Method for improving heat transfer of a focus ring to a target substrate mounting device
    11.
    发明授权
    Method for improving heat transfer of a focus ring to a target substrate mounting device 有权
    用于改善聚焦环向目标基板安装装置的传热的方法

    公开(公告)号:US07655579B2

    公开(公告)日:2010-02-02

    申请号:US11970612

    申请日:2008-01-08

    IPC分类号: H01L21/00

    CPC分类号: H01L21/6831 H01L21/67103

    摘要: A focus ring heat transfer method improves heat transfer of a focus ring arranged in an outer peripheral portion of a mounting surface of a mounting table adapted to mount a target substrate in a chamber. The method includes steps of: disposing a heat transfer sheet between the focus ring and the mounting table; and vacuum-evacuating the chamber prior to processing the target substrate and then restoring the pressure the inside of the chamber to an atmospheric pressure or a light vacuum pressure. Therefore, air present in a fine gap between the heat transfer sheet and the mounting surface is removed to allow the heat transfer sheet to adhere to the mounting surface.

    摘要翻译: 聚焦环传热方法改善了布置在适于将目标基板安装在室中的安装台的安装表面的外周部分中的聚焦环的热传递。 该方法包括以下步骤:在聚焦环和安装台之间设置传热片; 并且在处理目标基板之前对腔室进行真空抽真空,然后将腔室内部的压力恢复到大气压力或轻的真空压力。 因此,除去传热片与安装面之间的微细间隙的空气,使传热片粘附在安装面上。