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1.发明授权公开(公告)号：US10237960B2
公开(公告)日：2019-03-19
申请号：US15696508
申请日：2017-09-06
Applicant: ASML Netherlands B.V.
Inventor： Alexander I. Ershov , David Evans , Matthew Graham
Abstract: A device and method are disclosed in which a source material delivery system can be reoriented so that the path of the source material is not directly towards an irradiation region in operating conditions in which the path is expected to be unpredictable. A shroud provided to protect the flow of source material from being disrupted is segmented so with one part of the shroud being movable with respect to another part of the shroud so that the movable part can avoid interfering with the path of the source material when it is not directly towards the irradiation region.
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2.发明授权公开(公告)号：US09795023B2
公开(公告)日：2017-10-17
申请号：US15048708
申请日：2016-02-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Alexander I. Ershov , David Evans , Matthew Graham
CPC classification number: H05G2/006 , G03F7/2008 , H05G2/005 , H05G2/008
Abstract: A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.
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公开(公告)号：US09560730B2
公开(公告)日：2017-01-31
申请号：US14022026
申请日：2013-09-09
Applicant: ASML Netherlands B.V.
Inventor： Silvia De Dea , Alexander I. Ershov , Brandon Verhoff , Gregory Wilson , Bruno M. La Fontaine
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/70925 , H05G2/005
Abstract: Free radicals that combine with debris that is created by converting a target mixture to plasma that emits EUV light are received at a first opening defined by a first end of a conduit, the conduit including a material that passes the free radicals and the conduit including a sidewall that extends away from the first opening and defines at least one other opening, the at least one other positioned to release the free radicals toward an element that accumulates the debris on a surface. The free radicals in the conduit are directed toward the at least one other opening. The free radicals are passed through the at least one other opening and to the surface of the element to remove the debris from the surface of the element without removing the element from the EUV light source.
Abstract translation: 与通过将目标混合物转化为发射EUV光的等离子体产生的碎屑结合的自由基在由导管的第一端限定的第一开口处接收，该导管包括使自由基和导管通过的材料，其包括 侧壁，其远离第一开口延伸并且限定至少一个其它开口，所述至少一个其它开口定位成将自由基朝向将碎屑积聚在表面上的元件释放。 导管中的自由基指向至少另一个开口。 自由基通过至少一个其它开口并且到达元件的表面以从元件的表面去除碎屑而不从EUV光源移除元件。
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公开(公告)号：US20150282287A1
公开(公告)日：2015-10-01
申请号：US14740916
申请日：2015-06-16
Applicant: ASML Netherlands B.V.
Inventor： Silvia De Dea , Alexander I. Ershov , Brandon Verhoff , Gregory Wilson , Bruno M. La Fontaine
IPC: H05G2/00
CPC classification number: G03F7/2039 , G03F7/70175 , G03F7/70925 , H05G2/005 , H05G2/008
Abstract: A system for an extreme ultraviolet (EUV) light source includes a radical transport system that includes one or more conduits, each of the one or more conduits comprising a sidewall, the sidewall comprising a linear portion and a second portion, the linear portion of the sidewall comprising a first end that defines a first opening, and the second portion of the sidewall comprising one or more openings from an interior of the conduit to an exterior of the conduit, where the second portion of at least one of the one or more conduits is positioned relative to a collector that is inside of a vacuum chamber of the EUV light source with a gap between the collector and the second portion; and a control system.
Abstract translation: 用于极紫外（EUV）光源的系统包括自由基输送系统，其包括一个或多个导管，所述一个或多个导管中的每一个包括侧壁，所述侧壁包括直线部分和第二部分，所述线性部分 侧壁包括限定第一开口的第一端，并且所述侧壁的第二部分包括从所述导管的内部到所述导管的外部的一个或多个开口，其中所述一个或多个导管中的至少一个的第二部分 相对于在集电体和第二部分之间具有间隙的EUV光源的真空室内部的集电器定位; 和控制系统。
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公开(公告)号：US20150273542A1
公开(公告)日：2015-10-01
申请号：US14737590
申请日：2015-06-12
Applicant: ASML Netherlands B.V.
Inventor： Silvia De Dea , Michael Varga , Alexander I. Ershov , Robert L. Morse
CPC classification number: B08B11/02 , B08B3/02 , B23K26/0643 , B23K26/16 , G02B27/0006 , G03F7/70925
Abstract: A carrier holds an extreme ultraviolet light source collector mirror. The carrier includes a front panel having an inner surface and an outer surface opposite the inner surface, and defining a through opening that has an edge having a plurality of scallops; a back panel having an inner surface that faces the front panel and an outer surface opposite the inner surface; and a plurality of posts that are configured to connect the back panel to the front panel and to sandwich a flat rim around the circular boundary of the collector mirror between the inner surface of one of the panels and flanges of the posts. The scallops are positioned around a circumference of the edge and being separated by arcs, where the arcs define a circle that has a diameter that is less than a diameter of the circular boundary of the reflective surface of the collector mirror.
