO ,  TAKAFUMI MIYAZAKI ,  KOZO YAMAZAKI

    发明人： TATSUYA MIYADERA ,  YOSHIYUKI SHIMIZU ,  HIDEYUKI MASUMOTO ,  TAKAFUMI MIYAZAKI ,  KOZO YAMAZAKI

    IPC分类号： G03G13/06

    CPC分类号： G03G15/0409

    摘要： An exposure unit which exposes photoconductive drums having rotary axes thereof arranged parallel to each other on a single plane by light beams, includes one or more polygon mirrors each having a plurality of reflection surfaces, where the one or more polygon mirrors rotate about a common rotary axis. Each light beam is deflected by the one or more polygon mirrors and scans the surface of a corresponding photoconductive drum. The common rotary axis is separated from the rotary axes of the photoconductive drums by identical distances along respective normals which are perpendicular to both the common rotary axis and the rotary axes of the photoconductive drums.

    摘要翻译： 曝光单元，其在光单元的平面上露出具有彼此平行布置的旋转轴的感光鼓，包括一个或多个多面镜，每个多面镜具有多个反射面，其中所述一个或多个多面镜围绕公共旋转 轴。 每个光束被一个或多个多面镜偏转，并扫描对应的感光鼓的表面。 公共旋转轴线与感光鼓的旋转轴线沿着垂直于感光鼓的公共旋转轴线和旋转轴线的相应法线相等的距离分开。

    Method for producing optical element having antireflection structure, and optical element having antireflection structure produced by the method
    127.
    发明申请
    Method for producing optical element having antireflection structure, and optical element having antireflection structure produced by the method 审中-公开
    具有防反射结构的光学元件的制造方法以及通过该方法制造的具有抗反射结构的光学元件

    公开(公告)号：US20050093210A1

    公开(公告)日：2005-05-05

    申请号：US10975929

    申请日：2004-10-29

    申请人： Makoto Umetani ,  Yoshiyuki Shimizu ,  Yoshiharu Yamamoto ,  Michihiro Yamagata ,  Yasuhiro Tanaka ,  Hiroshi Yamaguchi

    发明人： Makoto Umetani ,  Yoshiyuki Shimizu ,  Yoshiharu Yamamoto ,  Michihiro Yamagata ,  Yasuhiro Tanaka ,  Hiroshi Yamaguchi

    IPC分类号： C03B11/08 ,  C03C15/00 ,  C03C17/06 ,  G02B5/00 ,  H05B6/00 ,  B29D24/00

    CPC分类号： G02B5/003 ,  C03B11/082 ,  C03B11/086 ,  C03B2215/10 ,  C03B2215/17 ,  C03B2215/412 ,  C03C15/00 ,  C03C17/06 ,  Y02P40/57

    摘要： A cylinder-shaped Cr mask having a diameter of 0.15 μm is formed at a pitch of 0.15 μm on a quartz glass substrate. The quartz glass substrate on which the cylinder-shaped Cr mask is formed is placed in a RF dry-etching apparatus and the surface of the quartz glass substrate is etched with CHF3+O2 gas. Thus, a cone-shaped antireflection structure with a pitch of 0.15 μm and a height of 0.15 μm is formed on the surface of the quartz glass substrate. An Ir—Rh alloy film having a thickness of 0.05 μm for protecting the surface is formed on the surface (pressing surface) of the quartz glass substrate provided with the cone-shaped antireflection structure to form a mold having an antireflection structure. An optical material 11 (crown based borosilicate glass) to which a releasing agent containing carbon (C) particulates for mold release is applied is press-molded with the mold having an antireflection structure, and the press-molded optical material is released from the mold having an antireflection structure without cooling. After the press-molded optical material is cooled, the releasing agent is removed.

    摘要翻译： 在石英玻璃基板上以0.15μm的间距形成直径为0.15μm的圆筒状Cr掩模。 将形成有圆筒形Cr掩模的石英玻璃基板放置在RF干蚀刻装置中，并用CHF 3 + O 2 2蚀刻石英玻璃基板的表面， / SUB气体。 因此，在石英玻璃基板的表面上形成具有0.15μm的间距和0.15μm的高度的锥形防反射结构。 在设置有锥形防反射结构的石英玻璃基板的表面（按压面）上形成厚度为0.05μm的用于保护表面的Ir-Rh合金膜，以形成具有防反射结构的模具。 将具有用于脱模的碳（C）颗粒的脱模剂施加到其上的光学材料11（冠状硼硅酸盐玻璃）用具有抗反射结构的模具进行压模，并且将模压的光学材料从模具中释放 具有防反射结构而不冷却。 压制成型的光学材料冷却后，除去脱模剂。

    Catadioptric reduction projection optical system
    128.
    发明授权
    Catadioptric reduction projection optical system 失效
    反射折射减光投影光学系统

