公开(公告)号：US20130149638A1

公开(公告)日：2013-06-13

申请号：US13762083

申请日：2013-02-07

Applicant: Shem OGADHOH ,  Raguraman VENKATESAN ,  Kevin J. HOOKER ,  Sungwon KIM ,  Bin HU ,  Vivek SINGH ,  Bikram BAIDYA ,  Prasad NARENDRA ATKAR ,  Seongtae JEONG

Inventor： Shem OGADHOH ,  Raguraman VENKATESAN ,  Kevin J. HOOKER ,  Sungwon KIM ,  Bin HU ,  Vivek SINGH ,  Bikram BAIDYA ,  Prasad NARENDRA ATKAR ,  Seongtae JEONG

IPC: G03F1/36 ,  G06F17/50 ,  G03F1/68

CPC classification number: G03F1/36 ,  G03F1/68 ,  G06F17/50

Abstract: Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.

Abstract translation: 这里描述的是要连续成像以在诸如半导体晶片的衬底上打印复合图案的一组掩模的掩模设计和建模。 本文进一步描述的是使用该组掩模对衬底进行双重图案化的方法。 这里还描述了一种基于掩模级别中的另一个的预测图案轮廓来校正掩模级中的一个的绘制图案的方法。 本文还描述了一种对光致抗蚀剂施加到非均匀衬底上的掩模级的抗蚀剂轮廓轮廓建模方法，以及预测两个掩模的布尔运算的抗蚀剂轮廓的方法。

公开(公告)号：US20060051680A1

公开(公告)日：2006-03-09

申请号：US10933948

申请日：2004-09-03

Applicant: Alexander Tritchkov ,  Seongtae Jeong

Inventor： Alexander Tritchkov ,  Seongtae Jeong

IPC: G06F17/50 ,  G03F1/00

CPC classification number: G03F1/36 ,  G03F1/30

Abstract: This application includes techniques for applying image imbalance compensation by aperture sizing and optical proximity approximation in designing a phase mask.

Abstract translation: 该应用包括在设计相位掩模时通过孔径尺寸和光学邻近近似应用图像不平衡补偿的技术。

公开(公告)号：US06484306B1

公开(公告)日：2002-11-19

申请号：US09466730

申请日：1999-12-17

Applicant: Jeffrey Bokor ,  Seongtae Jeong

Inventor： Jeffrey Bokor ,  Seongtae Jeong

IPC: G06F1750

CPC classification number: G06T7/0006 ,  G06T2207/30148

Abstract: A method for performing scanned defect inspection of a collection of contiguous areas using a specified false-alarm-rate and capture-rate within an inspection system that has characteristic seek times between inspection locations. The multi-stage method involves setting an increased false-alarm-rate for a first stage of scanning, wherein subsequent stages of scanning inspect only the detected areas of probable defects at lowered values for the false-alarm-rate. For scanning inspection operations wherein the seek time and area uncertainty is favorable, the method can substantially increase inspection throughput.

Abstract translation: 一种在检查系统内使用指定的误报率和捕获率对连续区域的集合进行扫描缺陷检查的方法，所述检查系统在检查位置之间具有特征寻找时间。 多级方法涉及为第一级扫描设置增加的误报率，其中扫描的后续阶段仅在检测到的可能缺陷区域以较低的值检查误报率。 对于扫描检查操作，其中寻求时间和面积不确定性是有利的，该方法可以显着增加检查吞吐量。