Abstract translation: 载体保持极紫外光源收集镜。 载体包括具有内表面和与内表面相对的外表面的前面板，并且限定具有多个扇形边缘的通孔; 背面板，其具有面向所述前面板的内表面和与所述内表面相对的外表面; 以及多个柱，其被构造成将所述后面板连接到所述前面板，并且在所述面板的内表面和所述柱的凸缘之间夹住围绕所述收集镜的圆形边界的平坦边缘。 扇形围绕边缘的圆周定位并且被圆弧分隔开，其中圆弧限定圆直径小于收集器反射镜的反射表面的圆形边界的直径。
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Patent Agency Ranking
公开(公告)号：US11474440B2
公开(公告)日：2022-10-18
申请号：US17081492
申请日：2020-10-27
Applicant: ASML Netherlands B.V.
Inventor： Alexander I. Ershov
Abstract: Method of and apparatus for repairing an optical element disposed in a vacuum chamber while the optical element is in the vacuum chamber. An exposed surface of the optical element is exposed to an ion flux generated by an ion source to remove at least some areas of the surface that have been damaged by exposure to the environment within the vacuum chamber. The method and apparatus are especially applicable to repair multilayer mirrors serving as collectors in systems for generating EUV light for use in semiconductor photolithography.
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公开(公告)号：US20210055665A1
公开(公告)日：2021-02-25
申请号：US17081492
申请日：2020-10-27
Applicant: ASML Netherlands B.V.
Inventor： Alexander I. Ershov
IPC: G03F7/20
Abstract: Method of and apparatus for repairing an optical element disposed in a vacuum chamber while the optical element is in the vacuum chamber. An exposed surface of the optical element is exposed to an ion flux generated by an ion source to remove at least some areas of the surface that have been damaged by exposure to the environment within the vacuum chamber. The method and apparatus are especially applicable to repair multilayer mirrors serving as collectors in systems for generating EUV light for use in semiconductor photolithography.
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8.发明授权Method of temperature compensation in high power focusing system for EUV LPP source 有权EUV LPP源高功率聚焦系统温度补偿方法公开(公告)号：US09541838B2
公开(公告)日：2017-01-10
申请号：US15011218
申请日：2016-01-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Alexander I. Ershov
CPC classification number: G03F7/70008 , G03F7/70033 , G03F7/70041 , G03F7/70341 , G03F7/70875
Abstract: Method of temperature compensating a focusing system in which a temperature of a thermal lens compensation plate is regulated based on an optical absorption of the thermal lens compensation plate with optical absorption being determined based at least in part on an expected end-of-lifetime value for focus lens optical absorption. A value representative of cumulative time in use of the focusing systems is determined and the temperature of the thermal lens compensation plate is increased to a temperature based at least in part on said cumulative time in use.
Abstract translation: 基于具有光学吸收的热透镜补偿板的光吸收来调节热透镜补偿板的温度来调节聚焦系统的温度补偿方法，至少部分地基于预期的寿命终止值来确定， 聚焦透镜光吸收。 确定代表使用聚焦系统的累积时间的值，并且至少部分地基于所使用的累积时间将热透镜补偿板的温度升高到温度。
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公开(公告)号：US20180330841A1
公开(公告)日：2018-11-15
申请号：US15593732
申请日：2017-05-12
Applicant: ASML Netherlands B.V.
Inventor： Alexander I. Ershov , John Tom Stewart, IV , Igor V. Fomenkov , Christianus W.J. Berendsen
Abstract: Disclosed is an EUV system in which a source control loop is established to maintain and optimize debris flux while not unduly affecting optimum EUV generation conditions. One or more temperature sensors, e.g., thermocouples may be installed in the vessel to measure respective local gas temperatures. The respective local temperature as measured by the one or more thermocouples can be used as one or more inputs to the source control loop. The source control loop may then adjust the laser targeting to permit optimization of debris generation and deposition while not affecting EUV production, thus extending the lifetime of the source and its collector.
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公开(公告)号：US10128017B1
公开(公告)日：2018-11-13
申请号：US15593732
申请日：2017-05-12
Applicant: ASML Netherlands B.V.
Inventor： Alexander I. Ershov , John Tom Stewart, IV , Igor V. Fomenkov , Christianus W. J. Berendsen
Abstract: Disclosed is an EUV system in which a source control loop is established to maintain and optimize debris flux while not unduly affecting optimum EUV generation conditions. One or more temperature sensors, e.g., thermocouples may be installed in the vessel to measure respective local gas temperatures. The respective local temperature as measured by the one or more thermocouples can be used as one or more inputs to the source control loop. The source control loop may then adjust the laser targeting to permit optimization of debris generation and deposition while not affecting EUV production, thus extending the lifetime of the source and its collector.
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