公开(公告)号：US09557650B2

公开(公告)日：2017-01-31

申请号：US14740916

申请日：2015-06-16

Applicant: ASML Netherlands B.V.

Inventor： Silvia De Dea ,  Alexander I. Ershov ,  Brandon Verhoff ,  Gregory Wilson ,  Bruno M. La Fontaine

IPC: H05G2/00 ,  G03F7/20

CPC classification number: G03F7/2039 ,  G03F7/70175 ,  G03F7/70925 ,  H05G2/005 ,  H05G2/008

Abstract: A system for an extreme ultraviolet (EUV) light source includes a radical transport system that includes one or more conduits, each of the one or more conduits comprising a sidewall, the sidewall comprising a linear portion and a second portion, the linear portion of the sidewall comprising a first end that defines a first opening, and the second portion of the sidewall comprising one or more openings from an interior of the conduit to an exterior of the conduit, where the second portion of at least one of the one or more conduits is positioned relative to a collector that is inside of a vacuum chamber of the EUV light source with a gap between the collector and the second portion; and a control system.

Abstract translation: 用于极紫外（EUV）光源的系统包括自由基输送系统，其包括一个或多个导管，所述一个或多个导管中的每一个包括侧壁，所述侧壁包括直线部分和第二部分，所述线性部分 侧壁包括限定第一开口的第一端，并且所述侧壁的第二部分包括从所述导管的内部到所述导管的外部的一个或多个开口，其中所述一个或多个导管中的至少一个的第二部分 相对于在集电体和第二部分之间具有间隙的EUV光源的真空室内部的集电器定位; 和控制系统。

公开(公告)号：US09392678B2

公开(公告)日：2016-07-12

申请号：US13652755

申请日：2012-10-16

Applicant: ASML Netherlands B.V.

Inventor： Silvia De Dea ,  Georgiy O. Vaschenko ,  Peter Baumgart ,  Norbert Bowering

IPC: H05G2/00 ,  C23C14/18

CPC classification number: G03F7/70033 ,  C23C14/185 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.

Abstract translation: 用于极紫外（EUV）光源的目标材料供应装置包括管，其包括限定在第一和第二端之间的第一端，第二端和侧壁。 管的外表面的至少一部分包括电绝缘材料，第一端容纳加压目标材料，第二端限定出加压目标材料通过的孔，以产生目标材料液滴流。 目标材料供应装置还包括在管的外表面上的导电涂层。 涂层被配置为将管的外表面电连接到地，从而减少外表面上的表面电荷。