公开(公告)号：US20240385535A1

公开(公告)日：2024-11-21

申请号：US18570140

申请日：2022-05-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER ,  Siegried Alexander TROMP ,  Tjarco LINDEIJER ,  Adrianus Petrus Cornelis HELLEMONS ,  Bas Johannes Petrus ROSET

IPC: G03F7/00 ,  H01L21/687

Abstract: A structure for use on a base surface of a substrate holder, wherein the structure is substantially planar with a substrate holder facing surface that is both securable to the base surface of the substrate holder and also removable from the base surface of the substrate holder, the structure having a plurality of apertures therethrough that are arranged such that a plurality of burls on the base surface may pass through the respective apertures, wherein the diameter of the apertures is in the range 50 μm to 1000 μm and the pitch between adjacent apertures is in the range 1 mm to 3 mm.

公开(公告)号：US20240369948A1

公开(公告)日：2024-11-07

申请号：US18687727

申请日：2022-08-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER

IPC: G03F7/00

Abstract: A thermal conditioning unit to thermally condition a substrate, the thermal conditioning unit including: a top surface; a plurality of gas inlets and gas outlets provided in the top surface; a plurality of pressure valves connected to the plurality of gas inlets and gas outlets, wherein each of the plurality of pressure valves is configured to, during use, be connected to a pressure supply to generate a spatial pressure distribution across the top surface of the thermal conditioning unit; and a control device configured to control the plurality of pressure valves to generate, during use, the spatial pressure distribution, wherein the control device is configured to receive substrate shape data representing a shape of the substrate to be conditioned, and wherein the control device is configured to control the plurality of pressure valves to adapt the spatial pressure distribution based on the substrate shape data.

公开(公告)号：US20230075771A1

公开(公告)日：2023-03-09

申请号：US17798354

申请日：2021-01-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Coen Hubertus Matheus BALTIS ,  Nicolaas TEN KATE ,  Marcus Martinus Petrus Adrianus Petrus Adrianus VERMEULEN ,  Siegfried Alexander TROMP ,  Frank Pieter Albert VAN DEN BERKMORTEL ,  Niek Jacobus Johannes ROSET ,  Gijs KRAMER ,  Nicolaas Petrus Marcus BRANTJES ,  Michiel Theodorus Jacobus FONTEYN

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.

公开(公告)号：US20200294841A1

公开(公告)日：2020-09-17

申请号：US16650939

申请日：2018-09-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes ROSET ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Mark Constant Johannes BAGGEN ,  Gijs KRAMER ,  Roger Anton Marie TIMMERMANS ,  Frank Pieter Albert VAN DEN BERKMORTEL

IPC: H01L21/687 ,  G03F7/20

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US20200285154A1

公开(公告)日：2020-09-10

申请号：US16879961

申请日：2020-05-21

Applicant: ASML NETHERLANDS B.V

Inventor： Gijs KRAMER ,  Martijn HOUBEN ,  Nicholas Peter WATERSON ,  Thibault Simon Mathieu LAURENT ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Vincentius Fransiscus CLOOSTERMAN ,  Siegfried Alexander TROMP ,  Coen Hubertus Matheus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Niek Jacobus Johannes ROSET

IPC: G03F7/20

Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

公开(公告)号：US20180107107A1

公开(公告)日：2018-04-19

申请号：US15567279

申请日：2016-03-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER ,  Simon Karel RAVENSBERGEN ,  Niek Jacobus Johannes ROSET ,  Pieter Renaat Maria HENNUS

IPC: G03B27/42 ,  G03F7/20

CPC classification number: G03B27/42 ,  G03F7/70341 ,  G03F7/70716

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder, The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body includes a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid is retained on the projection and in contact with an object supported on the object holder,