公开(公告)号：US09868663B2

公开(公告)日：2018-01-16

申请号：US15200571

申请日：2016-07-01

Applicant: CORNING INCORPORATED

Inventor： Samir Biswas ,  Qiang Fu ,  David Myron Lineman ,  Ronald Leroy Stewart

IPC: C03B5/16 ,  C03C10/12 ,  C03C10/00 ,  C03C21/00 ,  C03C3/093 ,  C03C1/02

CPC classification number: C03C1/02 ,  C03B5/16 ,  C03C3/093 ,  C03C10/0027 ,  C03C21/002 ,  C03C2204/04 ,  Y10T428/315

Abstract: A glass ceramic precursor glass and a glass ceramic having low levels of rhodium and a method of controlling the amount of rhodium in such glasses and glass ceramics. The precursor glass and glass ceramic contain from about 1 ppm to about 10 ppm and, in certain embodiments, from about 1 ppm to about 6 ppm rhodium. The method of controlling of reducing rhodium dissolution from a rhodium-containing material such as, for example, an alloy into a glass melt comprises controlling and/or lowering the partial pressure of oxygen at the rhodium-containing vessel/glass interface by imposing a high humidity condition around the external (non-glass-contact) surface of the rhodium-containing material. The lower concentration of rhodium minimizes its coloring effect on the white color of the glass ceramic.

公开(公告)号：US09403715B2

公开(公告)日：2016-08-02

申请号：US14286307

申请日：2014-05-23

Applicant: Corning Incorporated

Inventor： Samir Biswas ,  Qiang Fu ,  David Myron Lineman ,  Ronald Leroy Stewart

IPC: C03C10/12 ,  C03C10/00 ,  C03B5/16 ,  C03C21/00 ,  C03C3/093

CPC classification number: C03C1/02 ,  C03B5/16 ,  C03C3/093 ,  C03C10/0027 ,  C03C21/002 ,  C03C2204/04 ,  Y10T428/315

Abstract: A glass ceramic precursor glass and a glass ceramic having low levels of rhodium and a method of controlling the amount of rhodium in such glasses and glass ceramics. The precursor glass and glass ceramic contain from about 1 ppm to about 10 ppm and, in certain embodiments, from about 1 ppm to about 6 ppm rhodium. The method of controlling of reducing rhodium dissolution from a rhodium-containing material such as, for example, an alloy into a glass melt comprises controlling and/or lowering the partial pressure of oxygen at the rhodium-containing vessel/glass interface by imposing a high humidity condition around the external (non-glass-contact) surface of the rhodium-containing material. The lower concentration of rhodium minimizes its coloring effect on the white color of the glass ceramic.

Abstract translation: 玻璃陶瓷前体玻璃和具有低水平铑的玻璃陶瓷和控制这种玻璃和玻璃陶瓷中铑的量的方法。 前体玻璃和玻璃陶瓷含有约1ppm至约10ppm，在某些实施方案中含有约1ppm至约6ppm的铑。 控制从含铑材料（例如合金）将铑溶解还原成玻璃熔体的方法包括通过施加高的温度控制和/或降低含铑容器/玻璃界面处的氧的分压 含铑材料的外部（非玻璃接触）表面附近的湿度条件。 较低浓度的铑使其对玻璃陶瓷的白色的着色效果最小化。

公开(公告)号：US20140356628A1

公开(公告)日：2014-12-04

申请号：US14286307

申请日：2014-05-23

Applicant: Corning Incorporated

Inventor： Samir Biswas ,  Qiang Fu ,  David Myron Lineman ,  Ronald Leroy Stewart

IPC: C03B5/225 ,  C03C10/00

CPC classification number: C03C1/02 ,  C03B5/16 ,  C03C3/093 ,  C03C10/0027 ,  C03C21/002 ,  C03C2204/04 ,  Y10T428/315

Abstract: A glass ceramic precursor glass and a glass ceramic having low levels of rhodium and a method of controlling the amount of rhodium in such glasses and glass ceramics. The precursor glass and glass ceramic contain from about 1 ppm to about 10 ppm and, in certain embodiments, from about 1 ppm to about 6 ppm rhodium. The method of controlling of reducing rhodium dissolution from a rhodium-containing material such as, for example, an alloy into a glass melt comprises controlling and/or lowering the partial pressure of oxygen at the rhodium-containing vessel/glass interface by imposing a high humidity condition around the external (non-glass-contact) surface of the rhodium-containing material. The lower concentration of rhodium minimizes its coloring effect on the white color of the glass ceramic.

Abstract translation: 玻璃陶瓷前体玻璃和具有低水平铑的玻璃陶瓷和控制这种玻璃和玻璃陶瓷中铑的量的方法。 前体玻璃和玻璃陶瓷含有约1ppm至约10ppm，在某些实施方案中含有约1ppm至约6ppm的铑。 控制从含铑材料（例如合金）将铑溶解还原成玻璃熔体的方法包括通过施加高的温度控制和/或降低含铑容器/玻璃界面处的氧的分压 含铑材料的外部（非玻璃接触）表面附近的湿度条件。 较低浓度的铑使其对玻璃陶瓷的白色的着色效果最小化。

公开(公告)号：US20140099232A1

公开(公告)日：2014-04-10

申请号：US13841995

申请日：2013-03-15

Applicant: Corning Incorporated

Inventor： Samir Biswas ,  Douglass Lane Blanding ,  Glen Bennett Cook ,  Prantik Mazumder ,  Kamal Kishore Soni ,  Balram Suman

IPC: H01L33/02 ,  H01L21/02

CPC classification number: H01L33/02 ,  C30B15/08 ,  C30B29/06 ,  C30B29/08 ,  C30B29/42 ,  C30B29/64 ,  H01L21/02

Abstract: A method of forming a sheet of semiconductor material utilizes a system. The system comprises a first convex member extending along a first axis and capable of rotating about the first axis and a second convex member spaced from the first convex member and extending along a second axis and capable of rotating about the second axis. The first and second convex members define a nip gap therebetween. The method comprises applying a melt of the semiconductor material on an external surface of at least one of the first and second convex members to form a deposit on the external surface of at least one of the first and second convex members. The method further comprises rotating the first and second convex members in a direction opposite one another to allow for the deposit to pass through the nip gap, thereby forming the sheet of semiconductor material.

Abstract translation: 形成半导体材料片的方法利用了一种系统。 该系统包括沿着第一轴线延伸并且能够围绕第一轴线旋转的第一凸起构件和与第一凸起构件间隔开并且沿着第二轴线延伸并能够围绕第二轴线旋转的第二凸起构件。 第一和第二凸起构件在它们之间限定了夹持间隙。 所述方法包括将所述半导体材料的熔体施加在所述第一和第二凸起构件中的至少一个的外表面上，以在所述第一和第二凸起构件中的至少一个的外部表面上形成沉积物。 该方法还包括使第一和第二凸出部件沿彼此相反的方向旋转，以允许沉积物通过夹持间隙，由此形成半导体材料片。