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公开(公告)号:US20180246338A1
公开(公告)日:2018-08-30
申请号:US15901976
申请日:2018-02-22
Applicant: ASML Netherlands B.V.
Inventor: Cory Alan Stinson , Philip M. Conklin
CPC classification number: G02B27/4261 , G02B27/0944 , G02F1/093 , H01S3/005 , H01S3/10023 , H05G2/003 , H05G2/008
Abstract: A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.
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公开(公告)号:US20180077786A1
公开(公告)日:2018-03-15
申请号:US15265373
申请日:2016-09-14
Applicant: ASML Netherlands B.V.
Inventor: Michael Leslie Price , Cory Alan Stinson , Mark Joseph Mitry
IPC: H05G2/00
Abstract: A method is described for measuring a moving property of a target. The method includes: forming a remaining plasma that at least partially coincides with an extended target region, the remaining plasma being a plasma formed from an interaction between a prior target and a prior radiation pulse in a target space; releasing a current target along a trajectory toward the target space that is at least partly overlapping the extended target region; determining one or more moving properties of the current target when the current target is within the extended target region and after a prior and adjacent target has interacted with a prior radiation pulse in the target space; and if any of the determined one or more moving properties of the current target are outside an acceptable range, then adjusting one or more characteristics of a radiation pulse directed toward the target space.
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