公开(公告)号：US20210055653A1

公开(公告)日：2021-02-25

申请号：US16807496

申请日：2020-03-03

Applicant: FUJIFILM Corporation

Inventor： Tsutomu YOSHIMURA ,  Yasunori YONEKUTA ,  Naoya HATAKEYAMA ,  Kohei HIGASHI ,  Yoichi NISHIDA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F212/14 ,  C08F220/18 ,  C08F212/08

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A), in which the resin (A) includes a repeating unit having an acidic group and a repeating unit having an acid-decomposable group, a content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A), a content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A), a glass transition temperature of the resin (A) is 145° C. or lower, and the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 μm or more; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

公开(公告)号：US20200019058A1

公开(公告)日：2020-01-16

申请号：US16579014

申请日：2019-09-23

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Yasunori YONEKUTA ,  Tsutomu YOSHIMURA ,  Kohei HIGASHI ,  Yoichi NISHIDA

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C08F212/14 ,  C08F220/68 ,  C08F212/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: a resin, in which the actinic ray-sensitive or radiation-sensitive resin composition has a concentration of a solid content of 10% by mass or more, and in which the resin includes: a repeating unit A which is a repeating unit derived from a monomer allowing a homopolymer formed therefrom to have a glass transition temperature of 50° C. or lower, and a repeating unit B which is a repeating unit having an acid-decomposable group, a content of the repeating unit B is 20% by mole or less with respect to all the repeating units in the resin, and at least one of the repeating unit contained in the resin is a repeating unit having an aromatic ring.

公开(公告)号：US20220206386A1

公开(公告)日：2022-06-30

申请号：US17691119

申请日：2022-03-10

Applicant: FUJIFILM Corporation

Inventor： Taro MIYOSHI ,  Yasunori YONEKUTA ,  Eiji FUKUZAKI ,  Toshiya TAKAHASHI

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/004 ,  G03F7/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing (A) an acid-decomposable resin, (B) a compound represented by General Formula (b1), and (C) a compound represented by General Formula (c1), in which a ratio of a content of the compound (C) to a content of the compound (B) is from 0.01% by mass to 10% by mass. In the formulae, L represents a single bond or a divalent linking group. A represents a group that decomposes by the action of an acid. B represents a group that decomposes by the action of an acid, a hydroxy group, or a carboxy group. It should be noted that at least one B represents the hydroxy group or the carboxy group. n represents an integer from 1 to 5. X represents an (n+1)-valent linking group. M+ represents a sulfonium ion or an iodonium ion.

公开(公告)号：US20160049592A1

公开(公告)日：2016-02-18

申请号：US14865649

申请日：2015-09-25

Applicant: FUJIFILM CORPORATION

Inventor： Yasunori YONEKUTA ,  Koji TAKAKU ,  Wataru SOTOYAMA

IPC: H01L51/00 ,  C07F7/08 ,  C07D517/06 ,  C07F7/18 ,  C07D513/06 ,  C07D498/06

CPC classification number: H01L51/0071 ,  C07D498/06 ,  C07D513/06 ,  C07D517/06 ,  C07F7/0812 ,  C07F7/0838 ,  C07F7/1804 ,  H01L51/0058 ,  H01L51/0065 ,  H01L51/0068 ,  H01L51/0094 ,  H01L51/0545

Abstract: An organic thin film transistor containing a compound represented by the formula (1) in a semiconductor active layer has a high carrier mobility, a small change in the threshold voltage after repeated driving and a high solubility in an organic solvent. A1 and A2 represent S, O or Se; at least one of R1 to R6 represents a substituent represented by *-L-R wherein L represents a divalent linking group and R represents a hydrogen atom, an alkyl group, an oligooxyethylene group, an oligosiloxane group or a trialkylsilyl group.

Abstract translation: 在半导体活性层中含有式（1）表示的化合物的有机薄膜晶体管具有高的载流子迁移率，反复驱动后的阈值电压的小变化和在有机溶剂中的高溶解度。 A1和A2代表S，O或Se; R 1〜R 6中的至少一个表示由* -L-R表示的取代基，其中L表示二价连接基团，R表示氢原子，烷基，低聚氧乙烯基，低聚硅氧烷基或三烷基甲硅烷基。

公开(公告)号：US20230143982A1

公开(公告)日：2023-05-11

申请号：US18069969

申请日：2022-12-21

Applicant: FUJIFILM Corporation

Inventor： Hiroki SUGIURA ,  Yasunori YONEKUTA

IPC: H10K85/10 ,  H10K71/60 ,  H10K10/46 ,  H10K39/32

CPC classification number: H10K85/113 ,  H10K71/60 ,  H10K10/488 ,  H10K39/32 ,  H10K2102/101

Abstract: A first object of the present invention is to provide a photoelectric conversion element having a high external quantum efficiency and small variation in response. A second object of the present invention is to provide an imaging element, an optical sensor, and a compound related to the photoelectric conversion element.
The photoelectric conversion element includes, in the following order, a conductive film, a photoelectric conversion film, and a transparent conductive film, in which the photoelectric conversion film contains a compound represented by Formula (1).

