Processing of semiconductor components with dense processing fluids
    12.
    发明申请
    Processing of semiconductor components with dense processing fluids 审中-公开
    用密集加工液加工半导体元件

    公开(公告)号:US20080004194A1

    公开(公告)日:2008-01-03

    申请号:US11834800

    申请日:2007-08-07

    IPC分类号: C11D7/00

    摘要: Methods for generating a single-phase supercritical dense processing fluid have been disclosed. The single-phase supercritical dense processing fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. At least one processing agent is added to the pressurization vessel, or to the processing chamber, or to the single-phase supercritical dense fluid during transfer from the pressurization vessel to the processing chamber; to produce the single-phase supercritical dense processing fluid. Methods for processing an article with a single-phase supercritical dense processing fluid in a processing chamber are also disclosed.

    摘要翻译: 已经公开了生产单相超临界致密加工流体的方法。 单相超临界致密加工流体可以在单独的加压容器中产生并转移到处理室,或者可以直接在处理室中产生。 在从加压容器到处理室的转移期间,至少一种加工剂被加入到加压容器或处理室中,或加到单相超临界稠密流体中; 生产单相超临界浓缩加工液。 还公开了在处理室中用单相超临界致密加工流体处理制品的方法。

    Cleaning of contaminated articles by aqueous supercritical oxidation
    13.
    发明申请
    Cleaning of contaminated articles by aqueous supercritical oxidation 审中-公开
    用超临界氧化水溶液清洗污染物

    公开(公告)号:US20070240740A1

    公开(公告)日:2007-10-18

    申请号:US11403749

    申请日:2006-04-13

    申请人: Wayne McDermott

    发明人: Wayne McDermott

    IPC分类号: B08B3/12

    摘要: Method for removing contaminant material from a contaminated article comprising contacting the contaminated article with a reactive cleaning fluid comprising water and an oxidant material at a temperature at or above the critical temperature of the reactive cleaning fluid and a pressure at or above the critical pressure of the reactive cleaning fluid, oxidizing at least a portion of the contaminant material to yield a cleaned article and a product mixture comprising unreacted reactive cleaning fluid and removed contaminant material, and separating the product mixture from the cleaned article.

    摘要翻译: 从被污染物品中去除污染物质的方法,包括使污染物品与包含水和氧化剂物质的反应性清洁流体在等于或高于反应性清洁流体的临界温度的温度下接触, 氧化至少一部分污染物质以产生清洁的制品,以及包含未反应的反应性清洁流体和去除的污染物质的产品混合物,以及将产品混合物与经清洁的物品分离。