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公开(公告)号:US20220026810A1
公开(公告)日:2022-01-27
申请号:US17297171
申请日:2019-11-14
Applicant: ASML NETHERLANDS B.V.
Inventor: Nicolaas Petrus Marcus BRANTJES , Matthijs COX , Boris MENCHTCHIKOV , Cyrus Emil TABERY , Youping ZHANG , Yi ZOU , Chenxi LIN , Yana CHENG , Simon Philip Spencer HASTINGS , Maxim Philippe Frederic GENIN
Abstract: A method for determining a correction relating to a performance metric of a semiconductor manufacturing process, the method including: obtaining a set of pre-process metrology data; processing the set of pre-process metrology data by decomposing the pre-process metrology data into one or more components which: a) correlate to the performance metric; or b) are at least partially correctable by a control process which is part of the semiconductor manufacturing process; and applying a trained model to the processed set of pre-process metrology data to determine the correction for the semiconductor manufacturing process.
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公开(公告)号:US20230075771A1
公开(公告)日:2023-03-09
申请号:US17798354
申请日:2021-01-25
Applicant: ASML NETHERLANDS B.V.
Inventor: Coen Hubertus Matheus BALTIS , Nicolaas TEN KATE , Marcus Martinus Petrus Adrianus Petrus Adrianus VERMEULEN , Siegfried Alexander TROMP , Frank Pieter Albert VAN DEN BERKMORTEL , Niek Jacobus Johannes ROSET , Gijs KRAMER , Nicolaas Petrus Marcus BRANTJES , Michiel Theodorus Jacobus FONTEYN
IPC: G03F7/20
Abstract: A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.
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