公开(公告)号：US20130078571A1

公开(公告)日：2013-03-28

申请号：US13628115

申请日：2012-09-27

Applicant: JSR CORPORATION

Inventor： Ryuichi SERIZAWA ,  Yusuke ASANO

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0392 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: A photoresist composition includes a first polymer, a second polymer and a third polymer. The first polymer has a fluorine atom and a first structural unit that includes a hydrophilic group. The second polymer has a fluorine atom a second structural unit that includes an alkali-dissociable group. The third polymer has an acid-dissociable group. The first polymer, the second polymer and the third polymer are different with one another. It is preferred that the first structural unit is represented by a following formula, and the second structural unit is represented by a following formula (2).

Abstract translation: 光致抗蚀剂组合物包括第一聚合物，第二聚合物和第三聚合物。 第一聚合物具有氟原子和包含亲水基团的第一结构单元。 第二聚合物具有氟原子，包括碱解离基团的第二结构单元。 第三聚合物具有酸解离基团。 第一聚合物，第二聚合物和第三聚合物彼此不同。 优选第一结构单元由下式表示，第二结构单元由下式（2）表示。