公开(公告)号：US20110234507A1

公开(公告)日：2011-09-29

申请号：US12847327

申请日：2010-07-30

Applicant: SHIH-LIANG CHOU ,  HSUEH-CHIH CHIANG ,  CHIEN-MIN WENG ,  TZU-WEN CHU ,  FU-JEN WANG ,  I-WEN LEE ,  HSING-YEH CHEN

Inventor： SHIH-LIANG CHOU ,  HSUEH-CHIH CHIANG ,  CHIEN-MIN WENG ,  TZU-WEN CHU ,  FU-JEN WANG ,  I-WEN LEE ,  HSING-YEH CHEN

IPC: G06F3/041 ,  C23C14/34

CPC classification number: G06F3/044 ,  G06F2203/04103

Abstract: The present invention provides an integrated touch panel comprising a transparent substrate, one of an icon or artwork layer, a first layer of optical film, and a first sensing layer. The icon layer or artwork layer is coated on the periphery of one side face of the transparent substrate, and the inner periphery of the icon layer or artwork layer is not perpendicular to the adjacent line of the transparent substrate. The first layer of optical film is stacked on icon layer or artwork layer and the areas on the transparent substrate uncovered with icon layer. The first sensing layer is stacked on the first layer of optical film by sputtering. The interchangeability is included in the patent claim of the present invention. As icon layer or artwork layer is not perpendicular to the transparent substrate, the subsequent cladding of the structures may be completed by sputtering or other methods.

Abstract translation: 本发明提供了一种集成触摸面板，其包括透明基板，图标或图案层之一，第一层光学膜和第一感测层。 图标层或艺术品层涂覆在透明基板的一个侧面的周边上，图标层或艺术品层的内周不垂直于透明基板的相邻线。 第一层光学膜层叠在图标层或艺术品层上，透明基板上的区域被图标层覆盖。 第一感测层通过溅射堆叠在第一层光学膜上。 互换性包括在本发明的专利权利要求中。 由于图标层或艺术品层不垂直于透明基底，因此可以通过溅射或其它方法来完成随后的结构包层。

公开(公告)号：US20100214230A1

公开(公告)日：2010-08-26

申请号：US11978555

申请日：2007-10-30

Applicant: Jau-Jier Chu ,  I-Wen Lee ,  Shih-Liang Chou ,  Po-Yao Lai ,  Chien-Min Weng

Inventor： Jau-Jier Chu ,  I-Wen Lee ,  Shih-Liang Chou ,  Po-Yao Lai ,  Chien-Min Weng

IPC: G06F3/041 ,  B32B17/06 ,  B32B27/06 ,  C23C14/34

CPC classification number: G06F3/041 ,  C03C17/2453 ,  C03C2217/231 ,  C03C2218/154 ,  C03C2218/32 ,  C03C2218/345 ,  C23C14/086 ,  C23C14/5806 ,  Y10T428/265

Abstract: A two-stage manufacturing process for preparation of an ITO layer includes having first a transparent substrate, e.g., a glass or plastic substrate going through treatment without preheating; the substrate is then sputtering processed in a sputtering chamber under process conditions without heating up to form a amorphous state ITO film on the surface of the transparent substrate; followed with a thermal treatment at a preset temperature to turn the ITO layer into a crystalline state without compromising strength of the glass or the plastic substrate while delivering a durable ITO layer and a structure of ITO layer provided with a specific sheet resistance and/or thickness. The ITO layer produced using the present invention particularly fits to be applied in a touch screen structure.

Abstract translation: 用于制备ITO层的两阶段制造方法包括首先具有透明衬底，例如通过处理而不预热的玻璃或塑料衬底; 然后在工艺条件下在溅射室中对衬底进行溅射处理，而不加热，以在透明衬底的表面上形成非晶态ITO膜; 然后在预设温度下进行热处理，以将ITO层转变成结晶状态，而不损害玻璃或塑料基板的强度，同时传送耐用的ITO层和设置有特定薄层电阻和/或厚度的ITO层的结构 。 使用本发明生产的ITO层特别适用于触摸屏结构。

公开(公告)号：US20100101937A1

公开(公告)日：2010-04-29

申请号：US12260092

申请日：2008-10-29

Applicant: Chien-Min Weng ,  Tzu-Wen Chu ,  Chiao-Ning Huang ,  I-Wen Lee ,  Shih-Liang Chou

Inventor： Chien-Min Weng ,  Tzu-Wen Chu ,  Chiao-Ning Huang ,  I-Wen Lee ,  Shih-Liang Chou

IPC: C23C14/34

CPC classification number: C23C14/025 ,  C23C14/086 ,  C23C14/34

Abstract: A method of fabricating transparent conductive film including the following steps is provided. First, a reactive chamber having at least a target and at least a heating device is provided. Subsequentially, a plasma is generated in the reactive chamber, wherein the plasma is located above the target. Next, the plasma is heated by the heating device from a standby temperature to a working temperature. Simultaneously, a hard plastic substrate is passed above the plasma at a specific speed, wherein the particles of the target are bombarded by the plasma so as to form transparent conductive film on the hard plastic substrate.

Abstract translation: 提供一种制造透明导电膜的方法，包括以下步骤。 首先，提供具有至少目标物和至少一个加热装置的活性室。 其次，在反应室中产生等离子体，其中等离子体位于靶上方。 接下来，等离子体被加热装置从待机温度加热到工作温度。 同时，硬质塑料基板以特定速度通过等离子体上方，其中靶的粒子被等离子体轰击，以在硬塑料基板上形成透明导电膜。

公开(公告)号：US20070119704A1

公开(公告)日：2007-05-31

申请号：US11698904

申请日：2007-01-29

Applicant: Jau-Jier Chu ,  Hsu-Fu Hung ,  I-Wen Lee ,  Chien-Min Weng ,  Tzu-Wen Chu

Inventor： Jau-Jier Chu ,  Hsu-Fu Hung ,  I-Wen Lee ,  Chien-Min Weng ,  Tzu-Wen Chu

IPC: C23C14/00

CPC classification number: C23C14/562 ,  C23C14/086 ,  C23C14/541

Abstract: A method for sputtering a multilayer film on a sheet workpiece at a low temperature of the present invention has the following steps: employing plasma to modify a surface of a sheet workpiece, providing a reciprocating sputtering process to deposit metal oxide layers or semiconductor oxide layers on the sheet workpiece, preheating the sheet workpiece and providing a reciprocating ITO sputtering process to sputter ITO transparent conductive layers on the sheet workpiece. The film sputtering process of the sheet workpiece employs continuously connecting work line and controls delay time between the sputtering units to deposit a film with a predetermined thickness on the sheet workpiece.

Abstract translation: 在本发明的低温下在薄板工件上溅射多层膜的方法具有以下步骤：使用等离子体来改变片材工件的表面，提供往复溅射工艺以将金属氧化物层或半导体氧化物层沉积在 片材工件，预热片材工件，并提供往复式ITO溅射工艺，以在片材工件上溅射ITO透明导电层。 片材工件的薄膜溅射工艺采用连续的连续工作线，并控制溅射单元之间的延迟时间，以在薄板工件上沉积预定厚度的薄膜。