公开(公告)号：US20240376135A1

公开(公告)日：2024-11-14

申请号：US18779539

申请日：2024-07-22

Applicant: Inpria Corporation

Inventor： Brian J. Cardineau ,  William Earley ,  Stephen T. Meyers ,  Kai Jiang ,  Jeremy T. Anderson

IPC: C07F7/22 ,  G03F7/004 ,  G03F7/20

Abstract: Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC)3SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.

公开(公告)号：US20240337925A1

公开(公告)日：2024-10-10

申请号：US18745039

申请日：2024-06-17

Applicant: Inpria Corporation

Inventor： Brian J. Cardineau ,  William Earley ,  Truman Wambach

IPC: G03F7/004 ,  C07F7/22 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/0042 ,  C07F7/226 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/162 ,  G03F7/167 ,  G03F7/2004 ,  G03F7/32

Abstract: Patterning with UV and EUV light is described with organo tin sulfide (and selenide) clusters. The clusters are solids at room temperature and are soluble in organic solvents that are not too polar. Irradiation can either fragment a carbon metal bond or crosslink unsaturated organic moieties to stabilize the irradiated material. The irradiated material then resists dissolving in organic solvents so that the un-irradiated material can be contacted with an organic solvent to develop the latent image formed with the radiation. Radiation patternable layers can be formed through coating a solution or through vapor deposition. Corresponding precursor solutions, structures and methods are described.

公开(公告)号：US20220064192A1

公开(公告)日：2022-03-03

申请号：US17410316

申请日：2021-08-24

Applicant: Inpria Corporation

Inventor： Joseph B. Edson ,  Brian J. Cardineau ,  William Earley ,  Kierra Huihui-Gist ,  Thomas J. Lamkin ,  Robert E. Jilek

IPC: C07F7/22

Abstract: Synthesis reactions are described to efficiently and specifically form compounds of the structure RSnL3, where R is an organic ligand to the tin, and L is hydrolysable ligand or a hydrolysis product thereof. The synthesis is effective for a broad range of R ligands. The synthesis is based on the use of alkali metal ions and optionally alkaline earth (pseudo-alkaline earth) metal ions. Compounds are formed of the structures represented by the formulas RSn(C≡CSiR′3)3, R′R″ACSnL3, where A is a halogen atom (F, Cl, Br or I) or an aromatic ring with at least one halogen substituent, R′R″(R′″O)CSnL3 or R′R″(N≡C)CSnZ3.

公开(公告)号：US11098070B2

公开(公告)日：2021-08-24

申请号：US16194491

申请日：2018-11-19

Applicant: Inpria Corporation

Inventor： Brian J. Cardineau ,  Stephen T. Meyers ,  Kai Jiang ,  William Earley ,  Jeremy T Anderson

IPC: G03F7/00 ,  C07F7/22 ,  G03F7/004 ,  G03F7/32 ,  G03F7/20

Abstract: Organotin clusters are described with the formula R3Sn3(O2CR′)5-x(OH)2+x(μ3-O) with 0≤x

公开(公告)号：US11897906B2

公开(公告)日：2024-02-13

申请号：US17198669

申请日：2021-03-11

Applicant: Inpria Corporation

Inventor： Joseph B. Edson ,  Thomas J. Lamkin ,  William Earley ,  Truman Wambach ,  Jeremy T. Anderson

IPC: C07F7/22

CPC classification number: C07F7/2284 ,  C07F7/2224

Abstract: A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

公开(公告)号：US20210198293A1

公开(公告)日：2021-07-01

申请号：US17198669

申请日：2021-03-11

Applicant: Inpria Corporation

Inventor： Joseph B. Edson ,  Thomas J. Lamkin ,  William Earley ,  Truman Wambach ,  Jeremy T. Anderson

IPC: C07F7/22

Abstract: A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

公开(公告)号：US10787466B2

公开(公告)日：2020-09-29

申请号：US15950292

申请日：2018-04-11

Applicant: Inpria Corporation

Inventor： Joseph B. Edson ,  Thomas J. Lamkin ,  William Earley ,  Truman Wambach ,  Jeremy T. Anderson

IPC: C07F7/22

Abstract: A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

公开(公告)号：US12129271B2

公开(公告)日：2024-10-29

申请号：US17380475

申请日：2021-07-20

Applicant: Inpria Corporation

Inventor： Brian J. Cardineau ,  Stephen T. Meyers ,  Kai Jiang ,  William Earley ,  Jeremy T. Anderson

IPC: C07F7/22 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32

CPC classification number: C07F7/2224 ,  G03F7/0042 ,  G03F7/2004 ,  G03F7/325 ,  C07B2200/13

Abstract: Organotin clusters are described with the formula R3Sn3(O2CR′)5−x(OH)2+x(μ3-O) with 0≤x

公开(公告)号：US10975109B2

公开(公告)日：2021-04-13

申请号：US16936861

申请日：2020-07-23

Applicant: Inpria Corporation

Inventor： Joseph B. Edson ,  Thomas J. Lamkin ,  William Earley ,  Truman Wambach ,  Jeremy T. Anderson

IPC: C07F7/22

Abstract: A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

公开(公告)号：US20200369691A1

公开(公告)日：2020-11-26

申请号：US16936861

申请日：2020-07-23

Applicant: Inpria Corporation

Inventor： Joseph B. Edson ,  Thomas J. Lamkin ,  William Earley ,  Truman Wambach ,  Jeremy T. Anderson

IPC: C07F7/22

Abstract: A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.