公开(公告)号：US07581549B2

公开(公告)日：2009-09-01

申请号：US11178545

申请日：2005-07-12

申请人： Andrew David Johnson ,  Hoshang Subawalla ,  Bing Ji ,  Raymond Nicholas Vrtis ,  Eugene Joseph Karwacki, Jr. ,  Robert Gordon Ridgeway ,  Peter James Maroulis ,  Mark Leonard O'Neill ,  Aaron Scott Lukas ,  Stephen Andrew Motika

发明人： Andrew David Johnson ,  Hoshang Subawalla ,  Bing Ji ,  Raymond Nicholas Vrtis ,  Eugene Joseph Karwacki, Jr. ,  Robert Gordon Ridgeway ,  Peter James Maroulis ,  Mark Leonard O'Neill ,  Aaron Scott Lukas ,  Stephen Andrew Motika

IPC分类号： C25F1/00 ,  C25F3/30 ,  C25F5/00

CPC分类号： C23C16/4405

摘要： A process for removing carbon-containing residues from a substrate is described herein. In one aspect, there is provided a process for removing carbon-containing residue from at least a portion of a surface of a substrate comprising: providing a process gas comprising an oxygen source, a fluorine source, an and optionally additive gas wherein the molar ratio of oxygen to fluorine contained within the process gas ranges from about 1 to about 10; activating the process gas using at least one energy source to provide reactive species; and contacting the surface of the substrate with the reactive species to volatilize and remove the carbon-containing residue from the surface.

摘要翻译： 本文描述了用于从基底去除含碳残留物的方法。 一方面，提供了从基材表面的至少一部分去除含碳残余物的方法，其包括：提供包含氧源，氟源和任选添加气体的工艺气体，其中摩尔比 在工艺气体中所含的氧与氟的含量范围为约1至约10; 使用至少一个能量源来激活所述工艺气体以提供反应性物质; 并使基材的表面与反应性物质接触，从表面挥发并除去含碳残渣。

公开(公告)号：US07074378B2

公开(公告)日：2006-07-11

申请号：US10763365

申请日：2004-01-23

申请人： James Joseph Hart ,  Philip Bruce Henderson ,  Howard Paul Withers, Jr. ,  Madhukar Bhaskara Rao ,  Hoshang Subawalla

发明人： James Joseph Hart ,  Philip Bruce Henderson ,  Howard Paul Withers, Jr. ,  Madhukar Bhaskara Rao ,  Hoshang Subawalla

IPC分类号： C01B21/06

CPC分类号： C01G41/04 ,  C01B7/195 ,  C01B9/08 ,  C01B21/0837

摘要： This invention describes an improvement in a process for purifying a nitrogen trifluoride (NF3) stream containing unreacted F2, HF, and nitrogen oxides from an NF3 reactor wherein the F2, and HF are removed and then the nitrogen oxides removed by adsorption. The improvement in the process resides in selectively removing the F2 from said NF3 stream without generating oxygen difluoride, removing HF and then removing said nitrogen oxides by adsorption. Further purification can be effected as desired.

摘要翻译： 本发明描述了一种从NF 3纯化含有未反应的F 2 H 2，HF和氮氧化物的三氟化氮（NF 3 H 3）流的方法的改进， / SUB>反应器，其中除去F 2 H和HF，然后通过吸附除去氮氧化物。 该方法的改进在于从所述NF 3 N流中选择性除去F 2 O而不产生二氟化氧，除去HF，然后通过吸附除去所述氮氧化物。 可以根据需要进一步纯化。

公开(公告)号：US20060081273A1

公开(公告)日：2006-04-20

申请号：US10969595

申请日：2004-10-20

申请人： Wayne McDermott ,  Hoshang Subawalla ,  Madhukar Rao ,  Dean Roth ,  Keith Fabregas

发明人： Wayne McDermott ,  Hoshang Subawalla ,  Madhukar Rao ,  Dean Roth ,  Keith Fabregas

IPC分类号： B08B3/00

CPC分类号： B08B7/0021 ,  G03F7/422 ,  H01L21/02057 ,  H01L21/02063 ,  H01L21/02101 ,  H05K3/26

摘要： A method for removing contaminants from an article is described herein. In one embodiment, there is provided a method comprising loosening at least a portion of the contaminants by treating the article with a treatment method involving a processing fluid and/or dense processing fluid to provide a partially treated article comprising loosened contaminants; contacting the partially treated article with a dense rinse fluid comprising a dense fluid, optionally a co-solvent, and optionally an entrainer to remove liquid-based contaminants; and removing at least a portion of the loosened contaminants by exposing the partially treated article with at least one exposure method to provide a treated article wherein the selection of the at least one exposure method depends upon whether the loosened contaminants are wet or dry.

