公开(公告)号：US10464222B2

公开(公告)日：2019-11-05

申请号：US15877342

申请日：2018-01-22

Applicant: Andrew Frauenglass

Inventor： Andrew Frauenglass

IPC: B26B1/10 ,  B26B1/02 ,  B26B1/04 ,  B26B1/00

Abstract: A folding knife that uses a four bar linkage mechanism to open and close. The knife can include a means of one hand opening and closing as well as a means to become latched in, and released from, a fixed position. The four bar linkage knife includes a blade, a handle, and the motion of a four bar linkage to open and close the knife. The four bar knife provides inherent safety because the four bar linkage motion can not fold onto the users hand.

公开(公告)号：US09908246B2

公开(公告)日：2018-03-06

申请号：US15006253

申请日：2016-01-26

Applicant: Andrew Frauenglass

Inventor： Andrew Frauenglass

IPC: B26B1/10 ,  B26B1/02 ,  B26B1/04

CPC classification number: B26B1/10 ,  B26B1/00 ,  B26B1/02 ,  B26B1/04

Abstract: A folding knife that uses a four bar linkage mechanism to open and close. The knife can include a means of one hand opening and closing as well as a means to become latched in, and released from, a fixed position. The four bar linkage knife includes a blade, a handle, and the motion of a four bar linkage to open and close the knife. The four bar knife provides inherent safety because the four bar linkage motion can not fold onto the users hand.

公开(公告)号：US08685628B2

公开(公告)日：2014-04-01

申请号：US11739472

申请日：2007-04-24

Applicant: Alexander Raub ,  Andrew Frauenglass ,  Steven R. J. Brueck

Inventor： Alexander Raub ,  Andrew Frauenglass ,  Steven R. J. Brueck

IPC: G03H1/26

CPC classification number: G02B6/1225 ,  B82Y20/00 ,  G02B6/02133 ,  G02B6/4204 ,  G02B2006/12107 ,  G03F7/70408

Abstract: Exemplary embodiments provide methods for patterning large areas, beyond those accessible with the limited single-area exposure techniques, with nanometer scale features. The methods can include forming a grating pattern to make a first interferometric exposure of a first portion of a photosensitive material disposed over a substrate by interfering two or more laser beams, wherein the two or more laser beams comprise an apodized intensity profile having a continuous intensity variation. The method can further include aligning and overlapping the grating pattern to expose a second portion of the photosensitive material such that the first portion and the second portion form a continuous grating pattern.

Abstract translation: 示例性实施例提供了利用纳米尺度特征对大面积图案进行图案化的方法，超出可用有限单面曝光技术访问的区域。 所述方法可以包括形成光栅图案，以通过干涉两个或更多个激光束对布置在基板上的感光材料的第一部分进行第一干涉曝光，其中两个或更多个激光束包括具有连续强度的变迹强度分布 变异。 该方法还可以包括对准和重叠光栅图案以暴露感光材料的第二部分，使得第一部分和第二部分形成连续的光栅图案。

公开(公告)号：US06233044B1

公开(公告)日：2001-05-15

申请号：US09273399

申请日：1999-03-22

Applicant: Steven R. J. Brueck ,  Xiaolan Chen ,  Andrew Frauenglass ,  Saleem H. Zaidi ,  Janusz Wilczynski

Inventor： Steven R. J. Brueck ,  Xiaolan Chen ,  Andrew Frauenglass ,  Saleem H. Zaidi ,  Janusz Wilczynski

IPC: G03B2754

CPC classification number: G03F7/70108 ,  G03F7/2022 ,  G03F7/70241 ,  G03F7/70308 ,  G03F7/70408 ,  G03F7/7045

Abstract: The present invention provides methods and apparatus for defining a single structure on a semiconductor wafer by spatial frequency components whereby some of the spatial frequency components are derived by optical lithography and some by interferometric lithographic techniques. Interferometric lithography images the high frequency components while optical lithography images the low frequency components. Optics collects many spatial frequencies and the interferometry shifts the spatial frequencies to high spatial frequencies. Thus, because the mask does not need to provide high spatial frequencies, the masks are configured to create only low frequency components, thereby allowing fabrication of simpler masks having larger structures. These methods and apparatus facilitate writing more complex repetitive as well as non-repetitive patterns in a single exposure with a resolution which is higher than that currently available using known optical lithography alone.

Abstract translation: 本发明提供用于通过空间频率分量在半导体晶片上定义单个结构的方法和装置，由此通过光学光刻获得一些空间频率分量，而通过干涉光刻技术导出一些空间频率分量。 干涉光刻成像高频分量，而光刻成像低频分量。 光学收集许多空间频率，干涉测量将空间频率移动到高空间频率。 因此，由于掩模不需要提供高空间频率，所以掩模被配置为仅产生低频分量，从而允许制造具有较大结构的更简单的掩模。 这些方法和设备有助于在单次曝光中以比目前可用的已知光刻单独的分辨率更高的分辨率编写更复杂的重复和非重复图案。

公开(公告)号：US5426498A

公开(公告)日：1995-06-20

申请号：US223091

申请日：1994-04-04

Applicant: Steven R. J. Brueck ,  David B. Burckel ,  Andrew Frauenglass ,  Saleem Zaidi

Inventor： Steven R. J. Brueck ,  David B. Burckel ,  Andrew Frauenglass ,  Saleem Zaidi

IPC: G01B11/16 ,  G01L1/24

CPC classification number: G01B11/162 ,  G01L1/24

Abstract: A displacement measuring method and device is disclosed in which speckle amplitude interferometry within a single speckle feature or a small number of features of a speckle pattern is used to achieve sub-fringe accuracy with a single detector and to measure displacement of the object under investigation with sub-wavelength accuracy at measurement speeds consistent with real-time control of manufacturing processes. The same technique applied to multiple spots on a sample with optical means for causing interference between different combinations of scattered fields, including fields from different illuminated spots, permits measurements of the total sample motion.

Abstract translation: 公开了一种位移测量方法和装置，其中使用单个散斑特征或散斑图案的少数特征中的散斑振幅干涉测量法，以使用单个检测器实现子边缘精度，并测量被研究对象的位移 测量速度下的亚波长精度与制造过程的实时控制一致。 应用于具有光学装置的样品上的多个点的相同技术用于引起散射场的不同组合（包括来自不同照明点的场）之间的干扰，允许测量总样本运动。