公开(公告)号：US20230360954A1

公开(公告)日：2023-11-09

申请号：US18354227

申请日：2023-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes ROSET ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Mark Constant Johannes BAGGEN ,  Gijs KRAMER ,  Roger Anton Marie TIMMERMANS ,  Frank Pieter Albert VAN DEN BERKMORTEL

IPC: H01L21/687 ,  G03F7/00

CPC classification number: H01L21/6875 ,  G03F7/70341 ,  G03F7/707

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US20180059555A1

公开(公告)日：2018-03-01

申请号：US15558552

申请日：2016-02-22

Applicant: ASML Netherlands B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Marcel Koenraad Marie BAGGEN ,  Fransiscus Mathijs JACOBS ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Frank Pieter Albert VAN DEN BERKMORTEL ,  Marc Wilhelmus Maria VAN DER WIJST

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/709 ,  G03F9/70 ,  G03F9/7046

Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.

公开(公告)号：US20250140596A1

公开(公告)日：2025-05-01

申请号：US19011092

申请日：2025-01-06

Applicant: ASML NETHERLANDS B.V

Inventor： Niek Jacobus Johannes ROSET ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Mark Constant Johannes BAGGEN ,  Gijs KRAMER ,  Roger Anton Marie TIMMERMANS ,  Frank Pieter Albert VAN DEN BERKMORTEL

IPC: H01L21/687 ,  G03F7/00

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US20230075771A1

公开(公告)日：2023-03-09

申请号：US17798354

申请日：2021-01-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Coen Hubertus Matheus BALTIS ,  Nicolaas TEN KATE ,  Marcus Martinus Petrus Adrianus Petrus Adrianus VERMEULEN ,  Siegfried Alexander TROMP ,  Frank Pieter Albert VAN DEN BERKMORTEL ,  Niek Jacobus Johannes ROSET ,  Gijs KRAMER ,  Nicolaas Petrus Marcus BRANTJES ,  Michiel Theodorus Jacobus FONTEYN

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.

公开(公告)号：US20200294841A1

公开(公告)日：2020-09-17

申请号：US16650939

申请日：2018-09-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes ROSET ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Mark Constant Johannes BAGGEN ,  Gijs KRAMER ,  Roger Anton Marie TIMMERMANS ,  Frank Pieter Albert VAN DEN BERKMORTEL

IPC: H01L21/687 ,  G03F7/20

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.