    公开(公告)号：US5668673A

    公开(公告)日：1997-09-16

    申请号：US456624

    申请日：1995-06-01

    申请人： Yutaka Suenaga ,  Toshiro Ishiyama ,  Yoshiyuki Shimizu ,  Kiyoshi Hayashi

    发明人： Yutaka Suenaga ,  Toshiro Ishiyama ,  Yoshiyuki Shimizu ,  Kiyoshi Hayashi

    IPC分类号： G02B17/08 ,  G03F7/20 ,  G02B17/00 ,  G02B21/00

    CPC分类号： G02B17/0828 ,  G02B17/0892 ,  G03F7/70225

    摘要： A first partial optical system including a first group of lenses having a positive refractive power, a first concave reflection mirror and a second group of lenses having a positive refractive power, for forming a primary reduced image of an object, a second partial optical system including a second concave reelection mirror and a third group of lenses having a positive refractive power, for further reducing the primary reduced image and refocusing it, and a reflection mirror arranged between the first partial optical system and the second partial optical system, for deflecting a light path are arranged in a sequence as viewed from the object. A good image-forming ability as a projection optical system for fabricating a semiconductor device is attained with a simple construction.

    摘要翻译： 第一部分光学系统，包括具有正屈光力的第一组透镜，第一凹面反射镜和具有正折光力的第二组透镜，用于形成物体的初级缩小图像;第二部分光学系统，包括 具有正折射力的第二凹面重选镜和第三组透镜，用于进一步减小初级缩小图像并重新聚焦;以及反射镜，布置在第一部分光学系统和第二部分光学系统之间，用于偏转光 路径按照从对象观察的顺序排列。 作为用于制造半导体器件的投影光学系统，具有良好的成像能力，结构简单。

    Microscope whose enlargement magnification is changeable
    129.
    发明授权
    Microscope whose enlargement magnification is changeable 失效
    显微镜放大倍率可变

    公开(公告)号：US4946265A

    公开(公告)日：1990-08-07

    申请号：US282111

    申请日：1988-12-09

    申请人： Yoshiyuki Shimizu ,  Reiko Ohyama

    发明人： Yoshiyuki Shimizu ,  Reiko Ohyama

    IPC分类号： G02B21/00 ,  G02B21/02

    CPC分类号： G02B21/025

    摘要： A microscope whose enlargement magnification is changeable includes a plurality of interchangeable first objective lenses of different focal lengths for changing a divergent light flux from an object on a stage into a parallel light flux, a first interchanging device for moving the first objective lenses and interchangeably installing them on a predetermined optic axis, a plurality of interchangeable second objective lenses of different focal lengths for condensing the parallel light flux from the first objective lenses and forming an enlarged image of the object at a predetermined position, an eyepiece for observing therethrough the enlarged image of the object formed by the second objective lenses, a prism for directing the light flux from the second objective lenses to the eyepiece, and a second interchanging device provided between the first interchanging device and the prism for moving the second objective lenses and interchangeably installing them on the predetermined optic axis.

    摘要翻译： 放大倍率可变的显微镜包括多个可变焦距的可互换的第一物镜，用于改变从舞台上的物体到平行光束的发散光束;第一交换装置，用于移动第一物镜，并可互换地安装 它们在预定的光轴上，多个可互换的不同焦距的可互换的第二物镜，用于聚集来自第一物镜的平行光束并在预定位置形成物体的放大图像，用于观察放大图像的目镜 由第二物镜形成的物体，用于将来自第二物镜的光束引导到目镜的棱镜，以及设置在第一交换装置与棱镜之间用于移动第二物镜并可互换安装的第二换向装置 在预定的光轴上。

    Epidark illumination system
    130.
    发明授权
    Epidark illumination system 失效
    Epidark照明系统

    公开(公告)号：US4186993A

    公开(公告)日：1980-02-05

    申请号：US835786

    申请日：1977-09-22

    申请人： Yoshiyuki Shimizu ,  Takeshi Sudo

    发明人： Yoshiyuki Shimizu ,  Takeshi Sudo

    IPC分类号： G02B21/06 ,  G02B21/08 ,  G02B21/10

    CPC分类号： G02B21/084 ,  G02B21/10

    摘要： An epidark illumination system for use with a microscope in which a sample is illuminated from around an objective by a ring-shaped light flux having its center coincident with the optic axis of the objective to enable the sample to be observed in a dark field of view comprises a ring-shaped condenser lens member disposed adjacent to the forward end of the objective with the center of the lens member being coincident with the optic axis of the objective to condense the light flux upon the sample, and a scattering member for scattering the ring-shaped light flux disposed in the light path before the ring-shaped light flux reaches the ring-shaped condenser lens member.

    摘要翻译： 一种用于显微镜的分光照明系统，其中样品从物镜周围通过其中心与物镜的光轴重合的环形光束照射，以使得能够在暗视野中观察样品 包括邻近所述物镜的前端设置的环形聚光透镜部件，所述透镜部件的中心与所述物镜的所述光轴重合，以将所述光束冷凝在所述样品上;以及散射部件，用于散射所述环 在环形光束到达环状聚光透镜部件之前，设置在光路中的光束。