Abstract:
A method of making a negative-working heat-sensitive lithographic printing plate precursor is disclosed, the method comprising the steps of (a) preparing an aqueous dispersion comprising particles of a hydrophobic thermoplastic polymer A which is not soluble or swellable in an aqueous alkaline developer and particles of a polymer B which is soluble or swellable in an aqueous alkaline developer but not soluble or swellable in water, wherein the glass transition temperature of polymer A is higher than the softening temperature of polymer B; (b) applying the aqueous dispersion on a lithographic substrate having a hydrophilic surface, thereby obtaining an image-recording layer; (c) overall heating the image-recording layer at a temperature which is higher than the softening temperature of polymer B without inducing coalescense of the particles of polymer A. The printing plate precursor has improved mechanical resistance.
Abstract:
A positive-working printing plate precursor for wet lithographic printing is disclosed which comprises a support having a hydrophilic surface and a coating comprising a first layer closest to the support, said first layer containing an oleophilic phenolic resin soluble in an aqueous alkaline developer, and a second layer containing an amphyphilic polymer, wherein (a) the second layer is capable of preventing the aqueous alkaline developer from penetrating into the first layer to an extent that substantially no dissolution of unexposed coating occurs upon immersion in the aqueous alkaline developer during a time period t2; (b) and wherein said capability of the second layer of preventing the aqueous alkaline developer from penetrating into the first layer is reduced upon exposure to heat or light to an extent that substantially complete dissolution of exposed coating occurs upon immersion in the aqueous alkaline developer during a time period t1; wherein t2>t1 and t2nullt1 is at least 10 seconds; and wherein the amphyphilic polymer is a block- or graft-copolymer comprising (i) a poly(alkylene oxide) block and (ii) a block comprising siloxane and/or perfluorohydrocarbon units.