公开(公告)号：US09557650B2

公开(公告)日：2017-01-31

申请号：US14740916

申请日：2015-06-16

Applicant: ASML Netherlands B.V.

Inventor： Silvia De Dea ,  Alexander I. Ershov ,  Brandon Verhoff ,  Gregory Wilson ,  Bruno M. La Fontaine

IPC: H05G2/00 ,  G03F7/20

CPC classification number: G03F7/2039 ,  G03F7/70175 ,  G03F7/70925 ,  H05G2/005 ,  H05G2/008

Abstract: A system for an extreme ultraviolet (EUV) light source includes a radical transport system that includes one or more conduits, each of the one or more conduits comprising a sidewall, the sidewall comprising a linear portion and a second portion, the linear portion of the sidewall comprising a first end that defines a first opening, and the second portion of the sidewall comprising one or more openings from an interior of the conduit to an exterior of the conduit, where the second portion of at least one of the one or more conduits is positioned relative to a collector that is inside of a vacuum chamber of the EUV light source with a gap between the collector and the second portion; and a control system.

Abstract translation: 用于极紫外（EUV）光源的系统包括自由基输送系统，其包括一个或多个导管，所述一个或多个导管中的每一个包括侧壁，所述侧壁包括直线部分和第二部分，所述线性部分 侧壁包括限定第一开口的第一端，并且所述侧壁的第二部分包括从所述导管的内部到所述导管的外部的一个或多个开口，其中所述一个或多个导管中的至少一个的第二部分 相对于在集电体和第二部分之间具有间隙的EUV光源的真空室内部的集电器定位; 和控制系统。

公开(公告)号：US09560730B2

公开(公告)日：2017-01-31

申请号：US14022026

申请日：2013-09-09

Applicant: ASML Netherlands B.V.

Inventor： Silvia De Dea ,  Alexander I. Ershov ,  Brandon Verhoff ,  Gregory Wilson ,  Bruno M. La Fontaine

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70925 ,  H05G2/005

Abstract: Free radicals that combine with debris that is created by converting a target mixture to plasma that emits EUV light are received at a first opening defined by a first end of a conduit, the conduit including a material that passes the free radicals and the conduit including a sidewall that extends away from the first opening and defines at least one other opening, the at least one other positioned to release the free radicals toward an element that accumulates the debris on a surface. The free radicals in the conduit are directed toward the at least one other opening. The free radicals are passed through the at least one other opening and to the surface of the element to remove the debris from the surface of the element without removing the element from the EUV light source.

Abstract translation: 与通过将目标混合物转化为发射EUV光的等离子体产生的碎屑结合的自由基在由导管的第一端限定的第一开口处接收，该导管包括使自由基和导管通过的材料，其包括 侧壁，其远离第一开口延伸并且限定至少一个其它开口，所述至少一个其它开口定位成将自由基朝向将碎屑积聚在表面上的元件释放。 导管中的自由基指向至少另一个开口。 自由基通过至少一个其它开口并且到达元件的表面以从元件的表面去除碎屑而不从EUV光源移除元件。

公开(公告)号：US20150282287A1

公开(公告)日：2015-10-01

申请号：US14740916

申请日：2015-06-16

Applicant: ASML Netherlands B.V.

Inventor： Silvia De Dea ,  Alexander I. Ershov ,  Brandon Verhoff ,  Gregory Wilson ,  Bruno M. La Fontaine

IPC: H05G2/00

CPC classification number: G03F7/2039 ,  G03F7/70175 ,  G03F7/70925 ,  H05G2/005 ,  H05G2/008

Abstract: A system for an extreme ultraviolet (EUV) light source includes a radical transport system that includes one or more conduits, each of the one or more conduits comprising a sidewall, the sidewall comprising a linear portion and a second portion, the linear portion of the sidewall comprising a first end that defines a first opening, and the second portion of the sidewall comprising one or more openings from an interior of the conduit to an exterior of the conduit, where the second portion of at least one of the one or more conduits is positioned relative to a collector that is inside of a vacuum chamber of the EUV light source with a gap between the collector and the second portion; and a control system.

Abstract translation: 用于极紫外（EUV）光源的系统包括自由基输送系统，其包括一个或多个导管，所述一个或多个导管中的每一个包括侧壁，所述侧壁包括直线部分和第二部分，所述线性部分 侧壁包括限定第一开口的第一端，并且所述侧壁的第二部分包括从所述导管的内部到所述导管的外部的一个或多个开口，其中所述一个或多个导管中的至少一个的第二部分 相对于在集电体和第二部分之间具有间隙的EUV光源的真空室内部的集电器定位; 和控制系统。