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公开(公告)号：US09904068B1
公开(公告)日：2018-02-27
申请号：US15402134
申请日：2017-01-09
Applicant: ASML Netherlands B.V.
Inventor： Cory Alan Stinson , Philip M. Conklin
CPC classification number: G02B27/4261 , G02B27/0944 , G02F1/093 , H01S3/005 , H01S3/10023 , H05G2/003 , H05G2/008
Abstract: A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.
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公开(公告)号：US10681797B2
公开(公告)日：2020-06-09
申请号：US16552760
申请日：2019-08-27
Applicant: ASML Netherlands B.V.
Inventor： Michael Leslie Price , Cory Alan Stinson , Mark Joseph Mitry
Abstract: A method is described for measuring a moving property of a target. The method includes: forming a remaining plasma that at least partially coincides with an extended target region, the remaining plasma being a plasma formed from an interaction between a prior target and a prior radiation pulse in a target space; releasing a current target along a trajectory toward the target space that is at least partly overlapping the extended target region; determining one or more moving properties of the current target when the current target is within the extended target region and after a prior and adjacent target has interacted with a prior radiation pulse in the target space; and if any of the determined one or more moving properties of the current target are outside an acceptable range, then adjusting one or more characteristics of a radiation pulse directed toward the target space.
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公开(公告)号：US10606096B2
公开(公告)日：2020-03-31
申请号：US15901976
申请日：2018-02-22
Applicant: ASML Netherlands B.V.
Inventor： Cory Alan Stinson , Philip M. Conklin
Abstract: A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.
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公开(公告)号：US20190069386A1
公开(公告)日：2019-02-28
申请号：US16174464
申请日：2018-10-30
Applicant: ASML Netherlands B.V.
Inventor： Michael Leslie Price , Cory Alan Stinson , Mark Joseph Mitry
IPC: H05G2/00
Abstract: A method is described for measuring a moving property of a target. The method includes: forming a remaining plasma that at least partially coincides with an extended target region, the remaining plasma being a plasma formed from an interaction between a prior target and a prior radiation pulse in a target space; releasing a current target along a trajectory toward the target space that is at least partly overlapping the extended target region; determining one or more moving properties of the current target when the current target is within the extended target region and after a prior and adjacent target has interacted with a prior radiation pulse in the target space; and if any of the determined one or more moving properties of the current target are outside an acceptable range, then adjusting one or more characteristics of a radiation pulse directed toward the target space.
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公开(公告)号：US20230143962A1
公开(公告)日：2023-05-11
申请号：US17913013
申请日：2021-03-10
Applicant: ASML Netherlands B.V.
Inventor： Rostislav Rokitski , Philip M. Conklin , Cory Alan Stinson , Alexander Anthony Schafgans , Christoffel Johannes Liebenberg
CPC classification number: H01S3/2333 , H01S3/1003 , H01S3/0085 , H01S3/2232 , H01S3/10061
Abstract: Systems, apparatuses, and methods are provided for dual-pass amplification of laser beams along a common beam path. An example method can include generating a first laser beam and a second laser beam. Subsequently, the example method can include performing dual-pass amplification of the first laser beam and the second laser beam along a common beam path. In some aspects, the first laser beam can include a first wavelength, the second laser beam can include a second wavelength different from the first wavelength.
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Patent Agency Ranking
公开(公告)号：US10681796B2
公开(公告)日：2020-06-09
申请号：US16174464
申请日：2018-10-30
Applicant: ASML Netherlands B.V.
Inventor： Michael Leslie Price , Cory Alan Stinson , Mark Joseph Mitry
Abstract: A method is described for measuring a moving property of a target. The method includes: forming a remaining plasma that at least partially coincides with an extended target region, the remaining plasma being a plasma formed from an interaction between a prior target and a prior radiation pulse in a target space; releasing a current target along a trajectory toward the target space that is at least partly overlapping the extended target region; determining one or more moving properties of the current target when the current target is within the extended target region and after a prior and adjacent target has interacted with a prior radiation pulse in the target space; and if any of the determined one or more moving properties of the current target are outside an acceptable range, then adjusting one or more characteristics of a radiation pulse directed toward the target space.
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公开(公告)号：US20190387603A1
公开(公告)日：2019-12-19
申请号：US16552760
申请日：2019-08-27
Applicant: ASML Netherlands B.V.
Inventor： Michael Leslie Price , Cory Alan Stinson , Mark Joseph Mitry
IPC: H05G2/00
Abstract: A method is described for measuring a moving property of a target. The method includes: forming a remaining plasma that at least partially coincides with an extended target region, the remaining plasma being a plasma formed from an interaction between a prior target and a prior radiation pulse in a target space; releasing a current target along a trajectory toward the target space that is at least partly overlapping the extended target region; determining one or more moving properties of the current target when the current target is within the extended target region and after a prior and adjacent target has interacted with a prior radiation pulse in the target space; and if any of the determined one or more moving properties of the current target are outside an acceptable range, then adjusting one or more characteristics of a radiation pulse directed toward the target space.
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公开(公告)号：US20180081280A1
公开(公告)日：2018-03-22
申请号：US15270072
申请日：2016-09-20
Applicant: ASML Netherlands B.V.
Inventor： Alexander Anthony Schafgans , Igor Vladimirovich Fomenkov , Yezheng Tao , Rostislav Rokitski , Robert Jay Rafac , Daniel John William Brown , Cory Alan Stinson
Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.
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公开(公告)号：US10663866B2
公开(公告)日：2020-05-26
申请号：US15270072
申请日：2016-09-20
Applicant: ASML Netherlands B.V.
Inventor： Alexander Anthony Schafgans , Igor Vladimirovich Fomenkov , Yezheng Tao , Rostislav Rokitski , Robert Jay Rafac , Daniel John William Brown , Cory Alan Stinson
Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.
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公开(公告)号：US10149375B2
公开(公告)日：2018-12-04
申请号：US15265373
申请日：2016-09-14
Applicant: ASML Netherlands B.V.
Inventor： Michael Leslie Price , Cory Alan Stinson , Mark Joseph Mitry
Abstract: A method is described for measuring a moving property of a target. The method includes: forming a remaining plasma that at least partially coincides with an extended target region, the remaining plasma being a plasma formed from an interaction between a prior target and a prior radiation pulse in a target space; releasing a current target along a trajectory toward the target space that is at least partly overlapping the extended target region; determining one or more moving properties of the current target when the current target is within the extended target region and after a prior and adjacent target has interacted with a prior radiation pulse in the target space; and if any of the determined one or more moving properties of the current target are outside an acceptable range, then adjusting one or more characteristics of a radiation pulse directed toward the target space.
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