公开(公告)号：US08786832B2

公开(公告)日：2014-07-22

申请号：US13938746

申请日：2013-07-10

Applicant: ASML Holding N.V.

Inventor： Samir A. Nayfeh ,  Mark Edd Williams ,  Justin Matthew Verdirame

IPC: B25B11/00 ,  G03B27/58 ,  G03B27/62 ,  G03F7/20 ,  H01L21/687 ,  H01L21/683

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/683 ,  H01L21/68714 ,  H01L21/6875 ,  Y10S414/141 ,  Y10T279/34

Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

Abstract translation: 描述了一种光刻设备，其包括用于保持物体的支撑结构。 该物体可以是图案形成装置或要暴露的基板。 支撑结构包括卡盘，物体被支撑在该卡盘上，以及与卡盘和台架垂直的剪切顺应的细长元件的阵列，使得细长元件的第一端接触卡盘的表面和卡盘的第二端 细长元件接触舞台。 通过使用细长元件阵列，载物台与卡盘之间的应力传递基本上是均匀的，从而在由于应力引起的卡盘变形期间，物体相对于卡盘表面的滑动最小化。