公开(公告)号：US20230075771A1

公开(公告)日：2023-03-09

申请号：US17798354

申请日：2021-01-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Coen Hubertus Matheus BALTIS ,  Nicolaas TEN KATE ,  Marcus Martinus Petrus Adrianus Petrus Adrianus VERMEULEN ,  Siegfried Alexander TROMP ,  Frank Pieter Albert VAN DEN BERKMORTEL ,  Niek Jacobus Johannes ROSET ,  Gijs KRAMER ,  Nicolaas Petrus Marcus BRANTJES ,  Michiel Theodorus Jacobus FONTEYN

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.