公开(公告)号：US20060050950A1

公开(公告)日：2006-03-09

申请号：US10711310

申请日：2004-09-09

Applicant: Hung-En Tai ,  Chia-Yun Chen ,  Sheng-Jen Wang

Inventor： Hung-En Tai ,  Chia-Yun Chen ,  Sheng-Jen Wang

IPC: G06K9/00

CPC classification number: G01N21/9501

Abstract: A method of managing wafer defects includes inspecting each chip in a wafer to generate a unit of wafer defect raw data, using a server to integrate the unit of wafer defect raw data to generate a unit of wafer defect distribution data for recording positions, types, and sizes of defects, using the server to generate a corresponding drawing file according to the unit wafer defect distribution data to show all kinds of defect distributions, and transmitting the drawing file to a terminal such that terminal users can view the defect distributions without receiving the unit of wafer defect raw data.

Abstract translation: 管理晶片缺陷的方法包括检查晶片中的每个芯片以产生晶片缺陷原始数据的单元，使用服务器来整合晶片缺陷原始数据的单元以产生用于记录位置，类型的晶片缺陷分布数据的单元， 和尺寸的缺陷，使用服务器根据单位晶片缺陷分布数据生成相应的图形文件以显示各种缺陷分布，并将绘图文件发送到终端，使得终端用户可以在不接收到缺陷分布的情况下查看缺陷分布 晶圆缺陷原始数据单位。

公开(公告)号：US07099729B2

公开(公告)日：2006-08-29

申请号：US10708277

申请日：2004-02-20

Applicant: Hung-En Tai ,  Chien-Chung Chen ,  Sheng-Jen Wang

Inventor： Hung-En Tai ,  Chien-Chung Chen ,  Sheng-Jen Wang

IPC: G06F19/00

CPC classification number: H01L22/20 ,  G05B2219/32191 ,  Y02P90/22

Abstract: A semiconductor process and yield analysis integrated real-time management method comprises inspecting a plurality of semiconductor products with a plurality of items to generate and record a plurality of inspecting results during semiconductor process, classifying the semiconductor products as a plurality of groups with a default rule to generate and record an initial data in a database, indexing a plurality of semiconductor product groups and the corresponding initial data from the database by a default product rule and parameter to calculate a corresponding analysis result, and displaying the analysis result according to the indexed semiconductor product groups and the initial data.

Abstract translation: 集成实时管理方法的半导体工艺和成品率分析包括在半导体处理期间检查多个半导体产品以产生并记录多个检查结果，并将半导体产品作为具有默认规则的多个组进行分类 在数据库中生成和记录初始数据，通过默认产品规则和参数从数据库索引多个半导体产品组和相应的初始数据，以计算相应的分析结果，并根据索引的半导体显示分析结果 产品组和初始数据。

公开(公告)号：US06999897B2

公开(公告)日：2006-02-14

申请号：US10708573

申请日：2004-03-11

Applicant: Hung-En Tai ,  Chien-Chung Chen ,  Haw-Jyue Luo ,  Sheng-Jen Wang

Inventor： Hung-En Tai ,  Chien-Chung Chen ,  Haw-Jyue Luo ,  Sheng-Jen Wang

IPC: G11C7/00

CPC classification number: G05B19/41875 ,  Y02P90/22

Abstract: A method and related system for semiconductor equipment early warning management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording the quality of semiconductor products and corresponding testing parameters, and analyzing a relationship between the corresponding process parameters, the corresponding equipment parameters, and the quality of semiconductor products of each piece of equipment.

Abstract translation: 一种半导体设备预警管理方法及相关系统。 该方法包括记录每件设备的处理参数，每台设备处理时记录设备参数，评估和记录半导体产品的质量和相应的测试参数，分析相应工艺参数，相应设备参数之间的关系 ，以及每件设备的半导体产品的质量。

公开(公告)号：US06950783B1

公开(公告)日：2005-09-27

申请号：US10708572

申请日：2004-03-11

Applicant: Hung-En Tai ,  Chien-Chung Chen ,  Sheng-Jen Wang

Inventor： Hung-En Tai ,  Chien-Chung Chen ,  Sheng-Jen Wang

IPC: G06F19/00 ,  G21C17/00

CPC classification number: H01L22/20 ,  G05B19/41875 ,  G06Q30/0283 ,  Y02P90/22

Abstract: A method and related system for semiconductor equipment prevention maintenance management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording time and cost of prevention maintenance after each piece of equipment runs prevention maintenance, evaluating the quality of semiconductor products, and analyzing a relationship between the corresponding process parameter, the corresponding equipment parameters, prevention maintenance cost, and semiconductor products of each piece of equipment.

Abstract translation: 一种半导体设备预防维护管理方法及相关系统。 该方法包括记录每件设备的工艺参数，每台设备的加工记录设备参数，每台设备运行后的预防维护的评估和记录时间和成本预防维护，半导体产品的质量评估和分析 相应的过程参数，相应的设备参数，预防维护成本以及每件设备的半导体产品之间的关系。

公开(公告)号：US20050203715A1

公开(公告)日：2005-09-15

申请号：US10708573

申请日：2004-03-11

Applicant: Hung-En Tai ,  Chien-Chung Chen ,  Haw-Jyue Luo ,  Sheng-Jen Wang

Inventor： Hung-En Tai ,  Chien-Chung Chen ,  Haw-Jyue Luo ,  Sheng-Jen Wang

IPC: G06F19/00

CPC classification number: G05B19/41875 ,  Y02P90/22

Abstract: A method and related system for semiconductor equipment early warning management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording the quality of semiconductor products and corresponding testing parameters, and analyzing a relationship between the corresponding process parameters, the corresponding equipment parameters, and the quality of semiconductor products of each piece of equipment.

Abstract translation: 一种半导体设备预警管理方法及相关系统。 该方法包括记录每件设备的处理参数，每台设备处理时记录设备参数，评估和记录半导体产品的质量和相应的测试参数，分析相应工艺参数，相应设备参数之间的关系 ，以及每件设备的半导体产品的质量。