公开(公告)号：US20190227445A1

公开(公告)日：2019-07-25

申请号：US16326948

申请日：2017-08-11

Applicant: ASML Netherlands B.V.

Inventor： Frits VAN DER MEULEN ,  Erik Johan ARLEMARK ,  Hendrikus Herman Marie COX ,  Martinus Agnes Willem CUIJPERS ,  Joost DE HOOGH ,  Gosse Charles DE VRIES ,  Paul Comé Henri DE WIT ,  Sander Catharina Reinier DERKS ,  Ronald Comelis Gerardus GIJZEN ,  Dries Vaast Paul HEMSCHOOTE ,  Christiaan Alexander HOOGENDAM ,  Adrianus Hendrik KOEVOETS ,  Raymond Wilhelmus Louis LAFARRE ,  Alain Louis Claude LEROUX ,  Patrick Willem Paul LIMPENS ,  Jim Vincent OVERKAMP ,  Christiaan Louis VALENTIN ,  Koos VAN BERKEL ,  Stan Henricus VAN DER MEULEN ,  Jacobus Comelis Gerardus VAN DER SANDEN ,  Harmen Klaas VAN DER SCHOOT ,  David Ferdinand VLES ,  Evert Auke Rinze WESTERHUIS

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US20190187573A1

公开(公告)日：2019-06-20

申请号：US16326410

申请日：2017-07-28

Applicant: ASML Netherlands B.V.

Inventor： Hendrikus Herman Marie COX ,  Paul Corné Henri DE WIT ,  Arie Jeffrey DEN BOEF ,  Adrianus Hendrik KOEVOETS ,  Jim Vincent OVERKAMP ,  Frits VAN DER MEULEN ,  Jacobus Cornelis Gerardus VAN DER SANDEN

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70433 ,  G03F7/70625 ,  G03F7/70783

Abstract: A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.

公开(公告)号：US20170212429A1

公开(公告)日：2017-07-27

申请号：US15329536

申请日：2015-07-16

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik KOEVOETS ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rogier Hendrikus Magdalena CORTIE ,  Jim Vincent OVERKAMP ,  Patricius Jacobus NEEFS ,  Putra SAPUTRA ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Michael Johannes Hendrika Wilhelmina RENDERS ,  Johan Gertrudis Cornelis KUNNEN ,  Thibault Simon Mathieu LAURENT

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70783 ,  G03F7/70875

Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two- phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.