Abstract:
The present invention facilitates semiconductor device fabrication by obtaining angle of incidence values and divergence of an ion beam normal to a plane of a scanned beam. A divergence detector comprising a mask and profiler/sensor is employed to obtain beamlets from the incoming ion beam and then to measure beam current at a number of vertical positions. These beam current measurements are then employed to provide the vertical angle of incidence values, which provide a vertical divergence profile that serves to characterize the ion beam. These values can be employed by an ion beam generation mechanism to perform adjustments on the generated ion beam or position of the workpiece if the values indicate deviation from desired values.
Abstract:
Embodiments of methods, computer programs, and systems for adjusting time settings according to the invention are disclosed. One embodiment of the invention of the computer system includes a first processor (140) that maintains a first time as well as a communication medium (115) coupled to the first processor (140). The computer system also includes a second processor (125) that maintains a second time and is coupled to the communications medium (115). The first processor (140) is adapted to receive a first message and the second processor (125) is adapted to receive a second message. A first time is recorded when the first processor (140) receives the first message. A second time is recorded when the second processor (125) receives the second message. The first processor (140) is adapted to send a third message to the second processor (125). The second processor (125) is adapted to send a fourth message to the first processor (140) that includes information indicative of the recorded second time. Upon receipt of the fourth message, the first time is set based at least in part on the sum of the recorded second time and the roundtrip time for the third and fourth messages.