公开(公告)号：US20170291196A1

公开(公告)日：2017-10-12

申请号：US15092293

申请日：2016-04-06

Applicant: ASML Netherlands B.V.

Inventor： Armin Bernhard Ridinger ,  Georgiy O. Vaschenko ,  Chirag Rajyaguru ,  Peter Michael Baumgart ,  Timothy Richard Palmer

IPC: B08B3/02

CPC classification number: B08B3/02 ,  B01D29/336 ,  B01D29/68 ,  B01D41/04 ,  B08B9/00

Abstract: A system and method for cleaning a sintered filter includes a cleaning fluid source and a cleaning nozzle. The cleaning nozzle includes an inlet end coupled to the cleaning fluid source and at least one outlet port for outputting the cleaning fluid injected through the cleaning nozzle. The outlet port is disposed proximate to an outlet end of the cleaning nozzle. The cleaning nozzle has an external width less than an internal width of the sintered filter to be cleaned. The cleaning nozzle has a nozzle length greater than a full depth of the sintered filter to be cleaned. The outlet port can be disposed in a side of the cleaning nozzle proximate to the outlet end of the cleaning nozzle. The outlet port can include more than one outlet ports.

公开(公告)号：US08969839B2

公开(公告)日：2015-03-03

申请号：US14294048

申请日：2014-06-02

Applicant: ASML Netherlands B.V.

Inventor： Georgiy O. Vaschenko

IPC: H05H1/42 ,  G03F7/20 ,  H05G2/00 ,  H01J35/20

CPC classification number: H05H1/42 ,  G03F7/70033 ,  H01J35/20 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008 ,  Y10T29/49 ,  Y10T156/10

Abstract: Methods and apparatus for producing irradiation targets in an extreme ultraviolet (EUV) light source having an irradiation target generating system that includes a nozzle configured for ejecting droplets of a target material, and a subsystem having an electro-actuable element producing a modulation waveform to cause disturbance to the droplets thereby causing at least some of the droplets to coalesce into irradiation targets. There is included a laser producing a beam for irradiating the irradiation targets to generate an EUV-producing plasma, wherein the electro-actuable element is biased against the nozzle to enable transfer of the disturbance to the droplets while permitting relative movement between the electro-actuable element and the nozzle.

Abstract translation: 在具有包括喷射目标物质的液滴的喷嘴的照射靶生成系统的极紫外（EUV）光源中产生照射靶的方法和装置以及具有产生调制波形的电致动元件的子系统， 对液滴的干扰，从而使至少一些液滴聚结成辐射靶。 包括产生用于照射照射目标以产生产生EUV的等离子体的光束的激光，其中电致动元件被偏置在喷嘴上，以使干扰能够传递到液滴，同时允许电致动的等离子体之间的相对运动 元件和喷嘴。