摘要翻译： 本文描述了从制品中除去污染物的方法。 在一个实施方案中，提供了一种方法，包括通过用涉及加工流体和/或致密加工流体的处理方法处理制品来松散至少一部分污染物，以提供包含松散的污染物的部分处理的制品; 使部分处理的制品与致密的流体，任选的助溶剂和任选的夹带剂一起使用，以除去液体基的污染物; 以及通过用至少一种曝光方法暴露所述部分处理的制品来除去所述松散的污染物的至少一部分，以提供经处理的制品，其中所述至少一种曝光方法的选择取决于松散的污染物是湿的还是干的。

公开(公告)号：US20050029490A1

公开(公告)日：2005-02-10

申请号：US10737203

申请日：2003-12-16

申请人： Hoshang Subawalla ,  Gene Parris ,  Christopher Mammarella ,  Bridget O'Brien ,  Keith Fabregas ,  Madhukar Rao ,  Christine Kretz

发明人： Hoshang Subawalla ,  Gene Parris ,  Christopher Mammarella ,  Bridget O'Brien ,  Keith Fabregas ,  Madhukar Rao ,  Christine Kretz

IPC分类号： C11D1/72 ,  C11D3/16 ,  C11D3/20 ,  C09K5/00

CPC分类号： C11D3/2031 ,  C11D1/72 ,  C11D3/164 ,  C11D3/2027

摘要： A dense cleaning fluid for removing contaminants from a substrate and a method comprising same is disclosed herein. In one embodiment of the present invention, the dense cleaning fluid comprises a dense fluid and at least one acetylenic diol or acetylenic alcohol surfactant.

摘要翻译： 用于从基底去除污染物的致密清洁流体及其包含方法在此公开。 在本发明的一个实施方案中，致密清洁流体包含致密流体和至少一种炔属二醇或炔属醇表面活性剂。

公开(公告)号：US07267727B2

公开(公告)日：2007-09-11

申请号：US10737458

申请日：2003-12-16

申请人： Wayne Thomas McDermott ,  Hoshang Subawalla ,  Andrew David Johnson ,  Alexander Schwarz

发明人： Wayne Thomas McDermott ,  Hoshang Subawalla ,  Andrew David Johnson ,  Alexander Schwarz

IPC分类号： B08B7/04

CPC分类号： H01L21/02052 ,  B08B3/12 ,  B08B7/0021 ,  C11D7/241 ,  C11D7/261 ,  C11D7/263 ,  C11D7/264 ,  C11D7/3209 ,  C11D7/3263 ,  C11D7/3281 ,  C11D7/5013 ,  C11D7/5022 ,  C11D11/007 ,  G03F1/82 ,  H01L21/31133 ,  H01L21/67057

摘要： Method for processing an article with a dense processing fluid in a processing chamber while applying ultrasonic energy during processing. The dense fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. A processing agent may be added to the pressurization vessel, to the processing chamber, or to the dense fluid during transfer from the pressurization vessel to the processing chamber. The ultrasonic energy may be generated continuously at a constant frequency or at variable frequencies. Alternatively, the ultrasonic energy may be generated intermittently.

摘要翻译： 在加工过程中施加超声波能量的同时，在处理室中处理具有致密加工流体的制品的方法。 致密流体可以在单独的加压容器中产生并转移到处理室，或者可以直接在处理室中产生。 在从加压容器转移到处理室的过程中，加压剂可以加入到加压容器中，或者加到致密流体中。 超声能量可以以恒定频率或以可变频率连续生成。 或者，可以间歇地产生超声波能量。

公开(公告)号：US20070137675A1

公开(公告)日：2007-06-21

申请号：US11702317

申请日：2007-02-05

申请人： Wayne McDermott ,  Gene Parris ,  Dean Roth ,  Hoshang Subawalla

发明人： Wayne McDermott ,  Gene Parris ,  Dean Roth ,  Hoshang Subawalla

IPC分类号： B08B3/00 ,  B08B3/12 ,  B08B7/00

CPC分类号： B08B7/0021 ,  B08B1/00 ,  B08B3/02 ,  B08B3/12 ,  Y10S134/902

摘要： Method for removing flux residue and defluxing residue from an article using a dense processing fluid and a dense rinse fluid is disclosed herein. In one embodiment, there is provided a method comprising: introducing the article comprising contaminants into a processing chamber; contacting the article with a dense processing fluid comprising a dense fluid, at least one processing agent, and optionally a cosolvent to provide a partially treated article; and contacting the partially treated article with a dense rinse fluid comprising the dense fluid and optionally the cosolvent to provide a treated article wherein an agitation source is introducing during at least a portion of the first and/or the second contacting step.

公开(公告)号：US20080000505A1

公开(公告)日：2008-01-03

申请号：US11832968

申请日：2007-08-02

申请人： WAYNE MCDERMOTT ,  HOSHANG SUBAWALLA ,  ANDREW JOHNSON ,  ALEXANDER SCHWARZ ,  RICHARD OCKOVIC

发明人： WAYNE MCDERMOTT ,  HOSHANG SUBAWALLA ,  ANDREW JOHNSON ,  ALEXANDER SCHWARZ ,  RICHARD OCKOVIC

IPC分类号： B08B13/00

CPC分类号： H01L21/31133 ,  B08B3/12 ,  B08B7/0021 ,  C11D7/241 ,  C11D7/261 ,  C11D7/263 ,  C11D7/264 ,  C11D7/3209 ,  C11D7/3263 ,  C11D7/3281 ,  C11D7/5013 ,  C11D7/5022 ,  C11D11/007 ,  G03F1/82 ,  H01L21/02052 ,  H01L21/02101 ,  H01L21/6704 ,  H01L21/67057

摘要： Apparatus for processing an article with a single-phase supercritical dense processing fluid in a processing chamber while applying ultrasonic energy during processing. The single-phase supercritical dense fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. A processing agent may be added to the pressurization vessel, to the processing chamber, or to the single-phase supercritical dense fluid during transfer from the pressurization vessel to the processing chamber. The ultrasonic energy may be generated continuously at a constant frequency or at variable frequencies. Alternatively, the ultrasonic energy may be generated intermittently.

