公开(公告)号：US20170351187A1

公开(公告)日：2017-12-07

申请号：US15681679

申请日：2017-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20 ,  H01L21/687

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US20190227445A1

公开(公告)日：2019-07-25

申请号：US16326948

申请日：2017-08-11

Applicant: ASML Netherlands B.V.

Inventor： Frits VAN DER MEULEN ,  Erik Johan ARLEMARK ,  Hendrikus Herman Marie COX ,  Martinus Agnes Willem CUIJPERS ,  Joost DE HOOGH ,  Gosse Charles DE VRIES ,  Paul Comé Henri DE WIT ,  Sander Catharina Reinier DERKS ,  Ronald Comelis Gerardus GIJZEN ,  Dries Vaast Paul HEMSCHOOTE ,  Christiaan Alexander HOOGENDAM ,  Adrianus Hendrik KOEVOETS ,  Raymond Wilhelmus Louis LAFARRE ,  Alain Louis Claude LEROUX ,  Patrick Willem Paul LIMPENS ,  Jim Vincent OVERKAMP ,  Christiaan Louis VALENTIN ,  Koos VAN BERKEL ,  Stan Henricus VAN DER MEULEN ,  Jacobus Comelis Gerardus VAN DER SANDEN ,  Harmen Klaas VAN DER SCHOOT ,  David Ferdinand VLES ,  Evert Auke Rinze WESTERHUIS

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US20200371447A1

公开(公告)日：2020-11-26

申请号：US16993896

申请日：2020-08-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/68

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US20200041916A1

公开(公告)日：2020-02-06

申请号：US16339948

申请日：2017-09-21

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKÌBOGLU ,  Manon Elise WILL ,  Sander Catharina Reinier DERKS ,  Johannes Wilhelmus MOLLEN

IPC: G03F7/20 ,  G03F9/00

Abstract: A method of performing a lithographic exposure of a substrate, the substrate being held on a substrate table, the substrate table comprising a cooling system operative to cool the substrate table, the method comprising performing an alignment measurement of the substrate, applying heat to the substrate table to reduce cooling of the substrate table the substrate table provided by the cooling system, the heat being applied between a time at which the alignment measurement is performed and a time at which the lithographic exposure is performed and performing the lithographic exposure of the substrate.

公开(公告)号：US20180239265A1

公开(公告)日：2018-08-23

申请号：US15958714

申请日：2018-04-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20 ,  H01L21/687

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US20220197158A1

公开(公告)日：2022-06-23

申请号：US17603687

申请日：2020-03-10

Applicant: ASML Netherlands B.V.

Inventor： Sander Catharina Reinier DERKS ,  Daneil Jozel Maria DIRECKS ,  Marurice Wilhelmus Leonardus Hendricu FEIJTS ,  Pieter Geradus Mathijs HOEIJMAKERS ,  Katja Cornelia Joanna Clasina MOORS ,  Violeta NAVARRO PAREDES ,  William Peter VAN DRENTS ,  Jan Steven Christiaan WESTERLAKEN

IPC: G03F7/20 ,  H05G2/00

Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1K−1.

公开(公告)号：US20160282723A1

公开(公告)日：2016-09-29

申请号：US15033580

申请日：2014-11-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Sander Catharina Reinier DERKS ,  Eric Willem Felix CASIMIRI ,  Marcel Mathijs Theodore DIERICHS ,  Sumant Sukdew Ramanujan OEMRAWSINGH ,  Wilhelmus Theodorus Anthonius VAN DEN EINDEN ,  Johannes Fransiscus Maria VELTHUIS ,  Alexander Nikolov ZDRAVKOV ,  Wassim ZEIN EDDINE

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  G02B5/003 ,  G02B5/208 ,  G02B5/22 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70633 ,  G03F7/70875 ,  G03F7/70883 ,  G03F7/70933 ,  H01J5/18 ,  H05G2/001

Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.

Abstract translation: 一种包括至少一个包括中空部分（41）的密封孔（40）的装置，具有内表面（42），所述内表面在所述装置的不同区域（50; 60）之间的界面处延伸; 以及定位在中空部分中的构件（43），其构造成基本上透射EUV辐射并且基本上过滤所述界面处的非EUV辐射; 其中所述中空部分的内表面具有被配置为增加由所述构件传递到所述中空部分的非EUV辐射的吸收的表面处理。

公开(公告)号：US20160035605A1

公开(公告)日：2016-02-04

申请号：US14775237

申请日：2014-03-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Roger Wilhelmus Antonius Henricus SCHMITZ ,  Sander Catharina Reinier DERKS ,  Leon Martin LEVASIER

IPC: H01L21/67 ,  G05D23/19 ,  G05B15/02 ,  H01L21/687 ,  H01L21/66

CPC classification number: H01L21/67248 ,  G03F7/70875 ,  G05B15/02 ,  G05D23/1917 ,  H01L21/67069 ,  H01L21/68785 ,  H01L22/12

Abstract: Disclosed are support structure apparatuses for holding a substrate or patterning device, for example in a lithographic apparatus, and apparatuses comprising such support structure apparatuses. The support structure apparatus comprises a temperature regulation system for controlling the temperature of the support structure and one or more temperature sensors located on the periphery of said support structure being operable to measure the temperature of the support structure at said periphery. The temperature regulation system may be operable to calculate an average temperature of the substrate holder from temperature values measured by said temperature sensors and position dependent correlation factors, which depend upon the position of an applied heat load on a substrate or patterning device mounted upon the support structure.

Abstract translation: 公开了用于保持基板或图案形成装置的支撑结构装置，例如在光刻设备中，以及包括这种支撑结构装置的装置。 支撑结构装置包括用于控制支撑结构的温度的温度调节系统和位于所述支撑结构的周边上的一个或多个温度传感器，其可操作以测量所述外围处的支撑结构的温度。 温度调节系统可以用于根据由所述温度传感器测量的温度值和与位置相关的相关因素来计算衬底保持器的平均温度，这取决于施加的热负荷在安装在支撑件上的衬底或图案形成装置上的位置 结构体。

公开(公告)号：US20230091648A1

公开(公告)日：2023-03-23

申请号：US18070155

申请日：2022-11-28

Applicant: ASML Netherlands B.V.

Inventor： Sander Catharina Reinier DERKS ,  Daniel Jozef Maria DIRECKS ,  Maurice Wilhelmus Leonardus Hendricus FEIJTS ,  Pieter Gerardus Mathijs HOEIJMAKERS ,  Katja Cornelia Joanna Clasina MOORS ,  Violeta NAVARRO PAREDES ,  William Peter VAN DRENT ,  Jan Steven Christiaan WESTERLAKEN

IPC: G03F7/20 ,  H05G2/00

Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1 K−1.

公开(公告)号：US20190294056A1

公开(公告)日：2019-09-26

申请号：US16437760

申请日：2019-06-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/68

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.