Nanomachining method for integrated circuits
    11.
    发明授权
    Nanomachining method for integrated circuits 失效
    集成电路的纳米加工方法

    公开(公告)号:US06403388B1

    公开(公告)日:2002-06-11

    申请号:US09755005

    申请日:2001-01-05

    IPC分类号: H01L2166

    摘要: A system and method provides for effective analysis of an integrated circuit having silicon on insulator (SOI) structure. According to one example embodiment of the present invention, the system includes a system (e.g., a nanomachining arrangement) adapted to remove a selected portion of the backside of a semiconductor device having SOI structure, and to electrically isolate a selected portion of circuitry on the SOI semiconductor device circuitry side. The isolated circuitry then is analyzed.

    摘要翻译: 一种系统和方法提供了对具有绝缘体上硅(SOI)结构的集成电路的有效分析。 根据本发明的一个示例性实施例,该系统包括适于去除具有SOI结构的半导体器件的背面的选定部分的系统(例如,纳米加工布置),并且将所选择的电路部分电隔离 SOI半导体器件电路侧。 然后分析隔离电路。