公开(公告)号：US09155184B2

公开(公告)日：2015-10-06

申请号：US14246419

申请日：2014-04-07

Applicant: Applied Materials, Inc.

Inventor： Siu Tang Ng ,  Changhun Lee ,  Huutri Dao ,  Roberto Cesar Cotlear

IPC: H05H1/24 ,  H05H1/46

CPC classification number: H05H1/46 ,  H05H2001/4652

Abstract: Plasma generation source employing dielectric conduit assemblies having removable interfaces and related assemblies and methods are disclosed. The plasma generation source (PGS) includes an enclosure body having multiple internal surfaces forming an internal chamber having input and output ports to respectively receive a precursor gas for generation of plasma and to discharge the plasma. A dielectric conduit assembly may guide the gas and the plasma away from the internal surface where particulates may be generated. The dielectric conduit assembly includes a first and second cross-conduit segments. The dielectric conduit assembly further includes parallel conduit segments extending from the second cross-conduit segment to distal ends which removably align with first cross-conduit interfaces of the first cross-conduit segment without leaving gaps. In this manner, the dielectric conduit assembly is easily serviced, and reduces and contains particulate generation away from the output port.

Abstract translation: 公开了采用具有可移除接口和相关组件和方法的介质导管组件的等离子体产生源。 等离子体发生源（PGS）包括具有多个内表面的外壳主体，形成具有输入和输出端口的内部腔室，以分别容纳用于产生等离子体的前体气体并排出等离子体。 电介质导管组件可以引导气体和等离子体远离可能产生微粒的内表面。 介电导管组件包括第一和第二交叉导管段。 电介质导管组件还包括从第二交叉导管段延伸到远端的平行导管段，其可移除地与第一交叉导管段的第一交叉导管接口对准，而不留下间隙。 以这种方式，电介质导管组件易于维护，并且减少并且包含远离输出端口的颗粒产生。

公开(公告)号：US08771423B2

公开(公告)日：2014-07-08

申请号：US13649196

申请日：2012-10-11

Applicant: Applied Materials, Inc.

Inventor： Changhun Lee ,  Michael D. Willwerth ,  Hoan Nguyen

IPC: C23C16/50 ,  C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC classification number: H01L21/67069 ,  H01J37/32623 ,  H01J37/32642 ,  H01L21/68735 ,  H01L21/68757

Abstract: Embodiments of a cover ring for use in a plasma processing chamber are provided. In one embodiment, a cover ring for use in a plasma processing chamber includes a ring-shaped body fabricated from a yttrium (Y) containing material. The body includes a bottom surface having an inner locating ring and an outer locating ring. The inner locating ring extends further from the body than the outer locating ring. The body includes an inner diameter wall having a main wall and a secondary wall separated by a substantially horizontal land. The body also includes a top surface having an outer sloped top surface meeting an inner sloped surface at an apex. The inner sloped surface defines an angle with a line perpendicular to a centerline of the body less than about 70 degrees.

Abstract translation: 提供了一种用于等离子体处理室的盖环的实施例。 在一个实施例中，用于等离子体处理室的盖环包括由含钇（Y）的材料制成的环形主体。 主体包括具有内定位环和外定位环的底表面。 内定位环比外定位环更远离主体。 主体包括具有主壁和由基本上水平的平台分开的次级壁的内径壁。 身体还包括顶表面，其具有在顶点处会聚内倾斜表面的外倾斜顶表面。 内部倾斜表面与垂直于身体中心线的线形成小于约70度的角度。