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    Laser Optical System, Repair Apparatus And Method Using The Same
    13.
    发明申请
    Laser Optical System, Repair Apparatus And Method Using The Same 有权
    激光光学系统，修复设备及其使用方法

    公开(公告)号：US20120103955A1

    公开(公告)日：2012-05-03

    申请号：US13279716

    申请日：2011-10-24

    Applicant: Jeong Woo Hyun ,  Jung Sub Lee ,  Sung Jin Lee ,  Sang Kyu Lim ,  Kwang Soo Kim ,  Jae Kwang Lee

    Inventor： Jeong Woo Hyun ,  Jung Sub Lee ,  Sung Jin Lee ,  Sang Kyu Lim ,  Kwang Soo Kim ,  Jae Kwang Lee

    IPC: B23K26/03

    CPC classification number: B23K26/02 ,  B23K26/0648 ,  B23K26/08 ,  B23K26/082 ,  G02B7/02 ,  G02F1/1303 ,  G02F1/1309

    Abstract: According to example embodiments, a laser optical system includes a laser generator, at least one scan module, an objective lens, a relay lens, a review optical system, and a control device. The laser generator is configured to generate a laser beam. The at least one scan module is configured to reflect the laser beam generated by the laser generator and to direct the laser beam in different directions. The objective lens is configured to focus the laser beam on a substrate. The relay lens is configured to guide the laser beam scanned by the at least one scan module to within an incident range of the objective lens. The review optical system is configured to monitor, in real time, repair of the substrate using the laser beam. The control device is configured to control the at least one scan module.

    Abstract translation: 根据示例实施例，激光光学系统包括激光发生器，至少一个扫描模块，物镜，中继透镜，复查光学系统和控制装置。 激光发生器被配置为产生激光束。 所述至少一个扫描模块被配置为反射由激光发生器产生的激光束并且将激光束引向不同的方向。 物镜配置成将激光束聚焦在基板上。 中继透镜被配置为将由至少一个扫描模块扫描的激光束引导到物镜的入射范围内。 检查光学系统被配置为实时地监视使用激光束修复衬底。 所述控制装置被配置为控制所述至少一个扫描模块。

    Apparatus and method for negotiating frame offset between base station and relay station in broadband wireless communication system using multi-hop relay scheme
    15.
    发明授权
    Apparatus and method for negotiating frame offset between base station and relay station in broadband wireless communication system using multi-hop relay scheme 有权
    使用多跳中继方案在宽带无线通信系统中协商基站与中继站之间的帧偏移的装置和方法

    公开(公告)号：US08040830B2

    公开(公告)日：2011-10-18

    申请号：US12074318

    申请日：2008-03-03

    Applicant: Jung-Je Son ,  Hyoung-Kyu Lim ,  Chang-Yoon Oh ,  Sung-Jin Lee ,  Young-Bin Chang ,  Hyun-Jeong Kang

    Inventor： Jung-Je Son ,  Hyoung-Kyu Lim ,  Chang-Yoon Oh ,  Sung-Jin Lee ,  Young-Bin Chang ,  Hyun-Jeong Kang

    IPC: H04B7/14

    CPC classification number: H04B7/15592

    Abstract: Provided are an apparatus and method for negotiating a frame offset between a Base Station (BS) and a Relay Station (RS) in a wireless communication system using a multi-hop relay scheme. A communication method of a superordinate station includes, upon detecting an initial access of an relay station, determining an offset value between a frame number used in the superordinate station and a frame number to be used in the relay station; generating a message including RS frame offset information corresponding to the offset value; and transmitting the generated message to the relay station. Accordingly, since the base station and the relay station share the frame offset, the base station can transmit a specific broadcast message in advance to the relay station by considering the frame offset, and the relay station can transmit data, which has to be transmitted in synchronization with the base station at the same time point or at the same frame number, to a Mobile Station (MS) at an exact time point.

    Abstract translation: 提供了一种用于在使用多跳中继方案的无线通信系统中协商基站（BS）和中继站（RS）之间的帧偏移的装置和方法。 上级站的通信方法在检测到中继站的初始接入时，包括确定上位站使用的帧号与中继站中要使用的帧号之间的偏移值; 产生包括对应于偏移值的RS帧偏移信息的消息; 以及将生成的消息发送到中继站。 因此，由于基站和中继站共享帧偏移，所以基站可以通过考虑帧偏移预先向中继站发送特定广播消息，并且中继站可以发送必须在 在同一时间点或相同帧号与基站同步，在确切的时间点向移动台（MS）发送。

    Semiconductor manufacturing apparatus
    18.
    发明申请
    Semiconductor manufacturing apparatus 有权
    半导体制造装置

    公开(公告)号：US20110042588A1

    公开(公告)日：2011-02-24

    申请号：US12805735

    申请日：2010-08-17

    Applicant: George Barbastathis ,  Jose Antonio Dominguez-Caballero ,  Sung Jin Lee ,  Satoshi Takahashi

    Inventor： George Barbastathis ,  Jose Antonio Dominguez-Caballero ,  Sung Jin Lee ,  Satoshi Takahashi

    IPC: H01L21/02

    CPC classification number: G03F7/70291 ,  G03F7/70316 ,  G03F7/70533

    Abstract: Disclosed herein is a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus precisely adjusts the position and size of a light spot formed on a substrate, enabling formation of a target pattern or elimination of an unnecessary pattern in an accurate and rapid manner. The semiconductor manufacturing apparatus includes a light source, a light modulator to modulate light irradiated from the light source into a plurality of beams to correspond to a target pattern, a diffraction element to adjust a direction of each of the plurality of beams, and an optics system to allow the plurality of beams, the direction of which has been controlled by the diffraction element, to form a light spot having a target size.

    Abstract translation: 这里公开了一种半导体制造装置。 半导体制造装置精确地调整形成在基板上的光点的位置和尺寸，能够以准确且快速的方式形成目标图案或消除不必要的图案。 半导体制造装置包括光源，光调制器，用于将从光源照射的光调制成对应于目标图案的多个光束，用于调整多个光束中的每一个的方向的衍射元件，以及光学器件 系统允许其方向已被衍射元件控制的多个光束形成具有目标尺寸的光点。

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