公开(公告)号：US20040209194A1

公开(公告)日：2004-10-21

申请号：US10797577

申请日：2004-03-11

申请人： Semiconductor Leading Edge Technologies, Inc. ,  Ushio Denki Kabushiki Kaisha

发明人： Satoshi Kume ,  Nobuyuki Hishinuma ,  Hiroshi Sugahara

IPC分类号： G03F007/26

CPC分类号： H01L21/0206 ,  H01L21/31111

摘要： A substrate supporting film to be etched is held on a rotating stage. Ultraviolet light having a wavelength of 200 nm or shorter radiated from first lamps irradiates the film in air, thereby removing organic coatings from the film and making the surface of the film hydrophilic. A chemical solution applied to the hydrophilic film while rotating the substrate. Ultraviolet light having a wavelength longer than 200 nm is radiated from second lamps and onto the film through the chemical solution.

摘要翻译： 要蚀刻的基底支撑膜保持在旋转台上。 从第一灯辐射的具有200nm或更短波长的紫外光在空气中照射该膜，从而从膜中除去有机涂层并使膜的表面亲水。 在旋转衬底的同时施加到亲水膜的化学溶液。 波长超过200nm的紫外光通过化学溶液从第二个灯辐射到膜上。

公开(公告)号：US20040180300A1

公开(公告)日：2004-09-16

申请号：US10389214

申请日：2003-03-14

发明人： David W. Minsek ,  Melissa K. Murphy ,  David Daniel Bernhard ,  Thomas H. Baum

IPC分类号： G03F007/26 ,  B08B006/00

CPC分类号： C11D3/30 ,  C11D1/72 ,  C11D3/044 ,  C11D3/3947 ,  C11D3/3955 ,  C11D3/3956 ,  C11D3/43 ,  C11D7/06 ,  C11D7/3209 ,  C11D7/3281 ,  C11D7/34 ,  C11D7/50 ,  C11D11/0047 ,  C23G1/20 ,  G03F7/423 ,  G03F7/425 ,  H01L21/02052 ,  H01L21/0206 ,  H01L21/31116 ,  H01L21/31133 ,  Y10S438/906

摘要： Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In another embodiment, a method for removing photoresist is provided. The method comprises the steps of applying a wet-cleaning composition comprising about 0.1 to about 30 weight percent strong base; about one to about 30 weight percent oxidant; about 20 to about 95 weight percent polar solvent; and removing the photoresist.

摘要翻译： 本文公开了一种用于半导体处理的组合物和方法。 在一个实施方案中，提供了用于去除光致抗蚀剂的湿清洁组合物。 组合物包含强碱; 氧化剂 和极性溶剂。 在另一个实施例中，提供了一种去除光致抗蚀剂的方法。 该方法包括以下步骤：施加包含约0.1至约30重量％的强碱的湿清洁组合物; 约1至约30重量％的氧化剂; 约20至约95重量％的极性溶剂; 并去除光致抗蚀剂。

公开(公告)号：US20040161704A1

公开(公告)日：2004-08-19

申请号：US10368262

申请日：2003-02-18

发明人： Jianbing Huang

IPC分类号： G03F007/24 ,  G03F007/26 ,  B41C001/06 ,  B41C001/18

CPC分类号： B41C1/003

摘要： A method for making a relief printing plate, by using a lithographic printing plate to create ink-receptive areas on a receiver base. The relief printing plate has ink-receptive cured areas defining an image. The method comprises the steps of: a) imaging a lithographic printing plate precursor to produce a lithographic printing plate having ink-receptive image areas and ink-repellent non-image areas; b) applying a first curable composition to the lithographic printing plate, to form a coating of the first curable composition on ink-receptive image areas; c) contacting the coating to the receiver base to make an impression on the receiver base; and d) curing the impression on the receiver base to produce ink-receptive cured areas defining an image. In the practice of an embodiment of the invention, a modified rotary printing press may be employed to make a relief printing plate on a receiver base using a lithographic printing plate.

