公开(公告)号：US20240071804A1

公开(公告)日：2024-02-29

申请号：US18238573

申请日：2023-08-28

Applicant: ASM IP Holding B.V.

Inventor： Peipei Gao ,  Wentao Wang ,  Han Ye ,  Kai Zhou ,  Fan Gao ,  Xing Lin

IPC: H01L21/687 ,  H01L21/02 ,  H01L21/67

CPC classification number: H01L21/68735 ,  H01L21/0262 ,  H01L21/67017 ,  H01L21/67248

Abstract: Methods, systems, and assemblies suitable for gas-phase processes are disclosed. An exemplary assembly includes a susceptor ring and at least one injector tube. The injector tube can be disposed within the susceptor ring to provide a gas to a peripheral region of a substrate. Methods, systems, and assemblies can be used to obtain desired (e.g. composition and/or thickness) profiles of material on a substrate surface.