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    MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COMPOSITIONS AND METHODS
    11.
    发明申请
    MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COMPOSITIONS AND METHODS 审中-公开

    公开(公告)号：US20190315781A1

    公开(公告)日：2019-10-17

    申请号：US15950286

    申请日：2018-04-11

    Applicant: Inpria Corporation

    Inventor： Joseph B. Edson ,  Thomas J. Lamkin ,  William Earley ,  Truman Wambach

    IPC: C07F7/22

    Abstract: A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

    MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COMPOSITIONS AND METHODS
    13.
    发明申请
    MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COMPOSITIONS AND METHODS 有权

    公开(公告)号：US20250074931A1

    公开(公告)日：2025-03-06

    申请号：US18949490

    申请日：2024-11-15

    Applicant: Inpria Corporation

    Inventor： Joseph B. Edson ,  Thomas J. Lamkin ,  William Earley ,  Truman Wambach ,  Jeremy T. Anderson

    IPC: C07F7/22

    Abstract: A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

    Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
    15.
    发明授权
    Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods 有权

    公开(公告)号：US11673903B2

    公开(公告)日：2023-06-13

    申请号：US15950286

    申请日：2018-04-11

    Applicant: Inpria Corporation

    Inventor： Joseph B. Edson ,  Thomas J. Lamkin ,  William Earley ,  Truman Wambach

    IPC: C07F7/22

    CPC classification number: C07F7/2284 ,  C07F7/2224

    Abstract: A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

    ORGANOMETALLIC METAL CHALCOGENIDE CLUSTERS AND APPLICATION TO LITHOGRAPHY
    17.
    发明申请
    ORGANOMETALLIC METAL CHALCOGENIDE CLUSTERS AND APPLICATION TO LITHOGRAPHY 有权

    公开(公告)号：US20210026241A1

    公开(公告)日：2021-01-28

    申请号：US16934647

    申请日：2020-07-21

    Applicant: Inpria Corporation

    Inventor： Brian J. Cardineau ,  William Earley ,  Truman Wambach

    IPC: G03F7/004 ,  C07F7/22 ,  G03F7/16 ,  G03F7/32 ,  G03F7/20

    Abstract: Patterning with UV and EUV light is described with organo tin sulfide (and selenide) clusters. The clusters are solids at room temperature and are soluble in organic solvents that are not too polar. Irradiation can either fragment a carbon metal bond or crosslink unsaturated organic moieties to stabilize the irradiated material. The irradiated material then resists dissolving in organic solvents so that the un-irradiated material can be contacted with an organic solvent to develop the latent image formed with the radiation. Radiation patternable layers can be formed through coating a solution or through vapor deposition. Corresponding precursor solutions, structures and methods are described.

    MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COMPOSITIONS AND METHODS
    18.
    发明申请
    MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COMPOSITIONS AND METHODS 有权

    公开(公告)号：US20210024552A1

    公开(公告)日：2021-01-28

    申请号：US17067232

    申请日：2020-10-09

    Applicant: Inpria Corporation

    Inventor： Joseph B. Edson ,  Thomas J. Lamkin ,  William Earley ,  Truman Wambach ,  Jeremy T. Anderson

    IPC: C07F7/22

    Abstract: A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

    TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV ABSORPTION
    19.
    发明申请
    TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV ABSORPTION 审中-公开

    公开(公告)号：US20190308998A1

    公开(公告)日：2019-10-10

    申请号：US16375032

    申请日：2019-04-04

    Applicant: Inpria Corporation

    Inventor： Brian J. Cardineau ,  William Earley ,  Stephen T. Meyers ,  Kai Jiang ,  Jeremy T. Anderson

    IPC: C07F7/22 ,  G03F7/004

    Abstract: Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC)3SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.

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