公开(公告)号：US10580545B2

公开(公告)日：2020-03-03

申请号：US14917623

申请日：2014-09-24

Applicant: ASML Netherlands B.V.

Inventor： Vadim Yevgenyevich Banine ,  Petrus Rutgerus Bartraij ,  Ramon Pascal Van Gorkom ,  Lucas Johannes Peter Ament ,  Pieter Willem Herman De Jager ,  Gosse Charles De Vries ,  Rilpho Ludovicus Donker ,  Wouter Joep Engelen ,  Olav Waldemar Vladimir Frijns ,  Leonardus Adrianus Gerardus Grimminck ,  Andelko Katalenic ,  Erik Roelof Loopstra ,  Han-Kwang Nienhuys ,  Andrey Alexandrovich Nikipelov ,  Michael Jozef Mathijs Renkens ,  Franciscus Johannes Joseph Janssen ,  Borgert Kruizinga

IPC: G03F7/20 ,  G21K1/06

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：US10437154B2

公开(公告)日：2019-10-08

申请号：US15789702

申请日：2017-10-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Alexandrovich Nikipelov ,  Olav Waldemar Vladimir Frijns ,  Erik Roelof Loopstra ,  Wouter Joep Engelen ,  Johannes Antonius Gerardus Akkermans

IPC: G03B27/42 ,  H01J31/48 ,  G03F7/20 ,  H01S3/09 ,  G01J1/04 ,  G02B1/06 ,  G02B5/20 ,  G21K1/10 ,  G02B26/02 ,  G01J1/26 ,  G01J1/42 ,  H05H7/04 ,  H01S3/00

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

公开(公告)号：US09728931B2

公开(公告)日：2017-08-08

申请号：US15035674

申请日：2014-11-27

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich Nikipelov ,  Vadim Yevgenyevich Banine ,  Pieter Willem Herman De Jager ,  Gosse Charles De Vries ,  Olav Waldemar Vladimir Frijns ,  Leonardus Adrianus Gerardus Grimminck ,  Andelko Katalenic ,  Johannes Antonius Gerardus Akkermans ,  Erik Loopstra ,  Wouter Joep Engelen ,  Petrus Rutgerus Bartraij ,  Teis Johan Coenen ,  Wilhelmus Patrick Elisabeth Maria Op'T Root

IPC: H01S3/09 ,  H01J1/34 ,  H05H7/08

CPC classification number: H01S3/0903 ,  H01J1/34 ,  H05H7/08 ,  H05H2007/084

Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.