公开(公告)号：US20200057394A1

公开(公告)日：2020-02-20

申请号：US16587483

申请日：2019-09-30

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Matthias KRUIZINGA ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Erik Willem BOGAART ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Richard Joseph BRULS ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Mohammad Reza KAMALI ,  Ronald Harm Gunther KRAMER ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Matthew LIPSON ,  Erik Roelof LOOPSTRA ,  Joseph H. LYONS ,  Stephen ROUX ,  Gerrit VAN DEN BOSCH ,  Sander VAN DEN HEIJKANT ,  Sandra VAN DER GRAAF ,  Frits VAN DER MEULEN ,  Jérôme François SylvainVirgile VAN LOO ,  Beatrijs Louis Marie-Joseph Katrien VERBRUGGE

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/22

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20150370180A1

公开(公告)日：2015-12-24

申请号：US14762452

申请日：2014-02-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Santiago E. DEL PUERTO ,  Matthew LIPSON ,  Kenneth C. HENDERSON ,  Raymond Wilhelmus Louis LAFARRE ,  Louis John MARKOYA ,  Tammo UITTERDIJK ,  Johannes VERMEULEN ,  Antonius Franciscus Johannes DE GROOT ,  Ronald VAN DER WILK

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

Abstract translation: 诸如夹具（310）的支撑件构造成可释放地保持图案形成装置例如掩模版（300）以固定它并防止其热引起的变形。 例如，静电夹具包括具有相对的第一（313）和第二（315）表面的第一基底（312），位于第一表面上并被构造成接触光罩的多个毛刺（316），第二基底 ）具有相对的第一（317）和第二（319）表面。 第二衬底的第一表面耦合到第一衬底的第二表面。 多个冷却元件（318）位于第二基板的第一表面和第一基板的第二表面之间。 冷却元件构造成使电子从第一衬底的第二表面行进到第二衬底的第一表面。 每个冷却元件基本上与相应的毛刺对齐。