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公开(公告)号：US20230075188A1
公开(公告)日：2023-03-09
申请号：US17948838
申请日：2022-09-20
Applicant: FUJIFILM Corporation
Inventor： Taro MIYOSHI , Eiji FUKUZAKI
IPC: G03F7/039 , G03F7/004 , G03F7/038 , C08F212/14 , C08F220/28 , C08F220/30 , C07C381/12 , C07C309/04 , C07D307/00 , C07D309/30 , C07D327/06 , C07D333/46 , C07D335/02 , C07D333/76 , C07C43/225 , C07C25/18
Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represented by a specific general formula, is which the resin (A) includes a repeating unit represented by a specific general formula; and an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.
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公开(公告)号：US20220206386A1
公开(公告)日：2022-06-30
申请号：US17691119
申请日：2022-03-10
Applicant: FUJIFILM Corporation
Inventor： Taro MIYOSHI , Yasunori YONEKUTA , Eiji FUKUZAKI , Toshiya TAKAHASHI
Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing (A) an acid-decomposable resin, (B) a compound represented by General Formula (b1), and (C) a compound represented by General Formula (c1), in which a ratio of a content of the compound (C) to a content of the compound (B) is from 0.01% by mass to 10% by mass. In the formulae, L represents a single bond or a divalent linking group. A represents a group that decomposes by the action of an acid. B represents a group that decomposes by the action of an acid, a hydroxy group, or a carboxy group. It should be noted that at least one B represents the hydroxy group or the carboxy group. n represents an integer from 1 to 5. X represents an (n+1)-valent linking group. M+ represents a sulfonium ion or an iodonium ion.
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