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公开(公告)号:US20220228108A1
公开(公告)日:2022-07-21
申请号:US17658446
申请日:2022-04-08
Applicant: FUJIFILM CORPORATION
Inventor: Keisuke OKU , Daichi HIKIMOTO , Takahiro OBA , Kenichi YASUDA , Hiroyuki YUKAWA
IPC: C12N5/00
Abstract: There is provided a cell culture base material having a porous membrane having an opening ratio of 30% to 70% and an extracellular matrix with which an inside of a hole of the porous membrane is filled. There is also provided a cell culture base material with cells having a cell layer on at least one surface of the cell culture base material.
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12.
公开(公告)号:US20210395673A1
公开(公告)日:2021-12-23
申请号:US17462024
申请日:2021-08-31
Applicant: FUJIFILM CORPORATION
Inventor: Hidetoshi TAKAYAMA , Koju ITO , Takahiro OBA , Keisuke OKU
Abstract: There is provided an accommodation case (1) having a first wall part (33) in which a power supply unit (40) that transmits electric power to a power supply destination in a noncontact state is provided, a second wall part (34) in which a power reception unit (50) that receives electric power that is supplied from a power supply source in a noncontact state is provided, where the second wall part (34) faces the first wall part (33), and an accommodation space (35) that is surrounded by a plurality of wall parts including the first wall part (33) and the second wall part (34).
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公开(公告)号:US20210395656A1
公开(公告)日:2021-12-23
申请号:US17462025
申请日:2021-08-31
Applicant: FUJIFILM CORPORATION
Inventor: Hidetoshi TAKAYAMA , Koju ITO , Takahiro OBA , Keisuke OKU
IPC: C12M1/00
Abstract: There is provided an incubator including an accommodation space that is shielded from an external environment, an environmental control unit that controls an environment of the inside of the accommodation space, a power supply unit that is provided in the accommodation space and transmits electric power to a power supply target in a noncontact state, and a partition wall that is provided in the accommodation space and shields electromagnetic waves radiated from the power supply unit.
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公开(公告)号:US20180044547A1
公开(公告)日:2018-02-15
申请号:US15782248
申请日:2017-10-12
Applicant: FUJIFILM Corporation
Inventor: Akio TAMURA , Katsuyuki TAKADA , Takayasu YAMAZAKI , Keisuke OKU , Keigo UEKI
IPC: C09D133/14 , C08F222/10 , C09D4/00 , B05D3/00 , B05D7/02
CPC classification number: C09D133/14 , B05D3/007 , B05D7/02 , C08F222/1006 , C09D4/00
Abstract: An aspect of the present invention relates to method of manufacturing a hard coat film, wherein the hard coat film comprises a plastic substrate and a hard coat layer, the method comprises forming the hard coat layer by subjecting a photopolymerizable hard coating composition to photopolymerization processing, and the photopolymerizable hard coating composition comprises a radical polymerizable compound having two or more radical polymerizable groups selected from the group consisting of acryloyloxy groups, acryloyl groups, methacryloyloxy groups, and methacryloyl groups per molecule, a cationic polymerizable compound, a radical photopolymerization initiator, and a cationic photopolymerization initiator.
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