公开(公告)号：US09939740B2

公开(公告)日：2018-04-10

申请号：US15116794

申请日：2015-01-20

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Martijn Van Baren ,  Frank Johannes Jacobus Van Boxtel ,  Koen Cuypers ,  Jeroen Gerard Gosen ,  Laurentius Johannes Adrianus Van Bokhoven

IPC: B60R1/06 ,  G03B27/52 ,  G03B27/58 ,  G03B27/62 ,  H02K41/02 ,  G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70908

Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.