公开(公告)号：US09904068B1

公开(公告)日：2018-02-27

申请号：US15402134

申请日：2017-01-09

Applicant: ASML Netherlands B.V.

Inventor： Cory Alan Stinson ,  Philip M. Conklin

IPC: A61N5/06 ,  G02B27/42 ,  H01S3/10 ,  H01S3/00 ,  G02B27/09 ,  H05G2/00 ,  G02F1/09

CPC classification number: G02B27/4261 ,  G02B27/0944 ,  G02F1/093 ,  H01S3/005 ,  H01S3/10023 ,  H05G2/003 ,  H05G2/008

Abstract: A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.

公开(公告)号：US20230143962A1

公开(公告)日：2023-05-11

申请号：US17913013

申请日：2021-03-10

Applicant: ASML Netherlands B.V.

Inventor： Rostislav Rokitski ,  Philip M. Conklin ,  Cory Alan Stinson ,  Alexander Anthony Schafgans ,  Christoffel Johannes Liebenberg

IPC: H01S3/23 ,  H01S3/10 ,  H01S3/00 ,  H01S3/223

CPC classification number: H01S3/2333 ,  H01S3/1003 ,  H01S3/0085 ,  H01S3/2232 ,  H01S3/10061

Abstract: Systems, apparatuses, and methods are provided for dual-pass amplification of laser beams along a common beam path. An example method can include generating a first laser beam and a second laser beam. Subsequently, the example method can include performing dual-pass amplification of the first laser beam and the second laser beam along a common beam path. In some aspects, the first laser beam can include a first wavelength, the second laser beam can include a second wavelength different from the first wavelength.

公开(公告)号：US20180246338A1

公开(公告)日：2018-08-30

申请号：US15901976

申请日：2018-02-22

Applicant: ASML Netherlands B.V.

Inventor： Cory Alan Stinson ,  Philip M. Conklin

IPC: G02B27/42 ,  H05G2/00 ,  G02B27/09 ,  H01S3/00 ,  H01S3/10 ,  G02F1/09

CPC classification number: G02B27/4261 ,  G02B27/0944 ,  G02F1/093 ,  H01S3/005 ,  H01S3/10023 ,  H05G2/003 ,  H05G2/008

Abstract: A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.

公开(公告)号：US10606096B2

公开(公告)日：2020-03-31

申请号：US15901976

申请日：2018-02-22

Applicant: ASML Netherlands B.V.

Inventor： Cory Alan Stinson ,  Philip M. Conklin

IPC: G02B27/42 ,  H01S3/10 ,  H01S3/00 ,  G02B27/09 ,  H05G2/00 ,  G02F1/09

Abstract: A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.