中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

34 records (took 0.013 seconds)

    MEASURING ELASTIC MODULI OF DIELECTRIC THIN FILMS USING AN OPTICAL METROLOGY SYSTEM
    14.
    发明申请
    MEASURING ELASTIC MODULI OF DIELECTRIC THIN FILMS USING AN OPTICAL METROLOGY SYSTEM 有权
    使用光学计量系统测量介质薄膜的弹性模量

    公开(公告)号：US20060072120A1

    公开(公告)日：2006-04-06

    申请号：US10960351

    申请日：2004-10-06

    Applicant: Sean Leary ,  Guray Tas ,  Christopher Morath ,  Michael Kotelyanskii ,  Tong Zheng ,  Guenadiy Lazarov ,  Andre Miller ,  George Antonelli ,  Jamie Ludke

    Inventor： Sean Leary ,  Guray Tas ,  Christopher Morath ,  Michael Kotelyanskii ,  Tong Zheng ,  Guenadiy Lazarov ,  Andre Miller ,  George Antonelli ,  Jamie Ludke

    IPC: G01B11/02

    CPC classification number: G01N21/211 ,  G01N21/8422

    Abstract: An optical metrology system is provided with a data analysis method to determine the elastic moduli of optically transparent dielectric films such as silicon dioxide, other carbon doped oxides over metal or semiconductor substrates. An index of refraction is measured by an ellipsometer and a wavelength of a laser beam is measured using a laser spectrometer. The angle of refraction is determined by directing a light pulse focused onto a wafer surface, measuring a first set of x1, y1, and z1 coordinates, moving the wafer in the z direction, directing the light pulse onto the wafer surface and measuring a second set of x2, y2 and z2 coordinates, using the coordinates to calculate an angle of incidence, calculating an angle of refraction from the calculated angle of incidence, obtaining a sound velocity v, from the calculated angle of refraction and using the determined sound velocity v, to calculate a bulk modulus. Hardware calibration and adjustments for the optical metrology system are also provided in order to minimize the variation of the results from tool to tool down to about 0.5% or below.

    Abstract translation: 光学测量系统具有数据分析方法，以确定光学透明介电膜的弹性模量，例如二氧化硅，金属或半导体衬底上的其他碳掺杂氧化物。 使用椭偏仪测量折射率，使用激光光谱仪测量激光束的波长。 通过将聚焦在晶片表面上的光脉冲引导，测量第一组x 1，y 1和z 1，确定折射角， SUB>坐标，沿z方向移动晶片，将光脉冲引导到晶片表面上并测量第二组x 2，y 2和z 2， 2坐标，使用坐标来计算入射角，从计算的入射角计算折射角，从计算的折射角获得声速v，并使用确定的声速v，到 计算体积模量。 还提供了光学测量系统的硬件校准和调整，以便将结果从工具到工具的降低最小化到约0.5％或更低。

    DEVICE IN WIRELESS COMMUNICATION SYSTEM, WIRELESS COMMUNICATION SYSTEM AND METHOD
    15.
    发明申请
    DEVICE IN WIRELESS COMMUNICATION SYSTEM, WIRELESS COMMUNICATION SYSTEM AND METHOD 审中-公开
    无线通信系统中的设备，无线通信系统和方法

    公开(公告)号：US20160286562A1

    公开(公告)日：2016-09-29

    申请号：US15035654

    申请日：2014-11-28

    Applicant: Qimei CUI ,  Tong ZHENG ,  Hui WANG ,  Hui WANG

    Inventor： Qimei CUI ,  Tong ZHANG ,  Weijuan GAO ,  Hui WANG

    IPC: H04W72/08 ,  H04W72/04 ,  H04B7/02 ,  H04W28/02

    CPC classification number: H04W72/082 ,  H04B7/024 ,  H04W28/0236 ,  H04W72/042 ,  H04W72/085

    Abstract: A wireless communication system, wireless communication system and method, the device on the base station side in the wireless communication system including: an edge user equipment (UE) identification unit configured to identify the edge UE on the enhanced physical downlink control channel (EPDCCH) according to the information about the UE received from the UE; and an interference coordination unit configured to apply an interference coordination plan to the EPDCCH of the edge UE. Applying the interference coordination plan to the EPDCCH of the edge UE improves service quality of the edge UE; and setting a proper degree of enhanced control channel element aggregation for the edge UE reduces the number of blind tests of the UE, thus increasing the system response speed.

    Abstract translation: 一种无线通信系统，无线通信系统和方法，所述无线通信系统中的基站侧的装置包括：边缘用户设备（UE）识别单元，被配置为识别所述增强物理下行链路控制信道（EPDCCH）上的边缘UE， 根据从UE接收到的UE的信息; 以及干扰协调单元，被配置为将干扰协调计划应用于边缘UE的EPDCCH。 将干扰协调方案应用于边缘UE的EPDCCH提高了边缘UE的业务质量; 并为边缘UE设置适当程度的增强型控制信道单元聚合减少了UE的盲目测试次数，从而提高了系统响应速度。

Patent Agency Ranking