公开(公告)号：US20130078579A1

公开(公告)日：2013-03-28

申请号：US13627208

申请日：2012-09-26

Applicant: JSR CORPORATION

Inventor： Yusuke ASANO

IPC: C07C309/19 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C309/07 ,  C07C309/12 ,  C07C309/16 ,  C07C309/17 ,  C07C309/19 ,  C07C309/65 ,  C07C317/12 ,  C07C381/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C07D295/185 ,  C07D333/46 ,  C07D333/76 ,  C07D333/78 ,  C07D335/02 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041

Abstract: A radiation-sensitive resin composition includes an acid generating agent to generate a compound represented by a following formula (1) by irradiation with a radioactive ray. In the formula (1), R1 represents a monovalent organic group having 1 to 20 carbon atoms. R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. The compound represented by the formula (1) is preferably a compound represented by a following formula (1-1). In the formula (1-1), R2 is as defined in the above formula (1). X represents an electron attractive group. R3 represents a monovalent organic group having 1 to 20 carbon atoms.

Abstract translation: 辐射敏感性树脂组合物包括通过放射线照射产生由下式（1）表示的化合物的酸产生剂。 式（1）中，R 1表示碳原子数为1〜20的1价有机基团。 R2表示氢原子或碳原子数1〜20的1价有机基团。 由式（1）表示的化合物优选为由下式（1-1）表示的化合物。 在式（1-1）中，R 2如上述式（1）中所定义。 X表示吸电子基团。 R3表示碳原子数1〜20的1价有机基团。

公开(公告)号：US20140023968A1

公开(公告)日：2014-01-23

申请号：US14037659

申请日：2013-09-26

Applicant: JSR CORPORATION

Inventor： Hiromitsu NAKASHIMA ,  Toru KIMURA ,  Yusuke ASANO ,  Masafumi HORI ,  Reiko KIMURA ,  Kazuki KASAHARA ,  Hiromu MIYATA ,  Masafumi YOSHIDA

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0041 ,  C08F220/22 ,  C08F220/24 ,  C08F220/28 ,  C08F2220/283 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  H01L21/027 ,  H01L21/0274

Abstract: A resist pattern-forming method includes providing a resist film having a surface free energy of 30 to 40 mN/m on a substrate using a radiation-sensitive resin composition. The resist film is exposed by applying radiation via a mask. The exposed resist film is developed. It is preferable that the exposing of the resist film includes exposing the resist film via an immersion liquid that is provided over the resist film

Abstract translation: 抗蚀剂图案形成方法包括使用辐射敏感性树脂组合物在基板上提供具有30至40mN / m的表面自由能的抗蚀剂膜。 通过经由掩模施加辐射来曝光抗蚀剂膜。 显影出抗蚀剂膜。 优选的是，抗蚀剂膜的曝光包括通过设置在抗蚀剂膜上的浸渍液体曝光抗蚀剂膜

公开(公告)号：US20190310552A1

公开(公告)日：2019-10-10

申请号：US16449701

申请日：2019-06-24

Applicant: JSR CORPORATION

Inventor： Yusuke ASANO ,  Hisashi Nakagawa ,  Shinya Minegishi

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/039

Abstract: A radiation-sensitive composition is to be used in exposure with an extreme ultraviolet ray or an electron beam, and includes a first polymer and a solvent, wherein the first polymer includes a first structural unit including: at least one metal atom; and at least one carbon atom that each bonds to the metal atom by a chemical bond and does not constitute an unsaturated bond, and at least one chemical bond is a covalent bond. Every chemical bond is preferably a covalent bond. The metal atom is preferably tin, germanium, lead or a combination thereof.

公开(公告)号：US20170038679A1

公开(公告)日：2017-02-09

申请号：US15332203

申请日：2016-10-24

Applicant: JSR CORPORATION

Inventor： Hiroshi TOMIOKA ,  Takakazu KIMOTO ,  Yusuke ASANO

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  G03F7/039 ,  C07C321/28 ,  C07D307/00 ,  C07C309/13 ,  C07C309/39 ,  G03F7/16 ,  C07C309/12

CPC classification number: G03F7/0045 ,  C07C25/18 ,  C07C309/04 ,  C07C309/12 ,  C07C309/13 ,  C07C309/17 ,  C07C309/39 ,  C07C321/28 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D307/00 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/327 ,  G03F7/40

Abstract: The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3−, wherein a hydrogen atom or an electron-donating group bonds to an α carbon atom with respect to SO3−, and an electron-withdrawing group bonds to a β carbon atom with respect to SO3−; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R1 and R2 each independently represent a hydrogen atom or a monovalent electron-donating group. R3 represent a monovalent electron-withdrawing group. R4 represents a hydrogen atom or a monovalent hydrocarbon group.