摘要翻译： 用于在处理室中处理具有单相超临界致密处理流体的制品的设备，同时在处理期间施加超声波能量。 单相超临界致密流体可以在单独的加压容器中产生并转移到处理室，或者可以直接在处理室中产生。 在从加压容器转移到处理室的过程中，可将加工剂加入到加压容器中，或加入到单相超临界稠密流体中。 超声能量可以以恒定频率或以可变频率连续生成。 或者，可以间歇地产生超声波能量。

公开(公告)号：US07211553B2

公开(公告)日：2007-05-01

申请号：US10737203

申请日：2003-12-16

申请人： Hoshang Subawalla ,  Gene Everad Parris ,  Madhukar Bhaskara Rao ,  Christine Peck Kretz

发明人： Hoshang Subawalla ,  Gene Everad Parris ,  Madhukar Bhaskara Rao ,  Christine Peck Kretz

IPC分类号： C11D7/32

CPC分类号： C11D3/2031 ,  C11D1/72 ,  C11D3/164 ,  C11D3/2027

摘要： A dense cleaning fluid for removing contaminants from a substrate and a method comprising same is disclosed herein. In one embodiment of the present invention, the dense cleaning fluid comprises a dense fluid and at least one acetylenic diol or acetylenic alcohol surfactant.

摘要翻译： 用于从基底去除污染物的致密清洁流体及其包含方法在此公开。 在本发明的一个实施方案中，致密清洁流体包含致密流体和至少一种炔属二醇或炔属醇表面活性剂。

公开(公告)号：US20060027249A1

公开(公告)日：2006-02-09

申请号：US11178545

申请日：2005-07-12

申请人： Andrew Johnson ,  Hoshang Subawalla ,  Bing Ji ,  Raymond Vrtis ,  Eugene Karwacki ,  Robert Ridgeway ,  Peter Maroulis ,  Mark O'Neill ,  Aaron Lukas ,  Stephen Motika

发明人： Andrew Johnson ,  Hoshang Subawalla ,  Bing Ji ,  Raymond Vrtis ,  Eugene Karwacki ,  Robert Ridgeway ,  Peter Maroulis ,  Mark O'Neill ,  Aaron Lukas ,  Stephen Motika

IPC分类号： C25F5/00

CPC分类号： C23C16/4405

摘要： A process for removing carbon-containing residues from a substrate is described herein. In one aspect, there is provided a process for removing carbon-containing residue from at least a portion of a surface of a substrate comprising: providing a process gas comprising an oxygen source, a fluorine source, an and optionally additive gas wherein the molar ratio of oxygen to fluorine contained within the process gas ranges from about 1 to about 10; activating the process gas using at least one energy source to provide reactive species; and contacting the surface of the substrate with the reactive species to volatilize and remove the carbon-containing residue from the surface.

公开(公告)号：US20060011217A1

公开(公告)日：2006-01-19

申请号：US10890502

申请日：2004-07-13

申请人： Wayne McDermott ,  Gene Parris ,  Dean Roth ,  Hoshang Subawalla

发明人： Wayne McDermott ,  Gene Parris ,  Dean Roth ,  Hoshang Subawalla

IPC分类号： B08B3/12

CPC分类号： B08B7/0021 ,  B08B1/00 ,  B08B3/02 ,  B08B3/12 ,  Y10S134/902

摘要： Method for removing flux residue and defluxing residue from an article using a dense processing fluid and a dense rinse fluid is disclosed herein. In one embodiment, there is provided a method comprising: introducing the article comprising contaminants into a processing chamber; contacting the article with a dense processing fluid comprising a dense fluid, at least one processing agent, and optionally a cosolvent to provide a partially treated article; and contacting the partially treated article with a dense rinse fluid comprising the dense fluid and optionally the cosolvent to provide a treated article wherein an agitation source is introducing during at least a portion of the first and/or the second contacting step.

摘要翻译： 本文公开了使用致密加工流体和致密冲洗流体从制品中除去助熔剂残余物和脱硫残渣的方法。 在一个实施方案中，提供了一种方法，包括：将包含污染物的制品引入处理室; 使所述制品与包含致密流体，至少一种加工剂和任选的共溶剂的致密加工流体接触以提供部分处理的制品; 以及使所述部分处理的制品与包含所述致密流体和任选的共溶剂的致密冲洗流体接触以提供经处理的制品，其中在所述第一和/或所述第二接触步骤的至少一部分期间引入搅拌源。