摘要:
Provided are an electronic device, a method of manufacturing the same, and a touch panel including the device. The electronic device includes a nanostructure having a plurality of metal oxide nanorods vertically aligned at predetermined intervals in intersection regions between bottom electrodes and top electrodes that perpendicularly cross each other. The nanorods are formed to the same diameter and the same height so that the electronic device can exhibit uniform performance. Also, a method of manufacturing an electronic device includes selectively vertically growing the same number of metal oxide nanostructures with a uniform size only on the bottom electrodes using a nano-template with a plurality of vertical holes. Furthermore, a touch panel includes a nanostructure having a plurality of piezoelectric nanorods disposed in a plurality of touch cells arranged in a matrix.
摘要:
A micro-casted silicon carbide nano-imprinting stamp and method of making a micro-casted silicon carbide nano-imprinting stamp are disclosed. A micro-casting technique is used to form a foundation layer and a plurality of nano-sized features connected with the foundation layer. The foundation layer and the nano-sized features are unitary whole that is made entirely from a material comprising silicon carbide (SiC) which is harder than silicon (Si) alone. As a result, the micro-casted silicon carbide nano-imprinting stamp has a longer service lifetime because it can endure several imprinting cycles without wearing out or breaking. The longer service lifetime makes the micro-casted silicon carbide nano-imprinting stamp economically feasible to manufacture as the manufacturing cost can be recouped over the service lifetime.
摘要:
A method is provided for coating a surface having features thereon with a self-assembled monolayer for aiding release of the surface during an imprinting procedure. The method comprises exposing the surface to a vapor of a mold release agent.
摘要:
A method of forming a hardened nano-imprinting stamp is disclosed. The hardened nano-imprinting stamp includes a plurality of silicon-based nano-sized features that have an hardened shell of silicon carbide, silicon nitride, or silicon carbide nitride. The hardened shell is made harder than the underlying silicon by a plasma carburization and/or a plasma nitridation process. During the plasma process atoms of carbon and/or nitrogen bombard and penetrate a plurality of exposed surfaces of the nano-sized features and chemically react with the silicon to form the hardened shell of silicon carbide, silicon nitride, or silicon carbide nitride.
摘要:
A micro-casted silicon carbide nano-imprinting stamp and method of making a micro-casted silicon carbide nano-imprinting stamp are disclosed. A micro-casting technique is used to form a foundation layer and a plurality of nano-sized features connected with the foundation layer. The foundation layer and the nano-sized features are unitary whole that is made entirely from a material comprising silicon carbide (SiC) which is harder than silicon (Si) alone. As a result, the micro-casted silicon carbide nano-imprinting stamp has a longer service lifetime because it can endure several imprinting cycles without wearing out or breaking. The longer service lifetime makes the micro-casted silicon carbide nano-imprinting stamp economically feasible to manufacture as the manufacturing cost can be recouped over the service lifetime.