-
公开(公告)号：US20240103386A1
公开(公告)日：2024-03-28
申请号：US18376237
申请日：2023-10-03
发明人： Derk Servatius Gertruda BROUNS , Joshua ADAMS , Aage BENDIKSEN , Richard JACOBS , Andrew JUDGE , Veera Venkata Narasimha Narendra Phani KOTTAPALLI , Joseph Harry LYONS , Theodorus Marinus MODDERMAN , Manish RANJAN , Marcus Adrianus VAN DE KERKHOF , Xugang XIONG
CPC分类号： G03F7/7085 , G03F1/62 , G03F1/64 , G03F7/70033 , G03F7/70891 , G03F7/70983
摘要： An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.
-
公开(公告)号：US20180364561A1
公开(公告)日：2018-12-20
申请号：US16062017
申请日：2016-12-02
发明人： David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
摘要： A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.
-
公开(公告)号：US20220252974A1
公开(公告)日：2022-08-11
申请号：US17728608
申请日：2022-04-25
发明人： David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willlem-Pieter VOORTHUIJZEN , James Norman WILEY
摘要： A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
-
公开(公告)号：US20210208500A1
公开(公告)日：2021-07-08
申请号：US17206649
申请日：2021-03-19
发明人： David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
摘要： A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
-
公开(公告)号：US20200341366A1
公开(公告)日：2020-10-29
申请号：US16765339
申请日：2018-11-27
发明人： Derk Servatius Gertruda BROUNS , Joshua ADAMS , Aage BENDIKSEN , Richard JACOBS , Andrew JUDGE , Veera Venkata Narasimha Narendra Phani KOTTAPALLI , Joseph Harry LYONS , Theodorus Marinus MODDERMAN , Manish RANJAN , Marcus Adrianus VAN DE KERKHOF , Xugang XIONG
摘要： An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.
-
公开(公告)号：US20200064731A1
公开(公告)日：2020-02-27
申请号：US16667956
申请日：2019-10-30
发明人： David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnould Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN-ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
摘要： A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
-
公开(公告)号：US20200057394A1
公开(公告)日：2020-02-20
申请号：US16587483
申请日：2019-09-30
发明人： Matthias KRUIZINGA , Maarten Mathijs Marinus JANSEN , Jorge Manuel AZEREDO LIMA , Erik Willem BOGAART , Derk Servatius Gertruda BROUNS , Marc BRUIJN , Richard Joseph BRULS , Jeroen DEKKERS , Paul JANSSEN , Mohammad Reza KAMALI , Ronald Harm Gunther KRAMER , Robert Gabriël Maria LANSBERGEN , Martinus Hendrikus Antonius LEENDERS , Matthew LIPSON , Erik Roelof LOOPSTRA , Joseph H. LYONS , Stephen ROUX , Gerrit VAN DEN BOSCH , Sander VAN DEN HEIJKANT , Sandra VAN DER GRAAF , Frits VAN DER MEULEN , Jérôme François SylvainVirgile VAN LOO , Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
-
公开(公告)号：US20180373141A1
公开(公告)日：2018-12-27
申请号：US16060837
申请日：2016-12-02
发明人： Derk Servatius Gertruda BROUNS , Paul JANSSEN , Mohammad Reza KAMALI , Maria PETER , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
摘要： A membrane assembly for EUV lithography, the membrane assembly including: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to attach to a patterning device for EUV lithography, wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
-
公开(公告)号：US20180329314A1
公开(公告)日：2018-11-15
申请号：US15526654
申请日：2015-11-16
发明人： Matthias KRUIZINGA , Maarten Mathijs Marinus JANSEN , Jorge Manuel AZEREDO LIMA , Erik Willem BOGAART , Derk Servatius Gertruda BROUNS , Marc BRUIJN , Richard Joseph BRULS , Jeroen DEKKERS , Paul JANSSEN , Mohammad Reza KAMALI , Ronald Harm Gunther KRAMER , Robert Gabriël Maria LANSBERGEN , Martinus Hendrikus Antonius LEENDERS , Matthew LIPSON , Erik Roelof LOOPSTRA , Joseph H. LYONS , Stephen ROUX , Gerrit VAN DEN BOSCH , Sander VAN DEN HEIJKANT , Sandra VAN DER GRAAF , Frits VAN DER MEULEN , Jérôme François Sylvain Virgile VAN LOO , Beatrijs Louise Marie-Joseph Katrien VERBRUGGE
CPC分类号： G03F7/70983 , G03F1/22 , G03F1/64 , G03F7/70825
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
-
公开(公告)号：US20220155675A1
公开(公告)日：2022-05-19
申请号：US17433038
申请日：2020-02-25
发明人： Ilya MALAKHOVSKY , Derk Servatius Gertruda BROUNS , Joffrey Rene Sylvian CRAQUELIN , Edward HAGE , Pieter Renaat Maria HENNUS , Jan Willem Adriaan OOSTERLING , Ludolf POSTMA , Marcel Duco SNEL , Johannes Charles Adrianus VAN DEN BERG , Wouter VAN DER CHIJS , Bartel Joris VAN DER VEEK , Mike Johannes Antonius VAN KUIJK , Marina Antoinetta Leonarda VAN UUM-VAN HERK , Henricus Marinus Theodorus WIERSMA
摘要： An object handling apparatus for handling a generally planar object, the object handling apparatus including: two support arms, at least one of the two support arms movable relative to another support arm generally in a plane such that the two support arms are operable to grip and hold an object disposed in the plane, wherein each of the support arms includes at least one support pad and at least one aligner, the support pads configured to locally contact a surface of the object and apply a force thereto generally perpendicular to the plane so as to support the object and the at least one aligner configured to locally contact a surface of the object and apply a force thereto generally in the plane so as to grip the object.
-
-
-
-
-
-
-
-
-
搜索结果
18 条记录 (耗时 0.031 秒)