摘要翻译： 一种通过使用平版印刷版在接收器底座上产生吸墨区域来制造凸版印刷版的方法。 凸版印刷版具有限定图像的吸墨固化区域。 该方法包括以下步骤：a）对平版印刷版前体进行成像以产生具有油墨接收图像区域和拒墨非图像区域的平版印刷版; b）将第一可固化组合物施加到平版印刷版上，以在受墨图像区域上形成第一可固化组合物的涂层; c）将涂层接触接收器底座以在接收器底座上产生印象; 以及d）固化接收器底座上的印模以产生限定图像的接受油墨的固化区域。 在本发明的一个实施方案的实践中，可以使用改进的旋转印刷机来使用平版印刷版在接收器底座上形成凸版印刷版。

公开(公告)号：US20040106062A1

公开(公告)日：2004-06-03

申请号：US10398873

申请日：2003-04-09

发明人： Viacheslav Alexandrovich Petrov ,  Frank L Schadt III

IPC分类号： G03F007/038 ,  G03F007/26

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0395

摘要： A photoresist composition having a polymeric binder; and a photoactive component selected from the group consisting of (1) hydroxamic acid sulfonoxy esters containing a perfluoroalkyl group containing at least five carbon atoms; (2) S-perfluoroalkyldibenzothiophenium salts, and (3) S-perfluoroalkyldiarylsulfonium salts. These photoactive components are compatible with the polymeric binders that are useful for imaging with exposure to light at the relatively shorter wavelengths, such as 157 nm.

摘要翻译： 具有聚合物粘合剂的光致抗蚀剂组合物; 和选自（1）含有至少5个碳原子的全氟烷基的异羟肟酸磺酰氧基酯的光活性组分; （2）S-全氟烷基二苯并噻吩盐，和（3）S-全氟烷基二芳基锍盐。 这些光活性组分与聚合物粘合剂相容，所述粘合剂可用于在相对较短的波长（例如157nm）下曝光的光成像。

公开(公告)号：US20040106060A1

公开(公告)日：2004-06-03

申请号：US10715454

申请日：2003-11-19

申请人： FUJI PHOTO FILM CO., LTD.

发明人： Kazuo Maemoto

IPC分类号： G03F007/038 ,  G03F007/26

CPC分类号： B41N3/038 ,  B41C1/1008 ,  B41C1/1016 ,  B41C1/1025 ,  B41C2201/02 ,  B41C2201/12 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24

摘要： A lithographic printing plate precursor is disclosed, comprising a hydrophilic support having thereon a heat-sensitive layer containing either a microcapsule containing a compound having a functional group capable of reacting by heat or a fine particulate polymer, wherein (1) when the heat-sensitive layer contains a fine particulate polymer, the fine particulate polymer may be a fine particulate polymer capable of combining or incapable of combining by heat used for the image formation and the fine particulate polymer has a functional group capable of reacting with a functional group present in another fine particulate polymer or with a functional group present in another component in the heat-sensitive layer; or (2) when the heat-sensitive layer contains a microcapsule containing a compound having a functional group capable of reacting by heat, the microcapsule may be a microcapsule having an outer wall capable of rupturing or incapable of rupturing by heat used for the image formation and a light-to-heat converting material is contained in the heat-sensitive layer or in a layer adjacent thereto.

公开(公告)号：US20040067432A1

公开(公告)日：2004-04-08

申请号：US10264814

申请日：2002-10-04

发明人： Anthony P. Kitson ,  Kevin B. Ray ,  Eugene L. Sheriff

IPC分类号： G03F007/021 ,  G03F007/26 ,  G03C001/52

CPC分类号： B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  G03C1/49863

摘要： Multi-layer, positive working, thermally sensitive imageable elements, useful as lithographic printing plate precursors, are disclosed. The elements comprises a substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer comprises polymeric material, which is a solvent soluble novolac resin or a derivative thereof. The polymeric material is a (a) novolac that has a weight average molecular weight of at least 10,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; (b) a solvent soluble m-cresol/p-cresol novolac resins that comprises at least 10 mol % p-cresol and has a weight average molecular weight of at least 8,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; or (c) a mixture thereof. The imageable elements have increased scuff resistance and are thus less susceptible to damage during handling.

