公开(公告)号：US10691169B2

公开(公告)日：2020-06-23

申请号：US15975522

申请日：2018-05-09

Applicant: Apple Inc.

Inventor： Jeffrey C. Mylvaganam ,  Erik G. de Jong ,  Dale N. Memering ,  Xiao Bing Cai ,  Palaniappan Chinnakaruppan ,  Jong Kong Lee ,  Srikanth Kamireddi ,  Sawako Kamei ,  Feng Min ,  Jing Zhang ,  Xiang Du ,  Sai Feng Liu

IPC: G06F1/16 ,  G04B37/00 ,  B24B7/22 ,  G04B39/00 ,  B23K26/402 ,  H01Q1/24 ,  B28D5/00 ,  B24B29/00 ,  B24B37/04 ,  B24C11/00 ,  B23K26/364 ,  B05D1/02 ,  B24C1/08 ,  B23K103/00

Abstract: A cover for an electronic device and methods of forming a cover is disclosed. The electronic device may include a housing, and a cover coupled to the housing. The cover may have an inner surface having at least one of an intermediate polish and a final polish, a groove formed on the inner surface, and an outer surface positioned opposite the inner surface. The outer surface may have at least one of the intermediate polish and the final polish. The cover may also have a rounded perimeter portion formed between the inner surface and the outer surface. The rounded perimeter portion may be positioned adjacent the groove. The method for forming the cover may include performing a first polishing process on the sapphire component using a polishing tool, and performing a second polishing process on the groove of the sapphire component forming the cover using blasting media.

公开(公告)号：US10065289B2

公开(公告)日：2018-09-04

申请号：US14842962

申请日：2015-09-02

Applicant: Apple Inc.

Inventor： Palaniappan Chinnakaruppan ,  Srikanth Kamireddi

IPC: B24C1/08 ,  B24C3/32 ,  B24B31/116

Abstract: A polishing system and method for polishing a channel formed within a component is disclosed. The polishing system may include a tooling element operable to be positioned within a recess formed partially through a component. The tooling element may include an outer surface having a geometry corresponding to a geometry of the recess formed in the component. The tooling element forms a channel between the recess of the component and the tooling element when positioned in the recess. The system may also include a first member in fluid communication with a first opening of the channel, and a second member in fluid communication with a second opening of the channel. The second opening may be in fluid communication with the first opening via the channel. Additionally, the first and second member may be configured to continuously vary a pressure within the channel to move an abrasive slurry within the channel.