公开(公告)号：US20190011835A1

公开(公告)日：2019-01-10

申请号：US16131167

申请日：2018-09-14

Applicant: FUJIFILM Corporation

Inventor： Yasunori YONEKUTA

IPC: G03F7/11 ,  C09D133/08 ,  G03F7/20 ,  G03F7/16 ,  C09D133/16 ,  C09D125/18 ,  C09D125/14 ,  G03F7/38 ,  G03F7/32

Abstract: The present invention provides a protective film forming composition capable of forming a pattern having excellent depth of focus and exposure latitude even after being stored for a predetermined period of time.The protective film forming composition of the present invention contains a resin, a basic compound, a solvent, and an antioxidant.

公开(公告)号：US20160372663A1

公开(公告)日：2016-12-22

申请号：US15252937

申请日：2016-08-31

Applicant: FUJIFILM Corporation

Inventor： Hiroo TAKIZAWA ,  Teruki NIORI ,  Yasunori YONEKUTA ,  Hayato YOSHIDA

IPC: H01L51/00

CPC classification number: H01L51/004 ,  C07F7/081 ,  C07F7/0812 ,  H01L51/0003 ,  H01L51/0043 ,  H01L51/0055 ,  H01L51/0071 ,  H01L51/0073 ,  H01L51/0074 ,  H01L51/0094 ,  H01L51/0516 ,  H01L51/0558 ,  H01L51/0562 ,  H01L51/0566

Abstract: Provided are an organic thin-film transistor including: a gate electrode, an organic semiconductor layer, a gate insulating layer, and a source electrode and a drain electrode on a substrate, in which the organic semiconductor layer contains an organic semiconductor and a block copolymer, and the block copolymer is at least one selected from specific block copolymers such as a styrene-(meth)acrylate ester block copolymer and may be phase-separated, and a method for manufacturing an organic thin-film transistor, which includes an organic semiconductor containing a phase-separated block copolymer, including: applying a coating solution which contains an organic semiconductor and a block copolymer for film formation; and heating the obtained film so that the block copolymer is self-assembled.

Abstract translation: 提供一种有机薄膜晶体管，其包括：在基板上包括栅极，有机半导体层，栅极绝缘层以及源电极和漏电极，其中有机半导体层包含有机半导体和嵌段共聚物 ，嵌段共聚物为选自特定的嵌段共聚物如苯乙烯 - （甲基）丙烯酸酯嵌段共聚物中的至少一种，可以进行相分离，以及有机薄膜晶体管的制造方法，其包括有机半导体 含有相分离的嵌段共聚物，包括：涂布含有有机半导体的涂料溶液和用于成膜的嵌段共聚物; 加热得到的膜，使嵌段共聚物自组装。

公开(公告)号：US20240114781A1

公开(公告)日：2024-04-04

申请号：US18307789

申请日：2023-04-26

Applicant: FUJIFILM Corporation

Inventor： Masaki MORITA ,  Ryo FUJIWARA ,  Hiroki SUGIURA ,  Yasunori YONEKUTA ,  Hiyoku NAKATA

IPC: H10K85/60 ,  C07D495/04 ,  C07D519/00 ,  H10K30/20

CPC classification number: H10K85/657 ,  C07D495/04 ,  C07D519/00 ,  H10K30/20 ,  H10K85/6572 ,  H10K85/6576

Abstract: The present invention is to provide a photoelectric conversion element with an excellent photoelectric conversion efficiency, an imaging element, an optical sensor, and a compound. The photoelectric conversion element of the present invention includes, in the following order, a conductive film, a photoelectric conversion film, and a transparent conductive film, in which the photoelectric conversion film contains a compound represented by Formula (1).

公开(公告)号：US20230132579A1

公开(公告)日：2023-05-04

申请号：US18059397

申请日：2022-11-28

Applicant: FUJIFILM Corporation

Inventor： Yukio TANI ,  Hiroki SUGIURA ,  Yasunori YONEKUTA

IPC: H10K85/10 ,  H10K85/20

Abstract: The present invention is to provide a photoelectric conversion element with an excellent sensitivity, an imaging element, an optical sensor, and a compound. The photoelectric conversion element of the present invention includes, in the following order, a conductive film, a photoelectric conversion film, and a transparent conductive film in which the photoelectric conversion film contains a compound represented by Formula (1) and a coloring agent.

公开(公告)号：US20220137512A1

公开(公告)日：2022-05-05

申请号：US17578473

申请日：2022-01-19

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Yasunori YONEKUTA ,  Takamitsu TOMIGA ,  Kohei HIGASHI ,  Fumihiro YOSHINO

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/038 ,  G03F7/32 ,  G03F7/16 ,  G03F7/004 ,  G03F7/38 ,  G03F7/40

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, (B) a photoacid generator, and an anion (P) which is one or more anions selected from the group consisting of NO3−, SO42−, Cl−, and Br−, in which a content of the anion (P) is from 0.01 ppb to 100 ppm with respect to a total mass of the actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film formed from the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.