摘要翻译： 公开了用作平版印刷版前体的多层，正性，热敏成像元件。 元件包括衬底，衬底上的底层以及衬底上的顶层。 顶层包括聚合物材料，其是溶剂可溶性酚醛清漆树脂或其衍生物。 聚合物材料是重均分子量为至少10,000的（a）酚醛清漆，用极性基团官能化的衍生物或其用四氢键合实体官能化的衍生物; （b）溶剂可溶的间甲酚/对甲酚酚醛清漆树脂，其包含至少10摩尔％的对甲酚并且具有至少8,000的重均分子量，用极性基团官能化的衍生物或其官能化衍生物 具有四氢氢键实体; 或（c）它们的混合物。 可成像元件具有增加的抗磨损性，因此在处理期间不易受到损坏。

公开(公告)号：US20040035605A1

公开(公告)日：2004-02-26

申请号：US10646146

申请日：2003-08-22

申请人： Massachusetts Institute of Technology

发明人： Saul Griffith ,  Joseph M. Jacobson ,  Scott Manalis

IPC分类号： H05K001/09 ,  H05K001/00 ,  G03F007/20 ,  G03F007/16 ,  G03F007/26

CPC分类号： B81C1/00373 ,  B81B2207/07 ,  B82Y30/00 ,  G03F7/00 ,  G03F7/002 ,  G03F7/0042 ,  H01L21/288 ,  H01L51/0004 ,  H05K3/102 ,  H05K3/105 ,  H05K2201/0257 ,  H05K2203/013 ,  H05K2203/107 ,  H05K2203/1131

摘要： Electrically (and, possibly, mechanically) active patterns are applied using a colloidal suspension of nanoparticles that exhibit a desired electrical characteristic. The nanoparticles are surrounded by an insulative shells that may be removed by therefrom by application of energy (e.g., in the form of electromagnetic radiation or heat). The nanoparticle suspension is applied to a surface, forming a layer that is substantially insulative owing to the nanoparticle shells. The applied suspension is exposed to energy to remove the capping groups and fuse the particles into cohesion. If the nanoparticle suspension was deposited as a uniform film, the energy is applied in a desired pattern so that unexposed areas remain insulative while exposed areas exhibit the electrical behavior associated with the nanoparticles. If the nanoparticle suspension was deposited in a desired pattern, it may be uniformly exposed to energy. Additional layers may be applied in the same manner, one over the other, to form a multilayer device.

摘要翻译： 使用具有所需电特性的纳米粒子的胶态悬浮液来施加电（并且可能是机械）活性图案。 纳米颗粒由可通过施加能量（例如，以电磁辐射或热的形式）由其除去的绝缘壳围绕。 将纳米颗粒悬浮液施加到表面，由于纳米颗粒壳形成基本上绝缘的层。 将所施加的悬浮液暴露于能量以除去封盖组并将颗粒融合为内聚力。 如果纳米颗粒悬浮液作为均匀膜沉积，则能量以期望的图案施加，使得未曝光区域保持绝缘，而暴露的区域表现出与纳米颗粒相关的电性能。 如果纳米颗粒悬浮液以期望的图案沉积，则其可以均匀地暴露于能量。 附加的层可以以相同的方式一个一个地施加以形成多层器件。

