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公开(公告)号：US20240027915A1
公开(公告)日：2024-01-25
申请号：US18453594
申请日：2023-08-22
发明人： Raymond Wilhelmus Louis LAFARRE , Sjoerd Nicolaas Lambertus Donders , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE , Elisabeth Corinne RODENBURG
IPC分类号： G03F7/00 , B23K26/354 , B23K26/342 , B22F10/00 , B22F10/20 , B23Q3/18 , G03F7/20 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00 , B22F7/06
CPC分类号： G03F7/70341 , B23K26/354 , B23K26/342 , G03F7/70416 , G03F7/707 , G03F7/70708 , B22F10/00 , B22F10/20 , B23Q3/18 , G03F7/20 , G03F7/70716 , B05D3/06 , B05D5/00 , G03F7/70733 , B33Y10/00 , B33Y80/00 , B22F7/062 , G03F7/708 , B22F10/25
摘要： An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object are formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
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公开(公告)号：US20230048272A1
公开(公告)日：2023-02-16
申请号：US17952067
申请日：2022-09-23
发明人： Raymond Wilhelmus Louis LAFARRE , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE
IPC分类号： G03F7/20 , H01L21/687 , C23C16/44
摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
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公开(公告)号：US20180173116A1
公开(公告)日：2018-06-21
申请号：US15568122
申请日：2016-04-04
发明人： Adrianus Hendrik KOEVOETS , Erik Johan ARLEMARK , Sander Catharina Reinier DERKS , Sjoerd Nicolaas Lambertus DONDERS , Wilfred Edward ENDENDIJK , Franciscus Johannes Joseph JANSSEN , Raymond Wilhelmus Louis LAFARRE , Leon Martin LEVASIER , Jim Vincent OVERKAMP , Nicolaas TEN KATE , Jacobus Cornelis Gerardus VAN DER SANDEN
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70258 , G03F7/70783 , H01L21/67098 , H01L21/683
摘要： A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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公开(公告)号：US20170315454A1
公开(公告)日：2017-11-02
申请号：US15629399
申请日：2017-06-21
发明人： Thibault Simon Mathieu LAURENT , Johannes Henricus Wilhelmus JACOBS , Wilhelmus Franciscus Johannes SIMONS , Martijn HOUBEN , Raymond Wilhelmus Louis LAFARRE , Koen STEFFENS , Han Henricus Aldegonda LEMPENS , Rogier Hendrikus Magdalena CORTIE , Ruud Hendrikus Martinus Johannes BLOKS , Gerben PIETERSE , Siegfried Alexander TROMP , Theodorus Wilhelmus POLET , Jim Vincent OVERKAMP , Van Vuong VY
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
摘要： An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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公开(公告)号：US20170235235A1
公开(公告)日：2017-08-17
申请号：US15587086
申请日：2017-05-04
发明人： Raymond Wilhelmus Louis LAFARRE , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , C23C16/44 , G03F7/70341 , G03F7/707 , G03F7/70975 , H01L21/6875 , Y10T29/49
摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
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6.发明申请SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER 有权基板支架，光刻装置，装置制造方法及制造基板支架的方法公开(公告)号：US20160231655A1
公开(公告)日：2016-08-11
申请号：US15131986
申请日：2016-04-18
发明人： Raymond Wilhelmus Louis LAFARRE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE , Elisabeth Corinne RODENBURG , Peter VAN DELFT
CPC分类号： G03F7/70716 , B05D1/005 , G03F7/70341 , G03F7/70691 , G03F7/707
摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.
摘要翻译： 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层为形成电子部件的薄膜叠层的形成提供光滑的表面。 平坦化层具有基本均匀的厚度和/或其外表面具有小于10μm的峰谷距离。 可以通过施加不同浓度的两种溶液来形成平坦化层。 表面处理可以施加到毛圈以排斥平坦化层材料的溶液。
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公开(公告)号：US20160170310A1
公开(公告)日：2016-06-16
申请号：US15048826
申请日：2016-02-19
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70341
摘要： A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
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公开(公告)号：US20220331862A1
公开(公告)日：2022-10-20
申请号：US17856520
申请日：2022-07-01
发明人： Raymond Wilhelmus Louis LAFARRE , Sjoerd Nicolaas Lambertus DONDERS , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE , Elisabeth Corinne RODENBURG
IPC分类号： B22F7/06 , B23K26/354 , B23K26/342 , G03F7/20 , B22F10/20 , B22F10/00 , B23Q3/18 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00
摘要： An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burs formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
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9.发明申请公开(公告)号：US20190243256A1
公开(公告)日：2019-08-08
申请号：US16271303
申请日：2019-02-08
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70775
摘要： A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.
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公开(公告)号：US20190227445A1
公开(公告)日：2019-07-25
申请号：US16326948
申请日：2017-08-11
发明人： Frits VAN DER MEULEN , Erik Johan ARLEMARK , Hendrikus Herman Marie COX , Martinus Agnes Willem CUIJPERS , Joost DE HOOGH , Gosse Charles DE VRIES , Paul Comé Henri DE WIT , Sander Catharina Reinier DERKS , Ronald Comelis Gerardus GIJZEN , Dries Vaast Paul HEMSCHOOTE , Christiaan Alexander HOOGENDAM , Adrianus Hendrik KOEVOETS , Raymond Wilhelmus Louis LAFARRE , Alain Louis Claude LEROUX , Patrick Willem Paul LIMPENS , Jim Vincent OVERKAMP , Christiaan Louis VALENTIN , Koos VAN BERKEL , Stan Henricus VAN DER MEULEN , Jacobus Comelis Gerardus VAN DER SANDEN , Harmen Klaas VAN DER SCHOOT , David Ferdinand VLES , Evert Auke Rinze WESTERHUIS
IPC分类号： G03F7/20
摘要： A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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