公开(公告)号：US20200234932A1

公开(公告)日：2020-07-23

申请号：US16703140

申请日：2019-12-04

Applicant: Applied Materials, Inc.

Inventor： Venkata Sharat Chandra PARIMI ,  Zubin HUANG ,  Jian LI ,  Satish RADHAKRISHNAN ,  Rui CHENG ,  Diwakar N. KEDLAYA ,  Juan Carlos ROCHA-ALVAREZ ,  Umesh M. KELKAR ,  Karthik JANAKIRAMAN ,  Sarah Michelle BOBEK ,  Prashant Kumar KULSHRESHTHA ,  Vinay K. PRABHAKAR ,  Byung Seok KWON

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/46 ,  C23C16/50

Abstract: Embodiments of the present disclosure generally relate to a pedestal for increasing temperature uniformity in a substrate supported thereon. The pedestal comprises a body having a heater embedded therein. The body comprises a patterned surface that includes a first region having a first plurality of posts extending from a base surface of the body at a first height, and a second region surrounding the central region having a second plurality of posts extending from the base surface at a second height that is greater than the first height, wherein an upper surface of each of the first plurality of posts and the second plurality of posts are substantially coplanar and define a substrate receiving surface.

公开(公告)号：US20200224310A1

公开(公告)日：2020-07-16

申请号：US16716233

申请日：2019-12-16

Applicant: Applied Materials, Inc.

Inventor： Sarah Michelle BOBEK ,  Venkata Sharat Chandra PARIMI ,  Prashant Kumar KULSHRESHTHA ,  Vinay K. PRABHAKAR ,  Kwangduk Douglas LEE ,  Sungwon HA ,  Jian LI

IPC: C23C16/458 ,  C23C16/46

Abstract: Aspects of the present disclosure relate generally to pedestals, components thereof, and methods of using the same for substrate processing chambers. In one implementation, a pedestal for disposition in a substrate processing chamber includes a body. The body includes a support surface. The body also includes a stepped surface that protrudes upwards from the support surface. The stepped surface is disposed about the support surface to surround the support surface. The stepped surface defines an edge ring such that the edge ring is integrated with the pedestal to form the body that is monolithic. The pedestal also includes an electrode disposed in the body, and one or more heaters disposed in the body.

公开(公告)号：US20200176296A1

公开(公告)日：2020-06-04

申请号：US16677491

申请日：2019-11-07

Applicant: Applied Materials, Inc.

Inventor： Abdul Aziz KHAJA ,  Venkata Sharat Chandra PARIMI ,  Sarah Michelle BOBEK ,  Prashant Kumar KULSHRESHTHA ,  Vinay K. PRABHAKAR

IPC: H01L21/683 ,  H01J37/32

Abstract: Aspects of the present disclosure relate to one or more implementations of a substrate support for a processing chamber. In one implementation, a substrate support includes a body having a center, and a support surface on the body configured to at least partially support a substrate. The substrate support includes a first angled wall that extends upward and radially outward from the support surface, and a first upper surface disposed above the support surface. The substrate support also includes a second angled wall that extends upward and radially outward from the first upper surface, the first upper surface extending between the first angled wall and the second angled wall. The substrate support also includes a second upper surface extending from the second angled wall. The second upper surface is disposed above the first upper surface.