Abstract translation: 本发明提供了含有具有包含酸不稳定基团的结构单元的聚合物的辐射敏感性树脂组合物， 和酸发生剂，其中酸产生剂包括包含具有SO 3 - 的磺酸根阴离子的化合物，其中氢原子或给电子基团相对于SO 3键与α碳原子键合，并且吸电子基团与 一个 碳原子相对于SO3-; 和辐射可降解的鎓阳离子。 该化合物优选具有下式（1-1）或（1-2）表示的基团。 在下式（1-1）和（1-2）中，R 1和R 2各自独立地表示氢原子或一价给电子基团。 R3表示一价吸电子基团。 R4表示氢原子或一价烃基。

公开(公告)号：US20140342288A1

公开(公告)日：2014-11-20

申请号：US14282270

申请日：2014-05-20

Applicant: JSR CORPORATION

Inventor： Hiroshi TOMIOKA ,  Takakazu KIMOTO ,  Yusuke ASANO

IPC: G03F7/027 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C25/18 ,  C07C309/04 ,  C07C309/12 ,  C07C309/13 ,  C07C309/17 ,  C07C309/39 ,  C07C321/28 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D307/00 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/327 ,  G03F7/40

Abstract: The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3−, wherein a hydrogen atom or an electron-donating group bonds to an α carbon atom with respect to SO3−, and an electron-withdrawing group bonds to a β carbon atom with respect to SO3−; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R1 and R2 each independently represent a hydrogen atom or a monovalent electron-donating group. R3 represent a monovalent electron-withdrawing group. R4 represents a hydrogen atom or a monovalent hydrocarbon group.

Abstract translation: 本发明提供了含有具有包含酸不稳定基团的结构单元的聚合物的辐射敏感性树脂组合物， 和酸发生剂，其中酸产生剂包括包含具有SO 3 - 的磺酸根阴离子的化合物，其中氢原子或给电子基团相对于SO 3键与α碳原子键合，并且吸电子基团与 一个 碳原子相对于SO3-; 和辐射可降解的鎓阳离子。 该化合物优选具有下式（1-1）或（1-2）表示的基团。 在下式（1-1）和（1-2）中，R 1和R 2各自独立地表示氢原子或一价给电子基团。 R3表示一价吸电子基团。 R4表示氢原子或一价烃基。

公开(公告)号：US20200041898A1

公开(公告)日：2020-02-06

申请号：US16595884

申请日：2019-10-08

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Yusuke ASANO ,  Takehiko NARUOKA

IPC: G03F7/004 ,  G03F7/20

Abstract: A radiation-sensitive composition includes particles and a solvent. The particles include a first component and a second component. The first component is a hydrolyzation product or a hydrolytic condensation product of a metal compound including a hydrolyzable group, or a combination thereof; and the second component is an organic acid, an anion of the organic acid, a first compound represented by formula (1), or a combination thereof. The organic acid and the first compound each have a molecular weight of no less than 120. In the formula (1), R1 represents an organic group having a valency of n; X represents an alcoholic hydroxyl group, —NCO or —NHRa, wherein Ra represents a hydrogen atom or a monovalent organic group; and n is an integer of 2 to 4.

公开(公告)号：US20190310551A1

公开(公告)日：2019-10-10

申请号：US16449720

申请日：2019-06-24

Applicant: JSR CORPORATION

Inventor： Shinya MINEGISHI ,  Motohiro SHIRATANI ,  Yusuke ASANO ,  Hisashi NAKAGAWA ,  Takehiko NARUOKA

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/32

Abstract: Provided is a radiation-sensitive composition superior in sensitivity. A radiation-sensitive composition incudes a metal oxide having a structural unit represented by formula (1), and a solvent. In the formula (1), M represents germanium, tin or lead; R1 represents a monovalent organic group having no greater than 30 carbon atoms which includes at least one of an electron attractive group and an unsaturated bond-containing group, and bonds to M via a carbon atom.

公开(公告)号：US20140302438A1

公开(公告)日：2014-10-09

申请号：US14247449

申请日：2014-04-08

Applicant: JSR CORPORATION

Inventor： Yusuke ASANO ,  Shin-ichi NAKAMURA ,  Tomonori FUTAI

IPC: G03F7/038

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/039 ,  G03F7/0397

Abstract: A resist composition includes a polymer that includes an acid-labile group-containing structural unit, a photoacid generator, and a solvent. The solvent includes a compound that includes a ketonic carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably a tertiary alcoholic hydroxyl group. The solvent preferably further includes an alkylene glycol monoalkyl ether carboxylate.

Abstract translation: 抗蚀剂组合物包括含有酸不稳定基团的结构单元，光致酸发生剂和溶剂的聚合物。 溶剂包括包含酮羰基和醇羟基的化合物。 醇羟基优选为叔醇羟基。 溶剂优选还包括亚烷基二醇单烷基醚羧酸酯。

公开(公告)号：US20130078571A1

公开(公告)日：2013-03-28

申请号：US13628115

申请日：2012-09-27

Applicant: JSR CORPORATION

Inventor： Ryuichi SERIZAWA ,  Yusuke ASANO

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0392 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: A photoresist composition includes a first polymer, a second polymer and a third polymer. The first polymer has a fluorine atom and a first structural unit that includes a hydrophilic group. The second polymer has a fluorine atom a second structural unit that includes an alkali-dissociable group. The third polymer has an acid-dissociable group. The first polymer, the second polymer and the third polymer are different with one another. It is preferred that the first structural unit is represented by a following formula, and the second structural unit is represented by a following formula (2).

Abstract translation: 光致抗蚀剂组合物包括第一聚合物，第二聚合物和第三聚合物。 第一聚合物具有氟原子和包含亲水基团的第一结构单元。 第二聚合物具有氟原子，包括碱解离基团的第二结构单元。 第三聚合物具有酸解离基团。 第一聚合物，第二聚合物和第三聚合物彼此不同。 优选第一结构单元由下式表示，第二结构单元由下式（2）表示。