公开(公告)号：US20040009417A1

公开(公告)日：2004-01-15

申请号：US10418680

申请日：2003-04-21

发明人： Antony J. Bourdillon

IPC分类号： G03F007/20 ,  G03F007/26 ,  G21K005/00 ,  G03F001/00

CPC分类号： G03F7/70325 ,  G03F7/7035 ,  G03F7/70466

摘要： This method of Fresnel oscillations takes advantage of oscillation effects within Fresnel patterns to produce finer resolution than can be printed in the prior art. Selected patterns are printed by selecting the mask-wafer gap for a given wavelength, or range of wavelengths, and given mask feature size. Following the principles of the coherence and with an optimization of bandwidth, the method of Fresnel oscillations employs paradigms or simulations in mask shapes to print specified patterns. By these methods, exposure times and throughput are optimized, consistent with required resolution in printing. Mask-wafer gaps and clear mask feature sizes are kept large. With multiple exposures, fine oscillation patterns in two dimensions can be printed with demagnification factors down to 20X the size of clear mask features.

摘要翻译： 菲涅尔振荡的这种方法利用菲涅耳图案中的振荡效应来产生比现有技术中可印刷的更精细的分辨率。 通过选择给定波长或波长范围的掩模 - 晶片间隙以及给定掩模特征尺寸来打印所选择的图案。 按照相干原理和带宽优化，菲涅尔振荡的方法采用掩模形状的范例或模拟来打印指定的图案。 通过这些方法，优化曝光时间和产量，与印刷中所需的分辨率一致。 掩模晶片间隙和透明掩模特征尺寸保持较大。 通过多次曝光，两个维度的精细振荡图案可以打印成具有降低到清晰掩模特征尺寸的20倍的缩小因子。

公开(公告)号：US20030232257A1

公开(公告)日：2003-12-18

申请号：US10449505

申请日：2003-06-02

申请人： Canon Kabushiki Kaisha

发明人： Yasuhisa Inao ,  Ryo Kuroda

IPC分类号： G03F001/08 ,  G03F007/20 ,  G03F007/26 ,  G03B027/00 ,  G03B027/62

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/70325

摘要： A near-field light exposure mask provided with a plurality of apertures each having a width small than the wavelength of light used for exposure. In the mask described above, among the plurality of apertures, apertures adjacent to each other are disposed at a necessary distance so that near-field light effused from one of the apertures adjacent to each other does not overlap that generated from the other aperture.

摘要翻译： 一种近场曝光掩模，其具有多个孔，每个孔的宽度小于用于曝光的光的波长。 在上述掩模中，在多个孔之间，彼此相邻的孔设置在必要的距离处，使得从彼此相邻的一个孔中流出的近场光不与另一个孔产生的重叠。

公开(公告)号：US20030215745A1

公开(公告)日：2003-11-20

申请号：US10384798

申请日：2003-03-11

申请人： FUJI PHOTO FILM CO., LTD.

发明人： Kazuhiro Fujimaki

IPC分类号： C08F002/00 ,  G03F007/038 ,  B41C001/055 ,  G03F007/26 ,  C08G073/00

CPC分类号： G03F7/0388 ,  C08F8/26 ,  C08F2800/10 ,  C08F2800/20 ,  C08F2810/30 ,  G03F7/033 ,  G03F7/035 ,  C08F220/14 ,  C08F2220/286 ,  C08F2220/283 ,  C08F2220/185

摘要： A process for producing a polymer compound having a double bond in a side chain, wherein a functional group represented by the following formula (1) is subjected to an elimination reaction to form the polymer compound which includes another functional group having the double bond in the side chain thereof represented by the following formula (2): 1 wherein, in the formulae, A1 represents an oxygen atom, a sulfur atom or nullN(R4)null; R1, R2, R3 and R4 each independently represent a hydrogen atom or a monovalent organic group; and X1 and Z1 each represent a group that is removable by the elimination reaction.

摘要翻译： 在侧链中制备具有双键的高分子化合物的方法，其中由下式（1）表示的官能团进行消除反应以形成包含另一个具有双键的官能团的高分子化合物 侧链由下式（2）表示：其中，在式中，A 1表示氧原子，硫原子或-N（R 4） - ; R 1，R 2，R 3和R 4各自独立地表示氢原子或一价有机基团; X 1和Z 1各自表示可通过除去反应除去的基团。